Po-Hsiung LEU

Person

Lujhu Township, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Method for controlling plasma in semiconductor fabrication
- Patent number 10,867,787
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Tsung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and method of forming coating film
- Patent number 10,864,530
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Lan-Hai Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a shallow trench isolation structure an...
- Patent number 10,867,838
- Issue date Dec 15, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Li Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal chemical vapor deposition system and operating method thereof
- Patent number 10,724,140
- Issue date Jul 28, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Chan Lo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition device structure
- Patent number 10,626,499
- Issue date Apr 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Chan Lo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Showerhead, semicondcutor processing apparatus having the same and...
- Patent number 10,533,252
- Issue date Jan 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chiang Chiu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for controlling plasma in semiconductor fabrication
- Patent number 10,395,918
- Issue date Aug 27, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Tsung Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal chemical vapor deposition system and operating method thereof
- Patent number 10,161,041
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Chan Lo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure with protection layer
- Patent number 10,164,063
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Wei Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a shallow trench isolation structure an...
- Patent number 9,953,861
- Issue date Apr 24, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Li Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gap fill self planarization on post EPI
- Patent number 9,831,307
- Issue date Nov 28, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Chang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interlayer dielectric structure with high aspect ratio process (HARP)
- Patent number 9,716,044
- Issue date Jul 25, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for dielectric deposition process
- Patent number 9,631,273
- Issue date Apr 25, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lan-Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density plasma reactor with multiple top coils
- Patent number 9,607,809
- Issue date Mar 28, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Ching Lo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating apparatus and method of forming coating film
- Patent number 9,573,144
- Issue date Feb 21, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lan-Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gap fill self planarization on post EPI
- Patent number 9,536,771
- Issue date Jan 3, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Chang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate transistor and method for tuning metal gate profile
- Patent number 9,356,120
- Issue date May 31, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Chi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film deposition apparatus with multi chamber design and film d...
- Patent number 9,324,559
- Issue date Apr 26, 2016
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lan Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure with anti-etch structure in via and method...
- Patent number 9,209,071
- Issue date Dec 8, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd
- Geng-Shuoh Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile pre-shaping for replacement poly gate interlayer dielectric
- Patent number 9,048,185
- Issue date Jun 2, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Wei Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming interlayer dielectric film above metal gate of se...
- Patent number 8,946,095
- Issue date Feb 3, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile pre-shaping for replacement poly gate interlayer dielectric
- Patent number 8,803,249
- Issue date Aug 12, 2014
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Wei Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution for copper hillock induced by thermal strain with buffer z...
- Patent number 6,897,147
- Issue date May 24, 2005
- Taiwan Semiconductor Manufacturing Company
- Shin-Yeu Tsai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
- Publication number 20200203473
- Publication date Jun 25, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chun-Li LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CONTROLLING PLASMA IN SEMICONDUCTOR FABRICATION
- Publication number 20190378714
- Publication date Dec 12, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Tsung WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION DEVICE STRUCTURE
- Publication number 20190032215
- Publication date Jan 31, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Chan LO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thermal Chemical Vapor Deposition System and Operating Method Thereof
- Publication number 20180334747
- Publication date Nov 22, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Chan Lo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Device Having a Shallow Trench Isolation Structure an...
- Publication number 20180240698
- Publication date Aug 23, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Li Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH PROTECTION LAYER
- Publication number 20180166560
- Publication date Jun 14, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Wei CHIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD, SEMICONDCUTOR PROCESSING APPARATUS HAVING THE SAME AND...
- Publication number 20170283948
- Publication date Oct 5, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chiang Chiu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COATING APPARATUS AND METHOD OF FORMING COATING FILM
- Publication number 20170157625
- Publication date Jun 8, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Lan-Hai WANG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
THERMAL CHEMICAL VAPOR DEPOSITION SYSTEM AND OPERATING METHOD THEREOF
- Publication number 20170107619
- Publication date Apr 20, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Chan LO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAP FILL SELF PLANARIZATION ON POST EPI
- Publication number 20170084689
- Publication date Mar 23, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Po-Chang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR APPARATUS AND CLEANING METHOD FOR THE SEMICONDUCTOR A...
- Publication number 20170053783
- Publication date Feb 23, 2017
- Taiwan Semiconductor Manufacturing Co., LTD
- Yin-Bin TSENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING PLASMA IN SEMICONDUCTOR FABRICATION
- Publication number 20160343625
- Publication date Nov 24, 2016
- Taiwan Semiconductor Manufacturing Co., LTD
- Cheng-Tsung WU
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A SHALLOW TRENCH ISOLATION STRUCTURE AN...
- Publication number 20160148833
- Publication date May 26, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Li Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING APPARATUS AND METHOD OF FORMING COATING FILM
- Publication number 20150348779
- Publication date Dec 3, 2015
- Taiwan Semiconductor Manufacturing Co., LTD
- Lan-Hai WANG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Semiconductor Structure With Anti-Etch Structure In Via And Method...
- Publication number 20150279729
- Publication date Oct 1, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Geng-Shuoh Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gate Transistor and Method for Tuning Metal Gate Profile
- Publication number 20150187939
- Publication date Jul 2, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Chi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-TREATMENT METHOD FOR METAL-OXIDE REDUCTION AND DEVICE FORMED
- Publication number 20150001728
- Publication date Jan 1, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Li CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM DEPOSITION APPARATUS WITH MULTI CHAMBER DESIGN AND FILM D...
- Publication number 20140377961
- Publication date Dec 25, 2014
- Taiwan Semiconductor Manufacturing Co., LTD
- Lan Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROFILE PRE-SHAPING FOR REPLACEMENT POLY GATE INTERLAYER DIELECTRIC
- Publication number 20140349471
- Publication date Nov 27, 2014
- Chih-Wei Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gap Fill Self Planarization on Post EPI
- Publication number 20140306294
- Publication date Oct 16, 2014
- Taiwan Semiconductor Manufacturing Co. Ltd.
- Po-Chang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH DENSITY PLASMA REACTOR WITH MULTIPLE TOP COILS
- Publication number 20140273537
- Publication date Sep 18, 2014
- Taiwan Semiconductor Manufacturing Co., LTD
- Chi-Ching LO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING INTERLAYER DIELECTRIC FILM ABOVE METAL GATE OF SE...
- Publication number 20140120706
- Publication date May 1, 2014
- Taiwan Semiconductor Manufacturing Co., LTD
- LI Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE PRE-SHAPING FOR REPLACEMENT POLY GATE INTERLAYER DIELECTRIC
- Publication number 20140042553
- Publication date Feb 13, 2014
- Taiwan Semiconductor Manufacturing Co., LTD
- Chih-Wei Chiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Dielectric Deposition Process
- Publication number 20140026813
- Publication date Jan 30, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Lan-Hai Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
- Publication number 20130292791
- Publication date Nov 7, 2013
- Taiwan Semiconductor Manufacturing Co., LTD
- Chun-Li LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERLAYER DIELECTRIC STRUCTURE AND METHOD MAKING THE SAME
- Publication number 20130043539
- Publication date Feb 21, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cap layer on doped dielectric
- Publication number 20070026653
- Publication date Feb 1, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Hsiung Leu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inter-metal dielectric scheme for semiconductors
- Publication number 20060105558
- Publication date May 18, 2006
- Harry Chuang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Robust fluorine containing Silica Glass (FSG) Film with less free f...
- Publication number 20060017166
- Publication date Jan 26, 2006
- Po-Hsiung Leu
- H01 - BASIC ELECTRIC ELEMENTS

Po-Hsiung LEU

Person

Patents Grantslast 30 patents

Method for controlling plasma in semiconductor fabrication

Coating apparatus and method of forming coating film

Semiconductor device having a shallow trench isolation structure an...

Thermal chemical vapor deposition system and operating method thereof

Deposition device structure

Showerhead, semicondcutor processing apparatus having the same and...

Method and system for controlling plasma in semiconductor fabrication

Thermal chemical vapor deposition system and operating method thereof

Semiconductor structure with protection layer

Semiconductor device having a shallow trench isolation structure an...

Gap fill self planarization on post EPI

Interlayer dielectric structure with high aspect ratio process (HARP)

Apparatus for dielectric deposition process

High density plasma reactor with multiple top coils

Coating apparatus and method of forming coating film

Gap fill self planarization on post EPI

Metal gate transistor and method for tuning metal gate profile

Thin film deposition apparatus with multi chamber design and film d...

Semiconductor structure with anti-etch structure in via and method...

Profile pre-shaping for replacement poly gate interlayer dielectric

Method of forming interlayer dielectric film above metal gate of se...

Profile pre-shaping for replacement poly gate interlayer dielectric

Solution for copper hillock induced by thermal strain with buffer z...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

METHOD FOR CONTROLLING PLASMA IN SEMICONDUCTOR FABRICATION

DEPOSITION DEVICE STRUCTURE

Thermal Chemical Vapor Deposition System and Operating Method Thereof

Semiconductor Device Having a Shallow Trench Isolation Structure an...

SEMICONDUCTOR STRUCTURE WITH PROTECTION LAYER

SHOWERHEAD, SEMICONDCUTOR PROCESSING APPARATUS HAVING THE SAME AND...

COATING APPARATUS AND METHOD OF FORMING COATING FILM

THERMAL CHEMICAL VAPOR DEPOSITION SYSTEM AND OPERATING METHOD THEREOF

GAP FILL SELF PLANARIZATION ON POST EPI

SEMICONDUCTOR APPARATUS AND CLEANING METHOD FOR THE SEMICONDUCTOR A...

METHOD AND SYSTEM FOR CONTROLLING PLASMA IN SEMICONDUCTOR FABRICATION

SEMICONDUCTOR DEVICE HAVING A SHALLOW TRENCH ISOLATION STRUCTURE AN...

COATING APPARATUS AND METHOD OF FORMING COATING FILM

Semiconductor Structure With Anti-Etch Structure In Via And Method...

Metal Gate Transistor and Method for Tuning Metal Gate Profile

PRE-TREATMENT METHOD FOR METAL-OXIDE REDUCTION AND DEVICE FORMED

THIN FILM DEPOSITION APPARATUS WITH MULTI CHAMBER DESIGN AND FILM D...

PROFILE PRE-SHAPING FOR REPLACEMENT POLY GATE INTERLAYER DIELECTRIC

Gap Fill Self Planarization on Post EPI

HIGH DENSITY PLASMA REACTOR WITH MULTIPLE TOP COILS

METHOD OF FORMING INTERLAYER DIELECTRIC FILM ABOVE METAL GATE OF SE...

PROFILE PRE-SHAPING FOR REPLACEMENT POLY GATE INTERLAYER DIELECTRIC

Apparatus for Dielectric Deposition Process

SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

INTERLAYER DIELECTRIC STRUCTURE AND METHOD MAKING THE SAME

Cap layer on doped dielectric

Inter-metal dielectric scheme for semiconductors

Robust fluorine containing Silica Glass (FSG) Film with less free f...