Pieter Jacob KRAMER

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus operable to perform a measurement operation on a substrat...
- Patent number 10,444,632
- Issue date Oct 15, 2019
- ASML Netherlands B.V.
- Daan Maurits Slotboom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment modeling and a lithographic apparatus and exposure method...
- Patent number 10,095,131
- Issue date Oct 9, 2018
- ASML Netherlands B.V.
- Pieter Jacob Kramer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus operable to perform a measurement operation on a substrat...
- Patent number 9,989,858
- Issue date Jun 5, 2018
- ASML Netherlands B.V.
- Daan Maurits Slotboom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid supply system, a lithographic apparatus, a method of varying...
- Patent number 8,848,164
- Issue date Sep 30, 2014
- ASML Netherlands B.V.
- Laurentius Johannes Adrianus Van Bokhoven
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 8,564,757
- Issue date Oct 22, 2013
- ASML Netherlands B.V.
- Bauke Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,508,711
- Issue date Aug 13, 2013
- ASML Netherlands B.V.
- Arjan Hubrecht Josef Anna Martens
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and a method of measuring flow rate in a two...
- Patent number 8,446,561
- Issue date May 21, 2013
- ASML Netherlands B.V.
- Pieter Jacob Kramer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 8,432,531
- Issue date Apr 30, 2013
- ASML Netherlands B.V.
- Kornelis Tijmen Hoekerd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,319,157
- Issue date Nov 27, 2012
- ASML Netherlands B.V.
- Arjan Hubrecht Josef Anna Martens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC PROJECTION METHOD
- Publication number 20180095369
- Publication date Apr 5, 2018
- ASML NETHERLANDS B.V.
- Kevin VAN DE RUIT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND EXPOSURE METHOD
- Publication number 20170108783
- Publication date Apr 20, 2017
- ASML NETHERLANDS B.V.
- Pieter Jacob KRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS OPERABLE TO PERFORM A MEASUREMENT OPERATION ON A SUBSTRAT...
- Publication number 20160334713
- Publication date Nov 17, 2016
- ASML Netherlands B.V.
- Daan Maurits SLOTBOOM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPA...
- Publication number 20120069309
- Publication date Mar 22, 2012
- ASML NETHERLANDS B.V.
- Paul WILLEMS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING...
- Publication number 20110299051
- Publication date Dec 8, 2011
- ASML NETHERLANDS B.V.
- Laurentius Johannes Adrianus Van Bokhoven
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
- Publication number 20110080567
- Publication date Apr 7, 2011
- ASML NETHERLANDS B.V.
- Kornelis Tijmen HOEKERD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20110017724
- Publication date Jan 27, 2011
- ASML NETHERLANDS B.V.
- Arjan Hubrecht Josef Anna Martens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A METHOD OF MEASURING FLOW RATE IN A TWO...
- Publication number 20110013159
- Publication date Jan 20, 2011
- ASML NETHERLANDS B.V.
- Pieter Jacob Kramer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
- Publication number 20100328634
- Publication date Dec 30, 2010
- ASML NETHERLANDS B.V.
- Bauke Jansen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING...
- Publication number 20100208221
- Publication date Aug 19, 2010
- ASML NETHERLANDS B.V.
- Pieter Jacob Kramer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20100045951
- Publication date Feb 25, 2010
- ASML NETHERLANDS B.V.
- Arjan Hubrecht Josef Anna MARTENS
- G01 - MEASURING TESTING

Pieter Jacob KRAMER

Person

Patents Grantslast 30 patents

Apparatus operable to perform a measurement operation on a substrat...

Alignment modeling and a lithographic apparatus and exposure method...

Apparatus operable to perform a measurement operation on a substrat...

Fluid supply system, a lithographic apparatus, a method of varying...

Lithographic apparatus and a method of operating the apparatus

Lithographic apparatus and device manufacturing method

Lithographic apparatus and a method of measuring flow rate in a two...

Lithographic apparatus and a method of operating the apparatus

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC PROJECTION METHOD

LITHOGRAPHIC APPARATUS AND EXPOSURE METHOD

APPARATUS OPERABLE TO PERFORM A MEASUREMENT OPERATION ON A SUBSTRAT...

FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPA...

FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING...

LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND A METHOD OF MEASURING FLOW RATE IN A TWO...

LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS

FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD