Phillip D. Hustad

Person

Longmont, CO, US

People

Patents Applicationslast 30 patents

Information Patent Application
MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION
- Publication number 20250233019
- Publication date Jul 17, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASKING PROCESS USING SWITCHABLE POLYMER
- Publication number 20250216782
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE
- Publication number 20250216790
- Publication date Jul 3, 2025
- TOKYO ELECTON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION
- Publication number 20250216784
- Publication date Jul 3, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...
- Publication number 20250216763
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE
- Publication number 20250218775
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER
- Publication number 20250216783
- Publication date Jul 3, 2025
- TOKYO ELECTRON LIMITED
- Phillip D. Hustad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION FOR LOCAL CHEMICAL EXPOSURE
- Publication number 20250132207
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GENERATION OF MULTILINE ETCH SUBSTRATES
- Publication number 20250132166
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NARROW LINE CUT MASKING PROCESS
- Publication number 20250132156
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY
- Publication number 20250130501
- Publication date Apr 24, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING
- Publication number 20250068064
- Publication date Feb 27, 2025
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...
- Publication number 20240419079
- Publication date Dec 19, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-ALIGNED BUILD-UP PROCESSING
- Publication number 20240404828
- Publication date Dec 5, 2024
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING
- Publication number 20240377749
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Phillip D. Hustad

Person

Patents Applicationslast 30 patents

MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION

MASKING PROCESS USING SWITCHABLE POLYMER

MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE

IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION

ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIF...

MATERIALS AND METHODS FOR FORMING PATTERNED MASK ON SUBSTRATE

ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER

OPTIMIZATION FOR LOCAL CHEMICAL EXPOSURE

GENERATION OF MULTILINE ETCH SUBSTRATES

NARROW LINE CUT MASKING PROCESS

ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY

ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING

CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...

SELF-ALIGNED BUILD-UP PROCESSING

ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES