Phillip D. Hustad

Person

Longmont, CO, US

People

Patents Applicationslast 30 patents

Information Patent Application
MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION
- Publication number 20250233019
- Publication date Jul 17, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASKING PROCESS USING SWITCHABLE POLYMER
- Publication number 20250216782
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE
- Publication number 20250216790
- Publication date Jul 3, 2025
- TOKYO ELECTON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION
- Publication number 20250216784
- Publication date Jul 3, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...
- Publication number 20250216763
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER
- Publication number 20250216783
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE
- Publication number 20250218775
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTIMIZATION FOR LOCAL CHEMICAL EXPOSURE
- Publication number 20250132207
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GENERATION OF MULTILINE ETCH SUBSTRATES
- Publication number 20250132166
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NARROW LINE CUT MASKING PROCESS
- Publication number 20250132156
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY
- Publication number 20250130501
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING
- Publication number 20250068064
- Publication date Feb 27, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...
- Publication number 20240419079
- Publication date Dec 19, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-ALIGNED BUILD-UP PROCESSING
- Publication number 20240404828
- Publication date Dec 5, 2024
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING
- Publication number 20240377749
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Phillip D. Hustad

Person

Patents Applicationslast 30 patents

MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION

MASKING PROCESS USING SWITCHABLE POLYMER

MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE

IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION

ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...

ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER

MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE

OPTIMIZATION FOR LOCAL CHEMICAL EXPOSURE

GENERATION OF MULTILINE ETCH SUBSTRATES

NARROW LINE CUT MASKING PROCESS

ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY

ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING

CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...

SELF-ALIGNED BUILD-UP PROCESSING

ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES