Pieter Gerardus Jacobus SMORENBERG

Person

Rotterdam, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for controlling a manufacturing process and associated appar...
- Patent number 11,768,441
- Issue date Sep 26, 2023
- ASML Netherlands B.V.
- Peter Ten Berge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a manufacturing apparatus and associated app...
- Patent number 11,669,017
- Issue date Jun 6, 2023
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-field control of a lithographic process and associated apparatus
- Patent number 11,662,666
- Issue date May 30, 2023
- ASML Netherlands B.V.
- Rowin Meijerink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology based correction and control
- Patent number 11,448,973
- Issue date Sep 20, 2022
- ASML Netherlands B.V.
- Manouk Rijpstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...
- Publication number 20240045340
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS
- Publication number 20230288817
- Publication date Sep 14, 2023
- ASML NETHERLANDS B.V.
- Rowin MEIJERINK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...
- Publication number 20230108481
- Publication date Apr 6, 2023
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
- Publication number 20220365446
- Publication date Nov 17, 2022
- ASML NETHERLANDS B.V.
- Manouk RIJPSTRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A SAMPLING SCHEME, A SEMICONDUCTOR SUBSTRATE...
- Publication number 20220260920
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Pieter Gerardus Jacobus SMORENBERG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS
- Publication number 20220244649
- Publication date Aug 4, 2022
- ASML NETHERLANDS B.V.
- Pieter Gerardus Jacobus SMORENBERG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS
- Publication number 20220171295
- Publication date Jun 2, 2022
- ASML NETHERLANDS B.V.
- Rowin MEIJERINK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL
- Publication number 20210080837
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Manouk RIJPSTRA
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING APPARATUS AND ASSOCIATED APP...
- Publication number 20200278614
- Publication date Sep 3, 2020
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Pieter Gerardus Jacobus SMORENBERG

Person

Patents Grantslast 30 patents

Method for controlling a manufacturing process and associated appar...

Method for controlling a manufacturing apparatus and associated app...

Sub-field control of a lithographic process and associated apparatus

Computational metrology based correction and control

Patents Applicationslast 30 patents

METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...

SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS

METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...

COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL

METHOD FOR DETERMINING A SAMPLING SCHEME, A SEMICONDUCTOR SUBSTRATE...

SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS

SUB-FIELD CONTROL OF A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUS

COMPUTATIONAL METROLOGY BASED CORRECTION AND CONTROL

METHOD FOR CONTROLLING A MANUFACTURING APPARATUS AND ASSOCIATED APP...