Peter K. Loewenhardt

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Uniform etch system
- Patent number 8,801,892
- Issue date Aug 12, 2014
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-part electrode for a semiconductor processing plasma reactor...
- Patent number 8,573,153
- Issue date Nov 5, 2013
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for preventing corrosion of plasma-exposed yttria-coated co...
- Patent number 8,430,970
- Issue date Apr 30, 2013
- Lam Research Corporation
- Ganapathy Swami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for RF pulsing of a narrow gap capacitively coupled reactor
- Patent number 8,337,713
- Issue date Dec 25, 2012
- Lam Research Corporation
- Peter Loewenhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF pulsing of a narrow gap capacitively coupled reactor
- Patent number 7,976,673
- Issue date Jul 12, 2011
- Lam Research Corporation
- Peter Loewenhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-part electrode for a semiconductor processing plasma reactor...
- Patent number 7,861,667
- Issue date Jan 4, 2011
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of sputtering a protective coating on a semiconductor subst...
- Patent number 7,601,246
- Issue date Oct 13, 2009
- Lam Research Corporation
- Jisoo Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer bevel polymer removal
- Patent number 7,597,816
- Issue date Oct 6, 2009
- Lam Research Corporation
- Jeremy Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preventing damage to low-k materials during resist stripping
- Patent number 7,385,287
- Issue date Jun 10, 2008
- Lam Research Corporation
- Siyi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform etch system
- Patent number 7,371,332
- Issue date May 13, 2008
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-core transformer plasma source
- Patent number 7,363,876
- Issue date Apr 29, 2008
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for plasma stripping using periodic modulation of gas chemis...
- Patent number 7,294,580
- Issue date Nov 13, 2007
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled hot edge ring assembly for reducing plasma r...
- Patent number 7,244,336
- Issue date Jul 17, 2007
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preventing damage to low-k materials during resist stripping
- Patent number 7,226,852
- Issue date Jun 5, 2007
- Lam Research Corporation
- Siyi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Waferless automatic cleaning after barrier removal
- Patent number 7,211,518
- Issue date May 1, 2007
- Lam Research Corporation
- Xiaoqiang Sean Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution system with tuning gas
- Patent number 7,169,231
- Issue date Jan 30, 2007
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for the optimization of substrate etching in a plasma proce...
- Patent number 7,078,350
- Issue date Jul 18, 2006
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selectively etching organosilicate glass with respect to...
- Patent number 7,041,230
- Issue date May 9, 2006
- Lam Research Corporation
- Xingcai Su
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Methods and apparatus for inspecting contact openings in a plasma p...
- Patent number 6,979,579
- Issue date Dec 27, 2005
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for the optimization of photo resist etching...
- Patent number 6,949,469
- Issue date Sep 27, 2005
- Lam Research Corporation
- Yu Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line edge roughness reduction for trench etch
- Patent number 6,949,460
- Issue date Sep 27, 2005
- Lam Research Corporation
- Eric Wagganer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor with electrode simultaneously responsive to plural...
- Patent number 6,841,943
- Issue date Jan 11, 2005
- LAM Research Corp.
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled dome-coil system for high power inductively...
- Patent number 6,822,185
- Issue date Nov 23, 2004
- Applied Materials, Inc.
- Michael Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-core transformer plasma source
- Patent number 6,755,150
- Issue date Jun 29, 2004
- Applied Materials Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for confining an RF plasma u...
- Patent number 6,744,212
- Issue date Jun 1, 2004
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Toroidal plasma source for plasma processing
- Patent number 6,712,020
- Issue date Mar 30, 2004
- Applied Materials Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shaping a plasma with a magnetic field to control etch rate uniformity
- Patent number 6,673,199
- Issue date Jan 6, 2004
- Applied Materials, Inc.
- John M. Yamartino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber cleaning with fluorides of iodine
- Patent number 6,581,612
- Issue date Jun 24, 2003
- Applied Materials Inc.
- Peter Loewenhardt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for enhancing plasma processing performance
- Patent number 6,569,775
- Issue date May 27, 2003
- Applied Materials, Inc.
- Peter K. Loewenhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for providing pulsed plasma during a portion of a semiconduc...
- Patent number 6,566,272
- Issue date May 20, 2003
- Applied Materials Inc.
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Methods For Preventing Corrosion of Plasma-Exposed Yttria-Coated Co...
- Publication number 20120031426
- Publication date Feb 9, 2012
- LAM RESEARCH CORPORATION
- Ganapathy Swami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR RF PULSING OF A NARROW GAP CAPACITIVELY COUPLED REACTOR
- Publication number 20110263130
- Publication date Oct 27, 2011
- Peter Loewenhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PART ELECTRODE FOR A SEMICONDUCTOR PROCESSING PLASMA REACTOR...
- Publication number 20110067814
- Publication date Mar 24, 2011
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of sputtering a protective coating on a semiconductor subs...
- Publication number 20090020417
- Publication date Jan 22, 2009
- Jisoo Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
UNIFORM ETCH SYSTEM
- Publication number 20080210377
- Publication date Sep 4, 2008
- LAM RESEARCH CORPORATION
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PREVENTING DAMAGE TO LOW-K MATERIALS DURING RESIST STRIPPING
- Publication number 20070287292
- Publication date Dec 13, 2007
- LAM RESEARCH CORPORATION
- Siyi LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFERLESS AUTOMATIC CLEANING AFTER BARRIER REMOVAL
- Publication number 20070128849
- Publication date Jun 7, 2007
- LAM RESEARCH CORPORATION
- Xiaoqiang Sean Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer bevel polymer removal
- Publication number 20060051967
- Publication date Mar 9, 2006
- Lam Research Corporation
- Jeremy Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line edge roughness reduction for trench etch
- Publication number 20050277289
- Publication date Dec 15, 2005
- Eric Wagganer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Waferless automatic cleaning after barrier removal
- Publication number 20050233590
- Publication date Oct 20, 2005
- Lam Research Corporation
- Xiaoqiang Sean Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for the optimization of substrate etching in a plasma proce...
- Publication number 20050205519
- Publication date Sep 22, 2005
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature controlled hot edge ring assembly for reducing plasma r...
- Publication number 20050133164
- Publication date Jun 23, 2005
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line edge roughness reduction for trench etch
- Publication number 20050101126
- Publication date May 12, 2005
- Lam Research Corporation
- Eric Wagganer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-core transformer plasma source
- Publication number 20040226511
- Publication date Nov 18, 2004
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-core transformer plasma source
- Publication number 20040226658
- Publication date Nov 18, 2004
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-core transformer plasma source
- Publication number 20040226512
- Publication date Nov 18, 2004
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma stripping using periodic modulation of gas chemis...
- Publication number 20040224520
- Publication date Nov 11, 2004
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF pulsing of a narrow gap capacitively coupled reactor
- Publication number 20040221958
- Publication date Nov 11, 2004
- Lam Research Corporation
- Peter Loewenhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-core transformer plasma source
- Publication number 20040185610
- Publication date Sep 23, 2004
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-core transformer plasma source
- Publication number 20040182517
- Publication date Sep 23, 2004
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for selectively etching organosilicate glass with respect to...
- Publication number 20040140289
- Publication date Jul 22, 2004
- Lam Research Corporation
- Xingcai Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniform etch system
- Publication number 20040112540
- Publication date Jun 17, 2004
- Lam Research Corporation
- Dean J. Larson
- G05 - CONTROLLING REGULATING
Information Patent Application
Gas distribution system with tuning gas
- Publication number 20040112538
- Publication date Jun 17, 2004
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Uniform etch system
- Publication number 20040112539
- Publication date Jun 17, 2004
- Lam Research Corporation
- Dean J. Larson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-part electrode for a semiconductor processing plasma reactor...
- Publication number 20040074609
- Publication date Apr 22, 2004
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature controlled dome-coil system for high power inductively...
- Publication number 20040065645
- Publication date Apr 8, 2004
- Applied Materials, Inc.
- Michael Welch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processor with electrode simultaneously responsive to plural...
- Publication number 20040000875
- Publication date Jan 1, 2004
- Vahid Vahedi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method for confining an RF plasma u...
- Publication number 20030151371
- Publication date Aug 14, 2003
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-core transformer plasma source
- Publication number 20030085205
- Publication date May 8, 2003
- Applied Materials, Inc.
- Canfeng Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Toroidal plasma source for plasma processing
- Publication number 20020157793
- Publication date Oct 31, 2002
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS

Peter K. Loewenhardt

Person

Patents Grantslast 30 patents

Uniform etch system

Multi-part electrode for a semiconductor processing plasma reactor...

Methods for preventing corrosion of plasma-exposed yttria-coated co...

Methods for RF pulsing of a narrow gap capacitively coupled reactor

RF pulsing of a narrow gap capacitively coupled reactor

Multi-part electrode for a semiconductor processing plasma reactor...

Methods of sputtering a protective coating on a semiconductor subst...

Wafer bevel polymer removal

Preventing damage to low-k materials during resist stripping

Uniform etch system

Multi-core transformer plasma source

Method for plasma stripping using periodic modulation of gas chemis...

Temperature controlled hot edge ring assembly for reducing plasma r...

Preventing damage to low-k materials during resist stripping

Waferless automatic cleaning after barrier removal

Gas distribution system with tuning gas

Methods for the optimization of substrate etching in a plasma proce...

Method for selectively etching organosilicate glass with respect to...

Methods and apparatus for inspecting contact openings in a plasma p...

Methods and apparatus for the optimization of photo resist etching...

Line edge roughness reduction for trench etch

Plasma processor with electrode simultaneously responsive to plural...

Temperature controlled dome-coil system for high power inductively...

Multi-core transformer plasma source

Plasma processing apparatus and method for confining an RF plasma u...

Toroidal plasma source for plasma processing

Shaping a plasma with a magnetic field to control etch rate uniformity

Chamber cleaning with fluorides of iodine

Method for enhancing plasma processing performance

Method for providing pulsed plasma during a portion of a semiconduc...

Patents Applicationslast 30 patents

Methods For Preventing Corrosion of Plasma-Exposed Yttria-Coated Co...

METHODS FOR RF PULSING OF A NARROW GAP CAPACITIVELY COUPLED REACTOR

MULTI-PART ELECTRODE FOR A SEMICONDUCTOR PROCESSING PLASMA REACTOR...

Methods of sputtering a protective coating on a semiconductor subs...

UNIFORM ETCH SYSTEM

PREVENTING DAMAGE TO LOW-K MATERIALS DURING RESIST STRIPPING

WAFERLESS AUTOMATIC CLEANING AFTER BARRIER REMOVAL

Wafer bevel polymer removal

Line edge roughness reduction for trench etch

Waferless automatic cleaning after barrier removal

Methods for the optimization of substrate etching in a plasma proce...

Temperature controlled hot edge ring assembly for reducing plasma r...

Line edge roughness reduction for trench etch

Multi-core transformer plasma source

Multi-core transformer plasma source

Multi-core transformer plasma source

Method for plasma stripping using periodic modulation of gas chemis...

RF pulsing of a narrow gap capacitively coupled reactor

Multi-core transformer plasma source

Multi-core transformer plasma source

Method for selectively etching organosilicate glass with respect to...

Uniform etch system

Gas distribution system with tuning gas

Uniform etch system

Multi-part electrode for a semiconductor processing plasma reactor...

Temperature controlled dome-coil system for high power inductively...

Plasma processor with electrode simultaneously responsive to plural...

Plasma processing apparatus and method for confining an RF plasma u...

Multi-core transformer plasma source

Toroidal plasma source for plasma processing