Ping-Hung Lu

Person

Bridgewater, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
DNQ-type photoresist composition including alkali-soluble acrylic r...
- Patent number 11,822,242
- Issue date Nov 21, 2023
- Merck Patent GmbH
- Weihong Liu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-working photoresist compositions for laser ablation and us...
- Patent number 10,705,424
- Issue date Jul 7, 2020
- Merck Patent GmbH
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working photosensitive material
- Patent number 8,841,062
- Issue date Sep 23, 2014
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Weihong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stripper for coating layer
- Patent number 8,026,201
- Issue date Sep 27, 2011
- AZ Electronic Materials USA Corp.
- Ruzhi Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating composition comprising fused aromatic rings
- Patent number 8,017,296
- Issue date Sep 13, 2011
- AZ Electronic Materials USA Corp.
- Francis Houlihan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Nanocomposite photoresist composition for imaging thick films
- Patent number 7,524,606
- Issue date Apr 28, 2009
- AZ Electronic Materials USA Corp.
- Chunwei Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for imaging thick films
- Patent number 7,255,970
- Issue date Aug 14, 2007
- AZ Electronic Materials USA Corp.
- Medhat A. Toukhy
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Nanocomposite photosensitive composition and use thereof
- Patent number 7,247,419
- Issue date Jul 24, 2007
- AZ Electronic Materials USA Corp.
- Chunwei Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Water soluble negative tone photoresist
- Patent number 7,235,348
- Issue date Jun 26, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bang-Chein Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive composition and use thereof
- Patent number 7,078,157
- Issue date Jul 18, 2006
- AZ Electronic Materials USA Corp.
- Hong Zhuang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-acting aqueous photoresist composition
- Patent number 6,800,415
- Issue date Oct 5, 2004
- Clariant Finance (BVI) Ltd
- Ping-Hung Lu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-acting chemically amplified photoresist composition
- Patent number 6,576,394
- Issue date Jun 10, 2003
- Clariant Finance (BVI) Limited
- Pingyong Xu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition containing a novel polymer
- Patent number 6,103,443
- Issue date Aug 15, 2000
- Clariant Finance Lmited
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fractionated novolak resin from cresol-formaldehyde reaction mixtur...
- Patent number 6,096,477
- Issue date Aug 1, 2000
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Isolation of novolak resin without high temperature distillation an...
- Patent number 6,090,533
- Issue date Jul 18, 2000
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fractionated novolak resin and photoresist composition therefrom
- Patent number 6,045,966
- Issue date Apr 4, 2000
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antireflective coating compositions for photoresist compositions an...
- Patent number 5,994,430
- Issue date Nov 30, 1999
- Clariant Finance BVI) Limited
- Shuji Ding
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light absorbing polymers
- Patent number 5,981,145
- Issue date Nov 9, 1999
- Clariant Finance (BVI) Limited
- Shuji Ding
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fractionated novolak resin and photoresist composition therefrom
- Patent number 5,977,288
- Issue date Nov 2, 1999
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fractionated novolak resin from cresol-formaldehyde reaction mixtur...
- Patent number 5,910,559
- Issue date Jun 8, 1999
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresists containing novel photoactive compounds
- Patent number 5,876,897
- Issue date Mar 2, 1999
- Clariant Finance (BVI) Limited
- Dana L. Durham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Isolation of novolak resin without high temperature distillation an...
- Patent number 5,863,700
- Issue date Jan 26, 1999
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fractionated novolak resin and photoresist composition therefrom
- Patent number 5,853,954
- Issue date Dec 29, 1998
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light sensitive composition containing an arylhydrazo dye
- Patent number 5,763,135
- Issue date Jun 9, 1998
- Clariant Finance (BVI) Limited
- Shuji Ding
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating for photoresist compositions
- Patent number 5,733,714
- Issue date Mar 31, 1998
- Clariant Finance (BVI) Limited
- Iain McCulloch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition containing a 2,4-dinitro-1-naphthol
- Patent number 5,719,004
- Issue date Feb 17, 1998
- Clariant Finance (BVI) Limited
- Ping-Hung Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aqueous antireflective coatings for photoresist compositions
- Patent number 5,652,297
- Issue date Jul 29, 1997
- Hoechst Celanese Corporation
- Iain McCulloch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antireflective coatings for photoresist compositions
- Patent number 5,652,317
- Issue date Jul 29, 1997
- Hoechst Celanese Corporation
- Iain McCulloch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresist composition comprising a mixed ester of trishy...
- Patent number 5,612,164
- Issue date Mar 18, 1997
- Hoechst Celanese Corporation
- Anthony Canize
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal ion reduction in the raw materials and using a Lewis base to...
- Patent number 5,476,750
- Issue date Dec 19, 1995
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
DNQ-TYPE PHOTORESIST COMPOSITION INCLUDING ALKALI-SOLUBLE ACRYLIC R...
- Publication number 20220357658
- Publication date Nov 10, 2022
- Merck Patent GmbH
- Weihong LIU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIALS
- Publication number 20220342308
- Publication date Oct 27, 2022
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHICALLY DEFINED ELECTRICAL INTERCONNECTS FROM CONDUCTIVE P...
- Publication number 20220336341
- Publication date Oct 20, 2022
- ORMET CIRCUITS, INC.
- Catherine A. SHEARER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...
- Publication number 20170285475
- Publication date Oct 5, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...
- Publication number 20170176856
- Publication date Jun 22, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE WORKING PHOTOSENSITIVE MATERIAL
- Publication number 20140154624
- Publication date Jun 5, 2014
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Weihong LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
- Publication number 20130108956
- Publication date May 2, 2013
- AZ Electronic Materials USA Corp.
- Ping-Hung LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOCOMPOSITE NEGATIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
- Publication number 20130105440
- Publication date May 2, 2013
- AZ Electronic Materials USA Corp.
- Ping-Hung LU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANTIREFLECTIVE COATING COMPOSITIONS
- Publication number 20100151392
- Publication date Jun 17, 2010
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Antireflective Coating Composition Comprising Fused Aromatic Rings
- Publication number 20080292995
- Publication date Nov 27, 2008
- Francis Houlihan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Stripper for Coating Layer
- Publication number 20080161217
- Publication date Jul 3, 2008
- Ruzhi Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective Coating Compositions Comprising Siloxane Polymer
- Publication number 20070298349
- Publication date Dec 27, 2007
- Ruzhi Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF
- Publication number 20070141510
- Publication date Jun 21, 2007
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition for imaging thick films
- Publication number 20070015080
- Publication date Jan 18, 2007
- Medhat A. Toukhy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nanocomposite photoresist composition for imaging thick films
- Publication number 20060228644
- Publication date Oct 12, 2006
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nanocomposite photosensitive composition and use thereof
- Publication number 20060228645
- Publication date Oct 12, 2006
- Chunwei Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Water soluble negative tone photoresist
- Publication number 20040234897
- Publication date Nov 25, 2004
- Taiwan Semicondutor Manufacturing Co.
- Bang-Chein Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive composition and use thereof
- Publication number 20040175653
- Publication date Sep 9, 2004
- Hong Zuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative- acting aqueous photoresist composition
- Publication number 20030077539
- Publication date Apr 24, 2003
- Ping-Hung Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ping-Hung Lu

Person

Patents Grantslast 30 patents

DNQ-type photoresist composition including alkali-soluble acrylic r...

Negative-working photoresist compositions for laser ablation and us...

Positive working photosensitive material

Stripper for coating layer

Antireflective coating composition comprising fused aromatic rings

Nanocomposite photoresist composition for imaging thick films

Photoresist composition for imaging thick films

Nanocomposite photosensitive composition and use thereof

Water soluble negative tone photoresist

Photosensitive composition and use thereof

Negative-acting aqueous photoresist composition

Negative-acting chemically amplified photoresist composition

Photoresist composition containing a novel polymer

Fractionated novolak resin from cresol-formaldehyde reaction mixtur...

Isolation of novolak resin without high temperature distillation an...

Fractionated novolak resin and photoresist composition therefrom

Antireflective coating compositions for photoresist compositions an...

Light absorbing polymers

Fractionated novolak resin and photoresist composition therefrom

Fractionated novolak resin from cresol-formaldehyde reaction mixtur...

Positive photoresists containing novel photoactive compounds

Isolation of novolak resin without high temperature distillation an...

Fractionated novolak resin and photoresist composition therefrom

Light sensitive composition containing an arylhydrazo dye

Antireflective coating for photoresist compositions

Positive photoresist composition containing a 2,4-dinitro-1-naphthol

Aqueous antireflective coatings for photoresist compositions

Antireflective coatings for photoresist compositions

Positive photoresist composition comprising a mixed ester of trishy...

Metal ion reduction in the raw materials and using a Lewis base to...

Patents Applicationslast 30 patents

DNQ-TYPE PHOTORESIST COMPOSITION INCLUDING ALKALI-SOLUBLE ACRYLIC R...

POSITIVE WORKING PHOTOSENSITIVE MATERIALS

LITHOGRAPHICALLY DEFINED ELECTRICAL INTERCONNECTS FROM CONDUCTIVE P...

NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...

NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND US...

POSITIVE WORKING PHOTOSENSITIVE MATERIAL

NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF

NANOCOMPOSITE NEGATIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF

ANTIREFLECTIVE COATING COMPOSITIONS

Antireflective Coating Composition Comprising Fused Aromatic Rings

Stripper for Coating Layer

Antireflective Coating Compositions Comprising Siloxane Polymer

NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF

Photoresist composition for imaging thick films

Nanocomposite photoresist composition for imaging thick films

Nanocomposite photosensitive composition and use thereof

Water soluble negative tone photoresist

Photosensitive composition and use thereof

Negative- acting aqueous photoresist composition