Phillip Chen

Person

Bethel, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Vapor deposition precursor compounds and process of use
- Patent number 12,209,105
- Issue date Jan 28, 2025
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition processes using ruthenium precursor and r...
- Patent number 11,987,878
- Issue date May 21, 2024
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cobalt precursors
- Patent number 11,761,086
- Issue date Sep 19, 2023
- Entegris, Inc.
- Thomas H. Baum
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Methods for depositing tungsten or molybdenum films
- Patent number 11,761,081
- Issue date Sep 19, 2023
- Entegris, Inc.
- Robert Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum...
- Patent number 11,560,625
- Issue date Jan 24, 2023
- Entegris, Inc.
- Robert Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cobalt deposition selectivity on copper and dielectrics
- Patent number 11,476,158
- Issue date Oct 18, 2022
- Entegris, Inc.
- Philip S. H. Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor deposition precursor compounds and process of use
- Patent number 11,466,038
- Issue date Oct 11, 2022
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical vapor deposition processes using ruthenium precursor and r...
- Patent number 11,371,138
- Issue date Jun 28, 2022
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD Mo deposition by using MoOCl4
- Patent number 11,107,675
- Issue date Aug 31, 2021
- Entegris, Inc.
- Thomas H. Baum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alloys of Co to reduce stress
- Patent number 10,793,947
- Issue date Oct 6, 2020
- Entegris, Inc.
- Philip S. H. Chen
- B32 - LAYERED PRODUCTS
Information Patent Grant
ALD processes for low leakage current and low equivalent oxide thic...
- Patent number 10,186,570
- Issue date Jan 22, 2019
- Entegris, Inc.
- Bryan C. Hendrix
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Cobalt CVD
- Patent number 9,997,362
- Issue date Jun 12, 2018
- Entegris, Inc.
- Thomas H. Baum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tellurium compounds useful for deposition of tellurium containing m...
- Patent number 9,537,095
- Issue date Jan 3, 2017
- Entegris, Inc.
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 9,219,232
- Issue date Dec 22, 2015
- Entegris, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony compounds useful for deposition of antimony-containing mat...
- Patent number 9,034,688
- Issue date May 19, 2015
- Entegris, Inc.
- Tianniu Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tellurium compounds useful for deposition of tellurium containing m...
- Patent number 8,796,068
- Issue date Aug 5, 2014
- Advanced Technology Materials, Inc.
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 8,709,863
- Issue date Apr 29, 2014
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony compounds useful for deposition of antimony-containing mat...
- Patent number 8,674,127
- Issue date Mar 18, 2014
- Advanced Technology Materials, Inc.
- Tianniu Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High concentration nitrogen-containing germanium telluride based me...
- Patent number 8,330,136
- Issue date Dec 11, 2012
- Advanced Technology Materials, Inc.
- Jun-Fei Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 8,268,665
- Issue date Sep 18, 2012
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and process for sensing fluoro species in semiconductor p...
- Patent number 8,109,130
- Issue date Feb 7, 2012
- Advanced Technology Materials, Inc.
- Frank Dimeo, Jr.
- G01 - MEASURING TESTING
Information Patent Grant
Amorphous Ge/Te deposition process
- Patent number 8,093,140
- Issue date Jan 10, 2012
- Advanced Technology Materials, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 8,008,117
- Issue date Aug 30, 2011
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Antimony and germanium complexes useful for CVD/ALD of metal thin f...
- Patent number 7,838,329
- Issue date Nov 23, 2010
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and process for sensing fluoro species in semiconductor p...
- Patent number 7,475,588
- Issue date Jan 13, 2009
- Advanced Technology Materials, Inc.
- Frank Dimeo, Jr.
- G01 - MEASURING TESTING
Information Patent Grant
Gas sensor with attenuated drift characteristic
- Patent number 7,370,511
- Issue date May 13, 2008
- MST Technology GmbH
- Ing-Shin Chen
- G01 - MEASURING TESTING
Information Patent Grant
Nickel-coated free-standing silicon carbide structure for sensing f...
- Patent number 7,296,458
- Issue date Nov 20, 2007
- Advanced Technology Materials, Inc.
- Frank Dimeo, Jr.
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and process for sensing fluoro species in semiconductor p...
- Patent number 7,296,460
- Issue date Nov 20, 2007
- Advanced Technology Materials, Inc.
- Frank Dimeo, Jr.
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and process for sensing target gas species in semiconduct...
- Patent number 7,228,724
- Issue date Jun 12, 2007
- Advanced Technology Materials, Inc.
- Philip S. H. Chen
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and process for sensing fluoro species in semiconductor p...
- Patent number 7,080,545
- Issue date Jul 25, 2006
- Advanced Technology Materials, Inc.
- Frank Dimeo, Jr.
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE RUTHENIUM DEPOSITION AND RELATED SYSTEMS AND METHODS
- Publication number 20240412981
- Publication date Dec 12, 2024
- Entegris, Inc.
- Phil S.H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SELECTIVE DEPOSITION OF PRECURSOR MATERIALS AND RELATED...
- Publication number 20240170290
- Publication date May 23, 2024
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING TUNGSTEN OR MOLYBDENUM FILMS
- Publication number 20240035157
- Publication date Feb 1, 2024
- Entegris, Inc.
- Robert WRIGHT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR PREPARING SILICON-RICH SILICON NITRIDE FILMS
- Publication number 20230279545
- Publication date Sep 7, 2023
- Entegris, Inc.
- Philip S. H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR SELECTIVELY DEPOSITING HIGHLY-CONDUCTIVE METAL FILMS
- Publication number 20230245894
- Publication date Aug 3, 2023
- Entegris, Inc.
- Philip S.H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR DEPOSITION OF MOLYBDENUM USING A BIS(ALKYL-ARENE) MOLYBDENUM...
- Publication number 20230128330
- Publication date Apr 27, 2023
- Entegris, Inc.
- Robert Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE
- Publication number 20230041086
- Publication date Feb 9, 2023
- Entegris, Inc.
- Philip S.H. CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL VAPOR DEPOSITION PROCESSES USING RUTHENIUM PRECURSOR AND R...
- Publication number 20220267895
- Publication date Aug 25, 2022
- Entegris, Inc.
- Philip S.H. CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH THROUGHPUT DEPOSITION PROCESS
- Publication number 20220238330
- Publication date Jul 28, 2022
- Entegris, Inc.
- Philip S.H. CHEN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SILICON PRECURSOR COMPOUNDS AND METHOD FOR FORMING SILICON-CONTAINI...
- Publication number 20210395884
- Publication date Dec 23, 2021
- Entegris, Inc.
- Sungsil CHO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE
- Publication number 20210388008
- Publication date Dec 16, 2021
- Entegris, Inc.
- Philip S.H. CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUP VI METAL DEPOSITION PROCESS
- Publication number 20210062331
- Publication date Mar 4, 2021
- Entegris, Inc.
- Philip S.H. CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEALD PROCESSES USING RUTHENIUM PRECURSOR
- Publication number 20200157680
- Publication date May 21, 2020
- Entegris, Inc.
- Philip S.H. CHEN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICAL VAPOR DEPOSITION PROCESSES USING RUTHENIUM PRECURSOR AND R...
- Publication number 20200149155
- Publication date May 14, 2020
- Entegris, Inc.
- Philip S.H. CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING MOLYBDENUM FILMS ON A SUBSTRATE
- Publication number 20200131628
- Publication date Apr 30, 2020
- Entegris, Inc.
- Thomas H. BAUM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING TUNGSTEN OR MOLYBDENUM FILMS
- Publication number 20200115798
- Publication date Apr 16, 2020
- Entegris, Inc.
- Robert WRIGHT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR DEPOSITION OF MOLYBDENUM USING A BIS(ALKYL-ARENE) MOLYBDENUM...
- Publication number 20190226086
- Publication date Jul 25, 2019
- Entegris, Inc.
- Robert Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD Mo DEPOSITION BY USING MoOCl4
- Publication number 20180286668
- Publication date Oct 4, 2018
- Entegris, Inc.
- Thomas H. Baum
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COBALT DEPOSITION SELECTIVITY ON COPPER AND DIELECTRICS
- Publication number 20180130706
- Publication date May 10, 2018
- Entegris, Inc.
- Philip S.H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALLOYS OF Co TO REDUCE STRESS
- Publication number 20180044788
- Publication date Feb 15, 2018
- Entegris, Inc.
- Philip S.H. Chen
- B32 - LAYERED PRODUCTS
Information Patent Application
CVD Mo DEPOSITION BY USING MoOCl4
- Publication number 20180019165
- Publication date Jan 18, 2018
- Entegris, Inc.
- Thomas H. Baum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COBALT CVD
- Publication number 20170032973
- Publication date Feb 2, 2017
- Entegris, Inc.
- Thomas H. Baum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COBALT PRECURSORS
- Publication number 20160369402
- Publication date Dec 22, 2016
- Entegris, Inc.
- Thomas H. Baum
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THIC...
- Publication number 20150364537
- Publication date Dec 17, 2015
- ATMI Korea Co., Ltd
- Bryan C. Hendrix
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...
- Publication number 20140329357
- Publication date Nov 6, 2014
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...
- Publication number 20140220733
- Publication date Aug 7, 2014
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTIMONY COMPOUNDS USEFUL FOR DEPOSITION OF ANTIMONY-CONTAINING MAT...
- Publication number 20140206136
- Publication date Jul 24, 2014
- Advanced Technology Materials, Inc.
- Tianniu Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...
- Publication number 20130288462
- Publication date Oct 31, 2013
- Matthias Stender
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...
- Publication number 20130029456
- Publication date Jan 31, 2013
- Advanced Technology Materials, Inc.
- William Hunks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMORPHOUS GE/TE DEPOSITION PROCESS
- Publication number 20120108038
- Publication date May 3, 2012
- Advanced Technology Materials, Inc.
- Philip S.H. Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Phillip Chen

Person

Patents Grantslast 30 patents

Vapor deposition precursor compounds and process of use

Chemical vapor deposition processes using ruthenium precursor and r...

Cobalt precursors

Methods for depositing tungsten or molybdenum films

Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum...

Cobalt deposition selectivity on copper and dielectrics

Vapor deposition precursor compounds and process of use

Chemical vapor deposition processes using ruthenium precursor and r...

CVD Mo deposition by using MoOCl4

Alloys of Co to reduce stress

ALD processes for low leakage current and low equivalent oxide thic...

Cobalt CVD

Tellurium compounds useful for deposition of tellurium containing m...

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Antimony compounds useful for deposition of antimony-containing mat...

Tellurium compounds useful for deposition of tellurium containing m...

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Antimony compounds useful for deposition of antimony-containing mat...

High concentration nitrogen-containing germanium telluride based me...

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Apparatus and process for sensing fluoro species in semiconductor p...

Amorphous Ge/Te deposition process

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Antimony and germanium complexes useful for CVD/ALD of metal thin f...

Apparatus and process for sensing fluoro species in semiconductor p...

Gas sensor with attenuated drift characteristic

Nickel-coated free-standing silicon carbide structure for sensing f...

Apparatus and process for sensing fluoro species in semiconductor p...

Apparatus and process for sensing target gas species in semiconduct...

Apparatus and process for sensing fluoro species in semiconductor p...

Patents Applicationslast 30 patents

SELECTIVE RUTHENIUM DEPOSITION AND RELATED SYSTEMS AND METHODS

METHODS FOR SELECTIVE DEPOSITION OF PRECURSOR MATERIALS AND RELATED...

METHODS FOR DEPOSITING TUNGSTEN OR MOLYBDENUM FILMS

PROCESS FOR PREPARING SILICON-RICH SILICON NITRIDE FILMS

PROCESS FOR SELECTIVELY DEPOSITING HIGHLY-CONDUCTIVE METAL FILMS

VAPOR DEPOSITION OF MOLYBDENUM USING A BIS(ALKYL-ARENE) MOLYBDENUM...

VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE

CHEMICAL VAPOR DEPOSITION PROCESSES USING RUTHENIUM PRECURSOR AND R...

HIGH THROUGHPUT DEPOSITION PROCESS

SILICON PRECURSOR COMPOUNDS AND METHOD FOR FORMING SILICON-CONTAINI...

VAPOR DEPOSITION PRECURSOR COMPOUNDS AND PROCESS OF USE

GROUP VI METAL DEPOSITION PROCESS

PEALD PROCESSES USING RUTHENIUM PRECURSOR

CHEMICAL VAPOR DEPOSITION PROCESSES USING RUTHENIUM PRECURSOR AND R...

METHOD FOR FORMING MOLYBDENUM FILMS ON A SUBSTRATE

METHODS FOR DEPOSITING TUNGSTEN OR MOLYBDENUM FILMS

VAPOR DEPOSITION OF MOLYBDENUM USING A BIS(ALKYL-ARENE) MOLYBDENUM...

CVD Mo DEPOSITION BY USING MoOCl4

COBALT DEPOSITION SELECTIVITY ON COPPER AND DIELECTRICS

ALLOYS OF Co TO REDUCE STRESS

CVD Mo DEPOSITION BY USING MoOCl4

COBALT CVD

COBALT PRECURSORS

ALD PROCESSES FOR LOW LEAKAGE CURRENT AND LOW EQUIVALENT OXIDE THIC...

TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...

ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...

ANTIMONY COMPOUNDS USEFUL FOR DEPOSITION OF ANTIMONY-CONTAINING MAT...

TELLURIUM COMPOUNDS USEFUL FOR DEPOSITION OF TELLURIUM CONTAINING M...

ANTIMONY AND GERMANIUM COMPLEXES USEFUL FOR CVD/ALD OF METAL THIN F...

AMORPHOUS GE/TE DEPOSITION PROCESS