Phillip Joe Brock

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoacid generating polymers containing a urethane linkage for lit...
- Patent number 9,851,639
- Issue date Dec 26, 2017
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified photoresist composition and process for its use
- Patent number 9,057,951
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-patternable dielectric materials and formulations and methods...
- Patent number 9,012,587
- Issue date Apr 21, 2015
- International Business Machines Corporation
- Robert David Allen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photo-patternable dielectric materials curable to porous dielectric...
- Patent number 9,006,373
- Issue date Apr 14, 2015
- International Business Machines Corporation
- Phillip J. Brock
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Self-topcoating resist for photolithography
- Patent number 8,945,808
- Issue date Feb 3, 2015
- International Business Machines Corporation
- Robert Allen David
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-patternable dielectric materials curable to porous dielectric...
- Patent number 8,946,371
- Issue date Feb 3, 2015
- International Business Machines Corporation
- Phillip J. Brock
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicon containing coating compositions and methods of use
- Patent number 8,802,347
- Issue date Aug 12, 2014
- International Business Machines Corporation
- Robert D. Allen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods of depolymerizing terephthalate polyesters
- Patent number 8,541,477
- Issue date Sep 24, 2013
- International Business Machines Corporation
- Abdullah M Alabdulrahman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming a relief pattern by e-beam lithography using chem...
- Patent number 8,470,516
- Issue date Jun 25, 2013
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded topcoat materials for immersion lithography
- Patent number 8,440,387
- Issue date May 14, 2013
- International Business Machines Corporation
- Robert D. Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photo-patternable dielectric materials and formulations and methods...
- Patent number 8,431,670
- Issue date Apr 30, 2013
- International Business Machines Corporation
- Robert David Allen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photo-patternable dielectric materials curable to porous dielectric...
- Patent number 8,389,663
- Issue date Mar 5, 2013
- International Business Machines Corporation
- Phillip Joe Brock
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
High contact angle topcoat material and use thereof in lithography...
- Patent number 8,034,532
- Issue date Oct 11, 2011
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopatternable dielectric materials for BEOL applications and met...
- Patent number 8,029,971
- Issue date Oct 4, 2011
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-topcoating photoresist for photolithography
- Patent number 7,951,524
- Issue date May 31, 2011
- International Business Machines Corporation
- Robert Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Spin-on antireflective coating for integration of patternable diele...
- Patent number 7,944,055
- Issue date May 17, 2011
- International Business Machines Corporation
- Robert D. Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photopatternable dielectric materials for BEOL applications and met...
- Patent number 7,919,225
- Issue date Apr 5, 2011
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of use for photopatternable dielectric materials for BEOL ap...
- Patent number 7,867,689
- Issue date Jan 11, 2011
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion topcoat materials with improved performance
- Patent number 7,855,045
- Issue date Dec 21, 2010
- International Business Machines Corporation
- Robert David Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for patterning a low activation energy photoresist
- Patent number 7,820,369
- Issue date Oct 26, 2010
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low activation energy dissolution modification agents for photoresi...
- Patent number 7,759,044
- Issue date Jul 20, 2010
- International Business Machines Corporation
- Robert David Allen
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Spin-on antireflective coating for integration of patternable diele...
- Patent number 7,709,370
- Issue date May 4, 2010
- International Business Machines Corporation
- Robert D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded topcoat materials for immersion lithography
- Patent number 7,678,537
- Issue date Mar 16, 2010
- International Business Machines Corporation
- Robert D. Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resists based on acid-catalyzed elimination of polar molec...
- Patent number 7,563,558
- Issue date Jul 21, 2009
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Topcoat material and use thereof in immersion lithography processes
- Patent number 7,521,172
- Issue date Apr 21, 2009
- International Business Machines Corporation
- Robert Allen David
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resists based on acid-catalyzed elimination of polar molec...
- Patent number 7,393,624
- Issue date Jul 1, 2008
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Low activation energy dissolution modification agents for photoresi...
- Patent number 7,358,029
- Issue date Apr 15, 2008
- International Business Machines Corporation
- Robert David Allen
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Stable encapsulant fluid capable of undergoing reversible Diels-Ald...
- Patent number 7,309,754
- Issue date Dec 18, 2007
- Hitachi Global Storage Technologies Netherlands B.V.
- Phillip Joe Brock
- G11 - INFORMATION STORAGE
Information Patent Grant
Negative resists based on a acid-catalyzed elimination of polar mol...
- Patent number 7,300,739
- Issue date Nov 27, 2007
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Immersion topcoat materials with improved performance
- Patent number 7,288,362
- Issue date Oct 30, 2007
- International Business Machines Corporation
- Robert David Allen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS...
- Publication number 20150189743
- Publication date Jul 2, 2015
- International Business Machines Corporation
- Robert D. Allen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS...
- Publication number 20130292163
- Publication date Nov 7, 2013
- International Business Machines Corporation
- Robert David Allen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LIT...
- Publication number 20130260313
- Publication date Oct 3, 2013
- Central Glass Co., Ltd.
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC...
- Publication number 20130207278
- Publication date Aug 15, 2013
- International Business Machines Corporation
- Phillip J. Brock
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC...
- Publication number 20130189836
- Publication date Jul 25, 2013
- International Business Machines Corporation
- Phillip J. Brock
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHODS OF DEPOLYMERIZING TEREPHTHALATE POLYESTERS
- Publication number 20120223270
- Publication date Sep 6, 2012
- KING ABDULAZIZ CITY FOR SCIENCE AND TECHNOLOGY
- Abdullah M. Alabdulrahman
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE
- Publication number 20110111345
- Publication date May 12, 2011
- International Business Machines Corporation
- Robert D. Allen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC...
- Publication number 20110083887
- Publication date Apr 14, 2011
- International Business Machines Corporation
- Phillip Joe Brock
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE
- Publication number 20110053083
- Publication date Mar 3, 2011
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS...
- Publication number 20110048787
- Publication date Mar 3, 2011
- International Business Machines Corporation
- Robert David Allen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method of Forming a Relief Pattern by E-Beam Lithography Using Chem...
- Publication number 20110045387
- Publication date Feb 24, 2011
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN-ON ANTIREFLECTIVE COATING FOR INTEGRATION OF PATTERNABLE DIELE...
- Publication number 20100207276
- Publication date Aug 19, 2010
- International Business Machines Corporation
- Robert D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
- Publication number 20100168337
- Publication date Jul 1, 2010
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND MET...
- Publication number 20090291389
- Publication date Nov 26, 2009
- International Business Machines Corporation
- Robert D. Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND MET...
- Publication number 20090233226
- Publication date Sep 17, 2009
- International Business Machines Corporation
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN-ON ANTIREFLECTIVE COATING FOR INTEGRATION OF PATTERNABLE DIELE...
- Publication number 20090081418
- Publication date Mar 26, 2009
- International Business Machines Corporation
- Robert D. Allen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
- Publication number 20080311506
- Publication date Dec 18, 2008
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY
- Publication number 20080311530
- Publication date Dec 18, 2008
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF USE FOR PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL AP...
- Publication number 20080286467
- Publication date Nov 20, 2008
- Robert D. Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative Resists Based on Acid-Catalyzed Elimination of Polar Molec...
- Publication number 20080233517
- Publication date Sep 25, 2008
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY
- Publication number 20080193879
- Publication date Aug 14, 2008
- Robert Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESI...
- Publication number 20080153034
- Publication date Jun 26, 2008
- Robert David Allen
- C07 - ORGANIC CHEMISTRY
Information Patent Application
IMMERSION TOPCOAT MATERIALS WITH IMPROVED PERFORMANCE
- Publication number 20080026330
- Publication date Jan 31, 2008
- International Business Machines Corporation
- Robert David Allen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resists based on acid-catalyzed elimination of polar molec...
- Publication number 20070259274
- Publication date Nov 8, 2007
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY
- Publication number 20070254235
- Publication date Nov 1, 2007
- International Business Machines Corporation
- ROBERT DAVID ALLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOPCOAT MATERIAL AND USE THEREOF IN IMMERSION LITHOGRAPHY PROCESSES
- Publication number 20070254237
- Publication date Nov 1, 2007
- International Business Machines Corporation
- ROBERT DAVID ALLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH CONTACT ANGLE TOPCOAT MATERIAL AND USE THEREOF IN LITHOGRAPHY...
- Publication number 20070254236
- Publication date Nov 1, 2007
- International Business Machines Corporation
- ROBERT DAVID ALLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low activation energy dissolution modification agents for photoresi...
- Publication number 20070231734
- Publication date Oct 4, 2007
- Robert David Allen
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Water castable-water strippable top coats for 193 nm immersion lith...
- Publication number 20070117040
- Publication date May 24, 2007
- International Business Machines Corporation
- Phillip Joe Brock
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NEGATIVE RESISTS BASED ON A ACID-CATALYZED ELIMINATION OF POLAR MOL...
- Publication number 20070026339
- Publication date Feb 1, 2007
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Phillip Joe Brock

Person

Patents Grantslast 30 patents

Photoacid generating polymers containing a urethane linkage for lit...

Chemically amplified photoresist composition and process for its use

Photo-patternable dielectric materials and formulations and methods...

Photo-patternable dielectric materials curable to porous dielectric...

Self-topcoating resist for photolithography

Photo-patternable dielectric materials curable to porous dielectric...

Silicon containing coating compositions and methods of use

Methods of depolymerizing terephthalate polyesters

Method of forming a relief pattern by e-beam lithography using chem...

Graded topcoat materials for immersion lithography

Photo-patternable dielectric materials and formulations and methods...

Photo-patternable dielectric materials curable to porous dielectric...

High contact angle topcoat material and use thereof in lithography...

Photopatternable dielectric materials for BEOL applications and met...

Self-topcoating photoresist for photolithography

Spin-on antireflective coating for integration of patternable diele...

Photopatternable dielectric materials for BEOL applications and met...

Method of use for photopatternable dielectric materials for BEOL ap...

Immersion topcoat materials with improved performance

Method for patterning a low activation energy photoresist

Low activation energy dissolution modification agents for photoresi...

Spin-on antireflective coating for integration of patternable diele...

Graded topcoat materials for immersion lithography

Negative resists based on acid-catalyzed elimination of polar molec...

Topcoat material and use thereof in immersion lithography processes

Negative resists based on acid-catalyzed elimination of polar molec...

Low activation energy dissolution modification agents for photoresi...

Stable encapsulant fluid capable of undergoing reversible Diels-Ald...

Negative resists based on a acid-catalyzed elimination of polar mol...

Immersion topcoat materials with improved performance

Patents Applicationslast 30 patents

PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS...

PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS...

PHOTOACID GENERATING POLYMERS CONTAINING A URETHANE LINKAGE FOR LIT...

PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC...

PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC...

METHODS OF DEPOLYMERIZING TEREPHTHALATE POLYESTERS

SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE

PHOTO-PATTERNABLE DIELECTRIC MATERIALS CURABLE TO POROUS DIELECTRIC...

CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE

PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS...

Method of Forming a Relief Pattern by E-Beam Lithography Using Chem...

SPIN-ON ANTIREFLECTIVE COATING FOR INTEGRATION OF PATTERNABLE DIELE...

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY

PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND MET...

PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND MET...

SPIN-ON ANTIREFLECTIVE COATING FOR INTEGRATION OF PATTERNABLE DIELE...

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY

GRADED TOPCOAT MATERIALS FOR IMMERSION LITHOGRAPHY

METHOD OF USE FOR PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL AP...

Negative Resists Based on Acid-Catalyzed Elimination of Polar Molec...

SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY

LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESI...

IMMERSION TOPCOAT MATERIALS WITH IMPROVED PERFORMANCE

Negative resists based on acid-catalyzed elimination of polar molec...

SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY

TOPCOAT MATERIAL AND USE THEREOF IN IMMERSION LITHOGRAPHY PROCESSES

HIGH CONTACT ANGLE TOPCOAT MATERIAL AND USE THEREOF IN LITHOGRAPHY...

Low activation energy dissolution modification agents for photoresi...

Water castable-water strippable top coats for 193 nm immersion lith...

NEGATIVE RESISTS BASED ON A ACID-CATALYZED ELIMINATION OF POLAR MOL...