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Petrus Anton Willem Cornelia Maria Van Eijck
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Budel, NL
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Patents Grants
last 30 patents
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Patent Grant
Substrate placement in immersion lithography
Patent number
10,345,711
Issue date
Jul 9, 2019
ASML Netherlands B.V.
Christiaan Alexander Hoogendam
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Patent Grant
Substrate placement in immersion lithography
Patent number
9,740,106
Issue date
Aug 22, 2017
ASML Netherlands B.V.
Christiaan Alexander Hoogendam
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Substrate placement in immersion lithography
Patent number
9,182,222
Issue date
Nov 10, 2015
ASML Netherlands B.V.
Christiaan Alexander Hoogendam
G01 - MEASURING TESTING
Information
Patent Grant
Substrate placement in immersion lithography
Patent number
8,441,617
Issue date
May 14, 2013
ASML Netherlands B.V.
Christiaan Alexander Hoogendam
G01 - MEASURING TESTING
Patents Applications
last 30 patents
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Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
Publication number
20180067401
Publication date
Mar 8, 2018
ASML NETHERLANDS B.V.
Christiaan Alexander Hoogendam
G01 - MEASURING TESTING
Information
Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
Publication number
20160054665
Publication date
Feb 25, 2016
ASML NETHERLANDS B.V.
Christiaan Alexander Hoogendam
G01 - MEASURING TESTING
Information
Patent Application
SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY
Publication number
20130182231
Publication date
Jul 18, 2013
ASML NETHERLANDS B.V.
Christiaan Alexander Hoogendam
G01 - MEASURING TESTING