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Pieter-Jan VAN ZWOL

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  • Eindhoven, NL
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Patents Grantslast 30 patents

  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 12,117,726
    • Issue date Oct 15, 2024
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Method of manufacturing a membrane assembly
    • Patent number 12,072,620
    • Issue date Aug 27, 2024
    • ASML Netherlands B.V.
    • Pieter-Jan Van Zwol
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 12,066,758
    • Issue date Aug 20, 2024
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle for EUV lithography
    • Patent number 11,977,326
    • Issue date May 7, 2024
    • ASML Netherlands B.V.
    • Dennis De Graaf
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Metal-silicide-nitridation for stress reduction
    • Patent number 11,971,654
    • Issue date Apr 30, 2024
    • ASML Netherlands B.V.
    • Pieter-Jan Van Zwol
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Simultaneous double-side coating of multilayer graphene pellicle by...
    • Patent number 11,947,256
    • Issue date Apr 2, 2024
    • ASML Netherlands B.V.
    • Evgenia Kurganova
    • C01 - INORGANIC CHEMISTRY
  • Information Patent Grant

    Membrane for EUV lithography
    • Patent number 11,762,281
    • Issue date Sep 19, 2023
    • ASML Netherlands B.V.
    • Maxim Aleksandrovich Nasalevich
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 11,754,918
    • Issue date Sep 12, 2023
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Metal-silicide-nitridation for stress reduction
    • Patent number 11,686,997
    • Issue date Jun 27, 2023
    • ASML Netherlands B.V.
    • Pieter-Jan Van Zwol
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Graphene pellicle lithographic apparatus
    • Patent number 11,467,486
    • Issue date Oct 11, 2022
    • ASML Netherlands B.V.
    • Evgenia Kurganova
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 11,347,142
    • Issue date May 31, 2022
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Membrane for EUV lithography
    • Patent number 11,320,731
    • Issue date May 3, 2022
    • ASML Netherlands B.V.
    • Pieter-Jan Van Zwol
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle frame and pellicle assembly
    • Patent number 11,314,163
    • Issue date Apr 26, 2022
    • ASML Netherlands B.V.
    • Anton Wilhelmus Duys
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Metal-silicide-nitridation for stress reduction
    • Patent number 11,287,737
    • Issue date Mar 29, 2022
    • ASML Netherlands B.V.
    • Pieter-Jan Van Zwol
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 11,231,646
    • Issue date Jan 25, 2022
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Method and apparatus for detecting substrate surface variations
    • Patent number 11,092,902
    • Issue date Aug 17, 2021
    • ASML Netherlands B.V.
    • Johannes Franciscus Martinus D'Achard Van Enschut
    • G01 - MEASURING TESTING
  • Information Patent Grant

    Membrane assembly
    • Patent number 11,036,128
    • Issue date Jun 15, 2021
    • ASML Netherlands B.V.
    • Derk Servatius Gertruda Brouns
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 10,983,431
    • Issue date Apr 20, 2021
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Membrane for EUV lithography
    • Patent number 10,908,496
    • Issue date Feb 2, 2021
    • ASML Netherlands B.V.
    • Maxim Aleksandrovich Nasalevich
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Patterning device
    • Patent number 10,732,498
    • Issue date Aug 4, 2020
    • ASML Netherlands B.V.
    • Pieter Cristiaan De Groot
    • G02 - OPTICS
  • Information Patent Grant

    Method for manufacturing a membrane assembly
    • Patent number 10,712,656
    • Issue date Jul 14, 2020
    • ASML Netherlands B.V.
    • Zomer Silvester Houweling
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Membranes for use within a lithographic apparatus and a lithographi...
    • Patent number 10,698,312
    • Issue date Jun 30, 2020
    • ASML Netherlands B.V.
    • Pieter-Jan Van Zwol
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Pellicle and pellicle assembly
    • Patent number 10,466,585
    • Issue date Nov 5, 2019
    • ASML Netherlands B.V.
    • David Ferdinand Vles
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Patterning device
    • Patent number 10,401,723
    • Issue date Sep 3, 2019
    • ASML Netherlands B.V.
    • Pieter Cristiaan De Groot
    • G02 - OPTICS
  • Information Patent Grant

    Radiation system and optical device
    • Patent number 10,359,710
    • Issue date Jul 23, 2019
    • ASML Netherlands B.V.
    • Hendrikus Gijsbertus Schimmel
    • G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
  • Information Patent Grant

    Membranes for use within a lithographic apparatus and a lithographi...
    • Patent number 10,228,615
    • Issue date Mar 12, 2019
    • ASML Netherlands B.V.
    • Andrey Alexandrovich Nikipelov
    • G02 - OPTICS

Patents Applicationslast 30 patents

  • Information Patent Application

    METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
    • Publication number 20240369920
    • Publication date Nov 7, 2024
    • ASML NETHERLANDS B.V.
    • Pieter-Jan VAN ZWOL
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
    • Publication number 20240302734
    • Publication date Sep 12, 2024
    • ASML NETHERLANDS B.V.
    • Pieter-Jan VAN ZWOL
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PELLICLE FOR EUV LITHOGRAPHY
    • Publication number 20240302736
    • Publication date Sep 12, 2024
    • ASML NETHERLANDS B.V.
    • Dennis DE GRAAF
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20240027893
    • Publication date Jan 25, 2024
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20240004283
    • Publication date Jan 4, 2024
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich Nasalevich
    • G02 - OPTICS
  • Information Patent Application

    METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
    • Publication number 20230324786
    • Publication date Oct 12, 2023
    • ASML NETHERLANDS B.V.
    • Pieter-Jan VAN ZWOL
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PELLICLE MEMBRANE
    • Publication number 20220269165
    • Publication date Aug 25, 2022
    • ASML NETHERLANDS B.V.
    • Paul JANSSEN
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20220252974
    • Publication date Aug 11, 2022
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
    • Publication number 20220187701
    • Publication date Jun 16, 2022
    • ASML NETHERLANDS B.V.
    • Pieter-Jan VAN ZWOL
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20220121111
    • Publication date Apr 21, 2022
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    METHOD OF MANUFACTURING A MEMBRANE ASSEMBLY
    • Publication number 20220035239
    • Publication date Feb 3, 2022
    • ASML NETHERLANDS B.V.
    • Pieter-Jan VAN ZWOL
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    TRANSMISSIVE DIFFUSOR
    • Publication number 20210382209
    • Publication date Dec 9, 2021
    • ASML NETHERLANDS B.V.
    • Andrey NIKIPELOV
    • B82 - NANO-TECHNOLOGY
  • Information Patent Application

    PELLICLE FOR EUV LITHOGRAPHY
    • Publication number 20210240070
    • Publication date Aug 5, 2021
    • ASML NETHERLANDS B.V.
    • Dennis DE GRAAF
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20210208500
    • Publication date Jul 8, 2021
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
    • Publication number 20210181618
    • Publication date Jun 17, 2021
    • ASML NETHERLANDS B.V.
    • Pieter-Jan VAN ZWOL
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20210109438
    • Publication date Apr 15, 2021
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich Nasalevich
    • G02 - OPTICS
  • Information Patent Application

    GRAPHENE PELLICLE LITHOGRAPHIC APPARATUS
    • Publication number 20200406244
    • Publication date Dec 31, 2020
    • ASML NETHERLANDS B.V.
    • Evgenia KURGANOVA
    • B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
  • Information Patent Application

    PELLICLE FRAME AND PELLICLE ASSEMBLY
    • Publication number 20200319546
    • Publication date Oct 8, 2020
    • ASML NETHERLANDS B.V.
    • Anton Wilhelmus DUYS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20200209736
    • Publication date Jul 2, 2020
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    SIMULTANEOUS DOUBLE-SIDE COATING OF MULTILAYER GRAPHENE PELLICLE BY...
    • Publication number 20200159107
    • Publication date May 21, 2020
    • ASML NETHERLANDS B.V.
    • Evgenia KURGANOVA
    • B82 - NANO-TECHNOLOGY
  • Information Patent Application

    Method and Apparatus for Detecting Substrate Surface Variations
    • Publication number 20200124977
    • Publication date Apr 23, 2020
    • ASML Netherlands B.V.
    • Johannes Franciscus Martinus D'ACHARD VAN ENSCHUT
    • G01 - MEASURING TESTING
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20200064731
    • Publication date Feb 27, 2020
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Patterning Device
    • Publication number 20190324365
    • Publication date Oct 24, 2019
    • ASML NETHERLANDS B.V.
    • Pieter Cristiaan DE GROOT
    • G02 - OPTICS
  • Information Patent Application

    MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHI...
    • Publication number 20190146332
    • Publication date May 16, 2019
    • ASML NETHERLANDS B.V.
    • Pieter-Jan VAN ZWOL
    • G02 - OPTICS
  • Information Patent Application

    Patterning Device
    • Publication number 20190137861
    • Publication date May 9, 2019
    • ASML NETHERLANDS B.V.
    • Pieter Cristiaan DE GROOT
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    A MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20190129299
    • Publication date May 2, 2019
    • ASML NETHERLANDS B.V.
    • Maxim Aleksandrovich NASALEVICH
    • G02 - OPTICS
  • Information Patent Application

    METHOD OF MANUFACTURING A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A...
    • Publication number 20190056654
    • Publication date Feb 21, 2019
    • ASML NETHERLANDS B.V.
    • Mária PÉTER
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    A MEMBRANE FOR EUV LITHOGRAPHY
    • Publication number 20190011828
    • Publication date Jan 10, 2019
    • ASML NETHERLANDS B.V.
    • Pieter-Jan VAN ZWOL
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    A MEMBRANE ASSEMBLY
    • Publication number 20180373141
    • Publication date Dec 27, 2018
    • ASML NETHERLANDS B.V.
    • Derk Servatius Gertruda BROUNS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PELLICLE AND PELLICLE ASSEMBLY
    • Publication number 20180364561
    • Publication date Dec 20, 2018
    • ASML NETHERLANDS B.V.
    • David Ferdinand VLES
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY