Piotr Jan MEYER

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Auburndale, CT, US

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Patents Grantslast 30 patents

Information Patent Grant
Metrology system, lithographic apparatus, and calibration method
- Patent number 11,740,561
- Issue date Aug 29, 2023
- ASML Netherlands B.V.
- Nikhil Mehta
- G01 - MEASURING TESTING
Information Patent Grant
Alignment mark for two-dimensional alignment in an alignment system
- Patent number 11,156,928
- Issue date Oct 26, 2021
- ASML Holding N.V.
- Gerrit Johannes Nijmeijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND CALIBRATION METHOD
- Publication number 20220197151
- Publication date Jun 23, 2022
- ASML NETHERLANDS B.V.
- Nikhil MEHTA
- G01 - MEASURING TESTING
Information Patent Application
Alignment Mark For Two-Dimensional Alignment In An Alignment System
- Publication number 20200124995
- Publication date Apr 23, 2020
- ASML Holding N.V.
- Gerrit Johannes NIJMEIJER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY