Peter Nicholas Heys

Person

Wistaston, GB

People

Patents Grantslast 30 patents

Information Patent Grant
Molybdenum (IV) amide precursors and use thereof in atomic layer de...
- Patent number 9,802,220
- Issue date Oct 31, 2017
- Merck Patent GmbH
- Peter Nicholas Heys
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of atomic layer deposition using titanium-based precursors
- Patent number RE45124
- Issue date Sep 9, 2014
- Sigma-Aldrich Co. LLC
- Peter Nicholas Heys
- 427 - Coating processes
Information Patent Grant
Methods of producing high-K dielectric films using cerium-based pre...
- Patent number 8,613,975
- Issue date Dec 24, 2013
- Sigma-Aldrich Co. LLC
- Paul Raymond Chalker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Use of cyclopentadienyl type hafnium and zirconium precursors in at...
- Patent number 8,568,530
- Issue date Oct 29, 2013
- Sigma-Aldrich Co. LLC
- Peter Nicholas Heys
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of atomic layer deposition using titanium-based precursors
- Patent number 8,221,852
- Issue date Jul 17, 2012
- Sigma-Aldrich Co. LLC
- Peter Nicholas Heys
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of atomic layer deposition using hafnium and zirconium-base...
- Patent number 8,039,062
- Issue date Oct 18, 2011
- Sigma-Aldrich Co. LLC
- Peter Nicholas Heys
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
MOLYBDENUM (IV) AMIDE PRECURSORS AND USE THEREOF IN ATOMIC LAYER DE...
- Publication number 20130196065
- Publication date Aug 1, 2013
- Sigma-Aldrich Co. LLC
- Peter Nicholas Heys
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPOSITIONS AND METHODS OF USE FOR FORMING TITANIUM-CONTAINING THI...
- Publication number 20120178266
- Publication date Jul 12, 2012
- SIGMA-AIDRICH CO. LLC
- Peter Nicholas Heys
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-K DIELECTRIC FILMS AND METHODS OF PRODUCING USING CERIUM-BASED...
- Publication number 20110165401
- Publication date Jul 7, 2011
- Sigma-Aldrich Co.
- Paul Raymond Chalker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-K DIELECTRIC FILMS AND METHODS OF PRODUCING USING TITANIUM-BAS...
- Publication number 20110151227
- Publication date Jun 23, 2011
- Sigma-Aldrich Co.
- Paul Raymond Chalker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF ATOMIC LAYER DEPOSITION USING HAFNIUM AND ZIRCONIUM-BASE...
- Publication number 20090081385
- Publication date Mar 26, 2009
- Peter Nicholas Heys
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF ATOMIC LAYER DEPOSITION USING TITANIUM-BASED PRECURSORS
- Publication number 20090074983
- Publication date Mar 19, 2009
- Peter Nicholas Heys
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cyclopentadienyl Type Hafnium and Zirconium Precursors and Use Ther...
- Publication number 20080282970
- Publication date Nov 20, 2008
- Peter Nicholas Heys
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Peter Nicholas Heys

Person

Patents Grantslast 30 patents

Molybdenum (IV) amide precursors and use thereof in atomic layer de...

Methods of atomic layer deposition using titanium-based precursors

Methods of producing high-K dielectric films using cerium-based pre...

Use of cyclopentadienyl type hafnium and zirconium precursors in at...

Methods of atomic layer deposition using titanium-based precursors

Methods of atomic layer deposition using hafnium and zirconium-base...

Patents Applicationslast 30 patents

MOLYBDENUM (IV) AMIDE PRECURSORS AND USE THEREOF IN ATOMIC LAYER DE...

COMPOSITIONS AND METHODS OF USE FOR FORMING TITANIUM-CONTAINING THI...

HIGH-K DIELECTRIC FILMS AND METHODS OF PRODUCING USING CERIUM-BASED...

HIGH-K DIELECTRIC FILMS AND METHODS OF PRODUCING USING TITANIUM-BAS...

METHODS OF ATOMIC LAYER DEPOSITION USING HAFNIUM AND ZIRCONIUM-BASE...

METHODS OF ATOMIC LAYER DEPOSITION USING TITANIUM-BASED PRECURSORS

Cyclopentadienyl Type Hafnium and Zirconium Precursors and Use Ther...