Ping-Chung Chung

Person

Hsinchu Hsien, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for removing high concentration ozone from a w...
- Patent number 7,572,320
- Issue date Aug 11, 2009
- Industrial Technology Research Institute
- Shaw-Yi Yan
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method of cleaning a chamber of a CVD machine and elements within
- Patent number 6,569,253
- Issue date May 27, 2003
- United Microelectronics Corp.
- Wei-Hsu Wang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for removing extraneous matter by using fluorine-containing...
- Patent number 6,315,834
- Issue date Nov 13, 2001
- Utek Semiconductor Corp.
- Ping-Chung Chung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer mapping apparatus
- Patent number 6,303,939
- Issue date Oct 16, 2001
- United Microelectronics, Corp.
- Ping-Chung Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improving the uniformity of wafer-to-wafer film thickness
- Patent number 6,218,320
- Issue date Apr 17, 2001
- United Microelectronics Corp.
- Tsung-Lin Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exhaust gas treatment apparatus
- Patent number 6,217,640
- Issue date Apr 17, 2001
- United Microelectronics Corp.
- Tsung-Lin Lu
- B08 - CLEANING
Information Patent Grant
Method of adjusting for parallel alignment between a shower head an...
- Patent number 6,210,754
- Issue date Apr 3, 2001
- United Microelectronics Corp.
- Tsung-Lin Lu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Method and apparatus for removing high concentration ozone from a w...
- Publication number 20060042465
- Publication date Mar 2, 2006
- Industrial Technology Research Institute
- Shaw-Yi Yan
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Method of cleaning a chamber of a CVD machine and elements within
- Publication number 20020157687
- Publication date Oct 31, 2002
- Wei-Hsu Wang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
System and method for status settings of semiconductor equipment wi...
- Publication number 20020098600
- Publication date Jul 25, 2002
- United Microelectronics Corp.
- Jack Yao
- H01 - BASIC ELECTRIC ELEMENTS

Ping-Chung Chung

Person

Patents Grantslast 30 patents

Method and apparatus for removing high concentration ozone from a w...

Method of cleaning a chamber of a CVD machine and elements within

Method for removing extraneous matter by using fluorine-containing...

Wafer mapping apparatus

Method for improving the uniformity of wafer-to-wafer film thickness

Exhaust gas treatment apparatus

Method of adjusting for parallel alignment between a shower head an...

Patents Applicationslast 30 patents

Method and apparatus for removing high concentration ozone from a w...

Method of cleaning a chamber of a CVD machine and elements within

System and method for status settings of semiconductor equipment wi...