Peter J. Duke

Person

Endwell, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Structure including a partially electrochemically reduced halogenat...
- Patent number 5,874,154
- Issue date Feb 23, 1999
- International Business Machines Corporation
- Harry Randall Bickford
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for conditioning halogenated polymeric materials and structu...
- Patent number 5,800,858
- Issue date Sep 1, 1998
- International Business Machines Corporation
- Harry Randall Bickford
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for conditioning halogenated polymeric materials and structu...
- Patent number 5,709,906
- Issue date Jan 20, 1998
- International Business Machines Corporation
- Harry Randall Bickford
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for conditioning halogenated polymeric materials and structu...
- Patent number 5,374,454
- Issue date Dec 20, 1994
- International Business Machines Incorporated
- Harry R. Bickford
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic method for forming vias and through holes in copper-in...
- Patent number 5,108,562
- Issue date Apr 28, 1992
- International Business Machines
- Peter J. Duke
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrolytic method for the etch back of encapsulated copper-Invar-...
- Patent number 5,098,533
- Issue date Mar 24, 1992
- International Business Machines Corp.
- Peter J. Duke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Single level masking process with two positive photoresist layers
- Patent number 4,088,490
- Issue date May 9, 1978
- International Business Machines Corporation
- Peter J. Duke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Peter J. Duke

Person

Patents Grantslast 30 patents

Structure including a partially electrochemically reduced halogenat...

Method for conditioning halogenated polymeric materials and structu...

Method for conditioning halogenated polymeric materials and structu...

Method for conditioning halogenated polymeric materials and structu...

Electrolytic method for forming vias and through holes in copper-in...

Electrolytic method for the etch back of encapsulated copper-Invar-...

Single level masking process with two positive photoresist layers