Pin-Han Huang

Person

Tainan City, TW

People

Patents Applicationslast 30 patents

Information Patent Application
GOGGLE STRUCTURE HAVING FLIP-UP FUNCTION AND CAPABLE OF COVERING EY...
- Publication number 20250085566
- Publication date Mar 13, 2025
- OURAD SAFETY CO., LTD.
- PIN-TSUNG HUANG
- G02 - OPTICS
Information Patent Application
ENGAGING AND SECURING STRUCTURE OF FLIP-UP EYEGLASSES
- Publication number 20250085567
- Publication date Mar 13, 2025
- OURAD SAFETY CO., LTD.
- PIN-TSUNG HUANG
- G02 - OPTICS
Information Patent Application
COMBINED STRUCTURE OF LENS AND SOFT ELASTOMER
- Publication number 20250060613
- Publication date Feb 20, 2025
- OURAD SAFETY CO., LTD.
- PIN-TSUNG HUANG
- G02 - OPTICS
Information Patent Application
LIGHTWEIGHT INDUSTRIAL EYEGLASS STRUCTURE
- Publication number 20250060615
- Publication date Feb 20, 2025
- OURAD SAFETY CO., LTD.
- PIN-TSUNG HUANG
- G02 - OPTICS
Information Patent Application
DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...
- Publication number 20240353747
- Publication date Oct 24, 2024
- United Microelectronics Corp.
- Pin Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PHOTOMASK
- Publication number 20230408900
- Publication date Dec 21, 2023
- United Microelectronics Corp.
- Pin Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MAKING MASK PATTERN AND METHOD OF FORMING PATTERN IN LAYER
- Publication number 20220390828
- Publication date Dec 8, 2022
- UNITED MICROELECTRONICS CORP.
- Pin-Han Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Pin-Han Huang

Person

Patents Applicationslast 30 patents

GOGGLE STRUCTURE HAVING FLIP-UP FUNCTION AND CAPABLE OF COVERING EY...

ENGAGING AND SECURING STRUCTURE OF FLIP-UP EYEGLASSES

COMBINED STRUCTURE OF LENS AND SOFT ELASTOMER

LIGHTWEIGHT INDUSTRIAL EYEGLASS STRUCTURE

DISSECTION METHOD FOR OPTICAL PROXIMITY CORRECTION AND PATTERNING M...

METHOD FOR FORMING PHOTOMASK

METHOD OF MAKING MASK PATTERN AND METHOD OF FORMING PATTERN IN LAYER