Pradeep Vukkadala

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithography mask repair by simulation of photoresist thickness evol...
- Patent number 11,966,156
- Issue date Apr 23, 2024
- KLA Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process-induced distortion prediction and feedforward and feedback...
- Patent number 11,761,880
- Issue date Sep 19, 2023
- KLA Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process-induced displacement characterization during semiconductor...
- Patent number 11,682,570
- Issue date Jun 20, 2023
- KLA Corporation
- Pradeep Vukkadala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process-induced displacement characterization during semiconductor...
- Patent number 11,164,768
- Issue date Nov 2, 2021
- KLA Corporation
- Pradeep Vukkadala
- G05 - CONTROLLING REGULATING
Information Patent Grant
Prediction based chucking and lithography control optimization
- Patent number 10,788,759
- Issue date Sep 29, 2020
- KLA-Tencor Corporation
- Bin-Ming Benjamin Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterned wafer geometry measurements for semiconductor process con...
- Patent number 10,576,603
- Issue date Mar 3, 2020
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process-induced distortion prediction and feedforward and feedback...
- Patent number 10,401,279
- Issue date Sep 3, 2019
- KLA-Tencor Corporation
- Pradeep Vukkadala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems, methods and metrics for wafer high order shape characteriz...
- Patent number 10,379,061
- Issue date Aug 13, 2019
- KLA-Tencor Corporation
- Haiguang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay and semiconductor process control using a wafer geometry me...
- Patent number 10,249,523
- Issue date Apr 2, 2019
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G01 - MEASURING TESTING
Information Patent Grant
Prediction based chucking and lithography control optimization
- Patent number 10,036,964
- Issue date Jul 31, 2018
- KLA-Tencor Corporation
- Bin-Ming Benjamin Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method to emulate finite element model based prediction...
- Patent number 10,025,894
- Issue date Jul 17, 2018
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process-induced asymmetry detection, quantification, and control us...
- Patent number 9,779,202
- Issue date Oct 3, 2017
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Predictive wafer modeling based focus error prediction using correl...
- Patent number 9,707,660
- Issue date Jul 18, 2017
- KLA-Tencor Corporation
- Pradeep Vukkadala
- B24 - GRINDING POLISHING
Information Patent Grant
Predicting and controlling critical dimension issues and pattern de...
- Patent number 9,558,545
- Issue date Jan 31, 2017
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems, methods and metrics for wafer high order shape characteriz...
- Patent number 9,546,862
- Issue date Jan 17, 2017
- KLA-Tencor Corporation
- Haiguang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Using wafer geometry to improve scanner correction effectiveness fo...
- Patent number 9,513,565
- Issue date Dec 6, 2016
- KLA-Tencor Corporation
- Craig MacNaughton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method to emulate finite element model based prediction...
- Patent number 9,430,593
- Issue date Aug 30, 2016
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enhanced patterned wafer geometry measurements based design improve...
- Patent number 9,373,165
- Issue date Jun 21, 2016
- KLA-Tencor Corporation
- Amir Azordegan
- G01 - MEASURING TESTING
Information Patent Grant
Overlay and semiconductor process control using a wafer geometry me...
- Patent number 9,354,526
- Issue date May 31, 2016
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods of advanced site-based nanotopography for wafer...
- Patent number 9,177,370
- Issue date Nov 3, 2015
- KLA-Tencor Corporation
- Haiguang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Bright-field differential interference contrast system with scannin...
- Patent number 9,052,190
- Issue date Jun 9, 2015
- KLA-Tencor Corporation
- Ali Salehpour
- G01 - MEASURING TESTING
Information Patent Grant
Using wafer geometry to improve scanner correction effectiveness fo...
- Patent number 9,029,810
- Issue date May 12, 2015
- KLA-Tencor Corporation
- Craig MacNaughton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY MASK REPAIR BY SIMULATION OF PHOTORESIST THICKNESS EVOL...
- Publication number 20240061327
- Publication date Feb 22, 2024
- KLA Corporation
- Pradeep Vukkadala
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREDICTION AND METROLOGY OF STOCHASTIC PHOTORESIST THICKNESS DEFECTS
- Publication number 20220129775
- Publication date Apr 28, 2022
- KLA Corporation
- Anatoly Burov
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Process-Induced Displacement Characterization During Semiconductor...
- Publication number 20220005714
- Publication date Jan 6, 2022
- KLA Corporation
- Pradeep Vukkadala
- G05 - CONTROLLING REGULATING
Information Patent Application
Process-Induced Distortion Prediction and Feedforward and Feedback...
- Publication number 20190353582
- Publication date Nov 21, 2019
- KLA-Tencor Corporation
- Pradeep Vukkadala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process-Induced Displacement Characterization During Semiconductor...
- Publication number 20190333794
- Publication date Oct 31, 2019
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G05 - CONTROLLING REGULATING
Information Patent Application
SYSTEMS, METHODS AND METRICS FOR WAFER HIGH ORDER SHAPE CHARACTERIZ...
- Publication number 20190271654
- Publication date Sep 5, 2019
- KLA-Tencor Corporation
- Haiguang Chen
- G01 - MEASURING TESTING
Information Patent Application
Prediction Based Chucking and Lithography Control Optimization
- Publication number 20180364579
- Publication date Dec 20, 2018
- KLA-Tencor Corporation
- Bin-Ming Benjamin Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay and Semiconductor Process Control Using a Wafer Geometry Me...
- Publication number 20160372353
- Publication date Dec 22, 2016
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G01 - MEASURING TESTING
Information Patent Application
Process-Induced Asymmetry Detection, Quantification, and Control Us...
- Publication number 20160371423
- Publication date Dec 22, 2016
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and Method to Emulate Finite Element Model Based Prediction...
- Publication number 20160283625
- Publication date Sep 29, 2016
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Prediction Based Chucking and Lithography Control Optimization
- Publication number 20160239600
- Publication date Aug 18, 2016
- KLA-Tencor Corporation
- Bin-Ming Benjamin Tsai
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Predicting and Controlling Critical Dimension Issues and Pattern De...
- Publication number 20160163033
- Publication date Jun 9, 2016
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Enhanced Patterned Wafer Geometry Measurements Based Design Improve...
- Publication number 20160071260
- Publication date Mar 10, 2016
- KLA-Tencor Corporation
- Amir Azordegan
- G01 - MEASURING TESTING
Information Patent Application
Predictive Modeling Based Focus Error Prediction
- Publication number 20150302312
- Publication date Oct 22, 2015
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G01 - MEASURING TESTING
Information Patent Application
Patterned Wafer Geometry Measurements for Semiconductor Process Con...
- Publication number 20150298282
- Publication date Oct 22, 2015
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G01 - MEASURING TESTING
Information Patent Application
Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...
- Publication number 20150212429
- Publication date Jul 30, 2015
- KLA-Tencor Corporation
- Craig MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process-Induced Distortion Prediction and Feedforward and Feedback...
- Publication number 20150120216
- Publication date Apr 30, 2015
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G01 - MEASURING TESTING
Information Patent Application
Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...
- Publication number 20140353527
- Publication date Dec 4, 2014
- KLA-Tencor Corporation
- Craig MacNaughton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced Inspection and Metrology Techniques And Systems Using Brig...
- Publication number 20140268172
- Publication date Sep 18, 2014
- Ali Salehpour
- G01 - MEASURING TESTING
Information Patent Application
Systems, Methods and Metrics for Wafer High Order Shape Characteriz...
- Publication number 20140114597
- Publication date Apr 24, 2014
- KLA-Tencor Corporation
- Haiguang Chen
- G01 - MEASURING TESTING
Information Patent Application
System and Method to Emulate Finite Element Model Based Prediction...
- Publication number 20140107998
- Publication date Apr 17, 2014
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems and Methods of Advanced Site-Based Nanotopography for Wafer...
- Publication number 20130236085
- Publication date Sep 12, 2013
- KLA-Tencor Corporation
- Haiguang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY AND SEMICONDUCTOR PROCESS CONTROL USING A WAFER GEOMETRY ME...
- Publication number 20130089935
- Publication date Apr 11, 2013
- KLA-Tencor Corporation
- Pradeep Vukkadala
- G01 - MEASURING TESTING

Pradeep Vukkadala

Person

Patents Grantslast 30 patents

Lithography mask repair by simulation of photoresist thickness evol...

Process-induced distortion prediction and feedforward and feedback...

Process-induced displacement characterization during semiconductor...

Process-induced displacement characterization during semiconductor...

Prediction based chucking and lithography control optimization

Patterned wafer geometry measurements for semiconductor process con...

Process-induced distortion prediction and feedforward and feedback...

Systems, methods and metrics for wafer high order shape characteriz...

Overlay and semiconductor process control using a wafer geometry me...

Prediction based chucking and lithography control optimization

System and method to emulate finite element model based prediction...

Process-induced asymmetry detection, quantification, and control us...

Predictive wafer modeling based focus error prediction using correl...

Predicting and controlling critical dimension issues and pattern de...

Systems, methods and metrics for wafer high order shape characteriz...

Using wafer geometry to improve scanner correction effectiveness fo...

System and method to emulate finite element model based prediction...

Enhanced patterned wafer geometry measurements based design improve...

Overlay and semiconductor process control using a wafer geometry me...

Systems and methods of advanced site-based nanotopography for wafer...

Bright-field differential interference contrast system with scannin...

Using wafer geometry to improve scanner correction effectiveness fo...

Patents Applicationslast 30 patents

LITHOGRAPHY MASK REPAIR BY SIMULATION OF PHOTORESIST THICKNESS EVOL...

PREDICTION AND METROLOGY OF STOCHASTIC PHOTORESIST THICKNESS DEFECTS

Process-Induced Displacement Characterization During Semiconductor...

Process-Induced Distortion Prediction and Feedforward and Feedback...

Process-Induced Displacement Characterization During Semiconductor...

SYSTEMS, METHODS AND METRICS FOR WAFER HIGH ORDER SHAPE CHARACTERIZ...

Prediction Based Chucking and Lithography Control Optimization

Overlay and Semiconductor Process Control Using a Wafer Geometry Me...

Process-Induced Asymmetry Detection, Quantification, and Control Us...

System and Method to Emulate Finite Element Model Based Prediction...

Prediction Based Chucking and Lithography Control Optimization

Predicting and Controlling Critical Dimension Issues and Pattern De...

Enhanced Patterned Wafer Geometry Measurements Based Design Improve...

Predictive Modeling Based Focus Error Prediction

Patterned Wafer Geometry Measurements for Semiconductor Process Con...

Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...

Process-Induced Distortion Prediction and Feedforward and Feedback...

Using Wafer Geometry to Improve Scanner Correction Effectiveness fo...

Enhanced Inspection and Metrology Techniques And Systems Using Brig...

Systems, Methods and Metrics for Wafer High Order Shape Characteriz...

System and Method to Emulate Finite Element Model Based Prediction...

Systems and Methods of Advanced Site-Based Nanotopography for Wafer...

OVERLAY AND SEMICONDUCTOR PROCESS CONTROL USING A WAFER GEOMETRY ME...