Phil Freiberger

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Advanced mask patterning with patterning layer
- Patent number 8,734,660
- Issue date May 27, 2014
- Intel Corporation
- Jian Ma
- B44 - DECORATIVE ARTS
Information Patent Grant
Advanced mask patterning with patterning layer
- Patent number 7,460,209
- Issue date Dec 2, 2008
- Intel Corporation
- Jian Ma
- B44 - DECORATIVE ARTS
Information Patent Grant
High density TEOS-based film for intermetal dielectrics
- Patent number 5,389,581
- Issue date Feb 14, 1995
- Intel Corporation
- Philip Freiberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
TEOS intermetal dielectric preclean for VIA formation
- Patent number 5,219,791
- Issue date Jun 15, 1993
- Intel Corporation
- Philip E. Freiberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anneal to decrease moisture absorbance of intermetal dielectrics
- Patent number 5,139,971
- Issue date Aug 18, 1992
- Intel Corporation
- Ragupathy V. Giridhar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of interpoly dielctric for EPROM-related technologies
- Patent number 5,104,819
- Issue date Apr 14, 1992
- Intel Corporation
- Philip E. Freiberger
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ADVANCED MASK PATTERNING WITH PATTERNING LAYER
- Publication number 20080308527
- Publication date Dec 18, 2008
- Intel Corporation
- JIAN MA
- B44 - DECORATIVE ARTS
Information Patent Application
Advanced mask patterning with patterning layer
- Publication number 20060215135
- Publication date Sep 28, 2006
- Jian Ma
- B44 - DECORATIVE ARTS