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PingHung LU

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  • Bridgewater, NJ, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Negative-working ultra thick film photoresist
    • Patent number 11,698,586
    • Issue date Jul 11, 2023
    • Merck Patent GmbH
    • Aritaka Hishida
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Positive working photosensitive material
    • Patent number 10,976,662
    • Issue date Apr 13, 2021
    • Merck Patent GmbH
    • Weihong Liu
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Positive photosensitive material
    • Patent number 9,012,126
    • Issue date Apr 21, 2015
    • AZ Electronic Materials (Luxembourg) S.A.R.L.
    • Weihong Liu
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Negative-working thick film photoresist
    • Patent number 8,906,594
    • Issue date Dec 9, 2014
    • AZ Electronic Materials (Luxembourg) S.A.R.L.
    • Chunwei Chen
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Underlayer composition and process thereof
    • Patent number 8,568,958
    • Issue date Oct 29, 2013
    • AZ Electronic Materials USA Corp.
    • Huirong Yao
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Silicon-based antireflective coating compositions
    • Patent number 8,524,441
    • Issue date Sep 3, 2013
    • AZ Electronic Materials USA Corp.
    • Ruzhi Zhang
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Grant

    Silicone coating composition
    • Patent number 8,026,040
    • Issue date Sep 27, 2011
    • AZ Electronic Materials USA Corp.
    • Hengpeng Wu
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Grant

    Antireflective coating compositions
    • Patent number 7,666,575
    • Issue date Feb 23, 2010
    • AZ Electronic Materials USA Corp.
    • Woo-Kyu Kim
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Antireflective composition for photoresists
    • Patent number 7,638,262
    • Issue date Dec 29, 2009
    • AZ Electronic Materials USA Corp.
    • Hengpeng Wu
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

  • Information Patent Application

    POSITIVE WORKING PHOTOSENSITIVE MATERIAL
    • Publication number 20220019141
    • Publication date Jan 20, 2022
    • Merck Patent GmbH
    • Weihong LIU
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    NEGATIVE-WORKING ULTRA THICK FILM PHOTORESIST
    • Publication number 20200393758
    • Publication date Dec 17, 2020
    • Merck Patent GmbH
    • Aritaka HISHIDA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST
    • Publication number 20200183278
    • Publication date Jun 11, 2020
    • Medhat A. Toukhy
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    POSITIVE WORKING PHOTOSENSITIVE MATERIAL
    • Publication number 20190064662
    • Publication date Feb 28, 2019
    • AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L.
    • Weihong LIU
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    POSITIVE PHOTOSENSITIVE MATERIAL
    • Publication number 20130337380
    • Publication date Dec 19, 2013
    • AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    • Weihong LIU
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    NEGATIVE-WORKING THICK FILM PHOTORESIST
    • Publication number 20130337381
    • Publication date Dec 19, 2013
    • AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    • Chunwei CHEN
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    UNDERLAYER COMPOSITION AND PROCESS THEREOF
    • Publication number 20120328990
    • Publication date Dec 27, 2012
    • AZ Electronic Materials USA Corp.
    • Huirong YAO
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    SILICON-BASED ANTIREFLECTIVE COATING COMPOSITIONS
    • Publication number 20100092895
    • Publication date Apr 15, 2010
    • Ruzhi Zhang
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Process for making siloxane polymers
    • Publication number 20100093969
    • Publication date Apr 15, 2010
    • Ruzhi Zhang
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    SILICONE COATING COMPOSITION
    • Publication number 20080196626
    • Publication date Aug 21, 2008
    • Hengpeng Wu
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Antireflective Coating Compositions
    • Publication number 20080096125
    • Publication date Apr 24, 2008
    • Woo-Kyu Kim
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Antireflective composition for photoresists
    • Publication number 20080038659
    • Publication date Feb 14, 2008
    • Hengpeng Wu
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY