Pulkit Agarwal

Person

Beaverton, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dynamic process control in semiconductor manufacturing
- Patent number 12,322,619
- Issue date Jun 3, 2025
- Lam Research Corporation
- Purushottam Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rapid tuning of critical dimension non-uniformity by modulating tem...
- Patent number 12,308,264
- Issue date May 20, 2025
- Lam Research Corporation
- Ravi Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Temperature control of a multi-zone pedestal
- Patent number 12,209,312
- Issue date Jan 28, 2025
- Lam Research Corporation
- Ramesh Chandrasekharan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Use of vacuum during transfer of substrates
- Patent number 12,186,851
- Issue date Jan 7, 2025
- Lam Research Corporation
- Ramesh Chandrasekharan
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Trim and deposition profile control with multi-zone heated substrat...
- Patent number 12,071,689
- Issue date Aug 27, 2024
- Lam Research Corporation
- Ramesh Chandrasekharan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for cleaning plasma chambers
- Patent number 12,057,300
- Issue date Aug 6, 2024
- Lam Research Corporation
- Adrien Lavoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modulated atomic layer deposition
- Patent number 12,040,181
- Issue date Jul 16, 2024
- Lam Research Corporation
- Chan Myae Myae Soe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for modulating film uniformity
- Patent number 11,913,113
- Issue date Feb 27, 2024
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of improving deposition induced CD imbalance using spatially...
- Patent number 11,651,963
- Issue date May 16, 2023
- Lam Research Corporation
- Ishtak Karim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for providing station to station uniformity
- Patent number 11,542,599
- Issue date Jan 3, 2023
- Lam Research Corporation
- Adrien Lavoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Controller for controlling core critical dimension variation using...
- Patent number 11,322,416
- Issue date May 3, 2022
- Lam Research Corporation
- Pulkit Agarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi zone substrate support for ALD film property correction and t...
- Patent number 11,236,422
- Issue date Feb 1, 2022
- Lam Research Corporation
- Michael Philip Roberts
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Azimuthal critical dimension non-uniformity for double patterning p...
- Patent number 11,078,570
- Issue date Aug 3, 2021
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of improving deposition induced CD imbalance using spatially...
- Patent number 10,978,302
- Issue date Apr 13, 2021
- Lam Research Corporation
- Ishtak Karim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensating chamber and process effects to improve critical dimens...
- Patent number 10,847,352
- Issue date Nov 24, 2020
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for providing station to station uniformity
- Patent number 10,801,109
- Issue date Oct 13, 2020
- Lam Research Corporation
- Adrien Lavoie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling core critical dimension variation using flas...
- Patent number 10,727,143
- Issue date Jul 28, 2020
- Lam Research Corporation
- Pulkit Agarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conical wafer centering and holding device for semiconductor proces...
- Patent number 10,655,224
- Issue date May 19, 2020
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric gapfill of high aspect ratio features utilizing a sacrif...
- Patent number 10,658,172
- Issue date May 19, 2020
- Lam Research Corporation
- Joseph R. Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer clean for removal of photoresist patterning scum
- Patent number 10,494,715
- Issue date Dec 3, 2019
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatuses for increasing reactor processing batch size
- Patent number 10,431,451
- Issue date Oct 1, 2019
- Lam Research Corporation
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric gapfill of high aspect ratio features utilizing a sacrif...
- Patent number 10,269,559
- Issue date Apr 23, 2019
- Lam Research Corporation
- Joseph Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch methods and hardware for patterning applications
- Patent number 9,997,371
- Issue date Jun 12, 2018
- Lam Research Corporation
- Pulkit Agarwal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SURFACE INHIBITION ATOMIC LAYER DEPOSITION
- Publication number 20250179632
- Publication date Jun 5, 2025
- LAM RESEARCH CORPORATION
- Tao ZHANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE CONTROL OF A MULTI-ZONE PEDESTAL
- Publication number 20250171902
- Publication date May 29, 2025
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL FILM DEPOSITION
- Publication number 20250166989
- Publication date May 22, 2025
- LAM RESEARCH CORPORATION
- Jason Alexander Varnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APARATUSES WITH ROTATING MECHANISMS INCLUDING...
- Publication number 20250121465
- Publication date Apr 17, 2025
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
INCREASING DEPOSITION RATES OF OXIDE FILMS
- Publication number 20250087481
- Publication date Mar 13, 2025
- Awnish Gupta
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRAT...
- Publication number 20240392443
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CLEANING PLASMA CHAMBERS
- Publication number 20240395513
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU CORE PROTECTION IN MULTI-PATTERNING
- Publication number 20240355624
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Nuoya Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS
- Publication number 20240327973
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Ravi KUMAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULATED ATOMIC LAYER DEPOSITION
- Publication number 20240332007
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Chan Myae Myae Soe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR MODULATING FILM UNIFORMITY
- Publication number 20240183034
- Publication date Jun 6, 2024
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL
- Publication number 20230175117
- Publication date Jun 8, 2023
- LAM RESEARCH CORPORATION
- Dustin Zachary AUSTIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AUTOMATED FEEDFORWARD AND FEEDBACK SEQUENCE FOR PATTERNING CD CONTROL
- Publication number 20230170195
- Publication date Jun 1, 2023
- LAM RESEARCH CORPORATION
- Ravi Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF VACUUM DURING TRANSFER OF SUBSTRATES
- Publication number 20220305601
- Publication date Sep 29, 2022
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
DYNAMIC PROCESS CONTROL IN SEMICONDUCTOR MANUFACTURING
- Publication number 20220293442
- Publication date Sep 15, 2022
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE CONTROL OF A MULTI-ZONE PEDESTAL
- Publication number 20220243332
- Publication date Aug 4, 2022
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
USE OF ROTATION TO CORRECT FOR AZIMUTHAL NON-UNIFORMITIES IN SEMICO...
- Publication number 20220243323
- Publication date Aug 4, 2022
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAPID TUNING OF CRITICAL DIMENSION NON-UNIFORMITY BY MODULATING TEM...
- Publication number 20220223440
- Publication date Jul 14, 2022
- LAM RESEARCH CORPORATION
- Ravi KUMAR
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MODULATED ATOMIC LAYER DEPOSITION
- Publication number 20220208543
- Publication date Jun 30, 2022
- LAM RESEARCH CORPORATION
- Chan Myae Myae Soe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRAT...
- Publication number 20220205105
- Publication date Jun 30, 2022
- LAM RESEARCH CORPORATION
- Ramesh CHANDRASEKHARAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CLEANING PLASMA CHAMBERS
- Publication number 20220181128
- Publication date Jun 9, 2022
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- B08 - CLEANING
Information Patent Application
METHOD OF IMPROVING DEPOSITION INDUCED CD IMBALANCE USING SPATIALLY...
- Publication number 20210202250
- Publication date Jul 1, 2021
- LAM RESEARCH CORPORATION
- Ishtak KARIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROVIDING STATION TO STATION UNIFORMITY
- Publication number 20200407847
- Publication date Dec 31, 2020
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Controller for Controlling Core Critical Dimension Variation Using...
- Publication number 20200350219
- Publication date Nov 5, 2020
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PROVIDING STATION TO STATION UNIFORMITY
- Publication number 20200071826
- Publication date Mar 5, 2020
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR MODULATING FILM UNIFORMITY
- Publication number 20200063259
- Publication date Feb 27, 2020
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPENSATING CHAMBER AND PROCESS EFFECTS TO IMPROVE CRITICAL DIMENS...
- Publication number 20200043709
- Publication date Feb 6, 2020
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Controlling Core Critical Dimension Variation Using Flas...
- Publication number 20200035572
- Publication date Jan 30, 2020
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AZIMUTHAL CRITICAL DIMENSION NON-UNIFORMITY FOR DOUBLE PATTERNING P...
- Publication number 20200002815
- Publication date Jan 2, 2020
- LAM RESEARCH CORPORATION
- Pulkit AGARWAL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROVIDING A PLASMA ATOMIC LAYER DEPOSITION
- Publication number 20190345608
- Publication date Nov 14, 2019
- LAM RESEARCH CORPORATION
- Pulkit Agarwal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Pulkit Agarwal

Person

Patents Grantslast 30 patents

Dynamic process control in semiconductor manufacturing

Rapid tuning of critical dimension non-uniformity by modulating tem...

Temperature control of a multi-zone pedestal

Use of vacuum during transfer of substrates

Trim and deposition profile control with multi-zone heated substrat...

Apparatus for cleaning plasma chambers

Modulated atomic layer deposition

Method and apparatus for modulating film uniformity

Method of improving deposition induced CD imbalance using spatially...

Method and apparatus for providing station to station uniformity

Controller for controlling core critical dimension variation using...

Multi zone substrate support for ALD film property correction and t...

Azimuthal critical dimension non-uniformity for double patterning p...

Method of improving deposition induced CD imbalance using spatially...

Compensating chamber and process effects to improve critical dimens...

Method and apparatus for providing station to station uniformity

Method for controlling core critical dimension variation using flas...

Conical wafer centering and holding device for semiconductor proces...

Dielectric gapfill of high aspect ratio features utilizing a sacrif...

Atomic layer clean for removal of photoresist patterning scum

Methods and apparatuses for increasing reactor processing batch size

Dielectric gapfill of high aspect ratio features utilizing a sacrif...

Atomic layer etch methods and hardware for patterning applications

Patents Applicationslast 30 patents

SURFACE INHIBITION ATOMIC LAYER DEPOSITION

TEMPERATURE CONTROL OF A MULTI-ZONE PEDESTAL

THERMAL FILM DEPOSITION

SUBSTRATE PROCESSING APARATUSES WITH ROTATING MECHANISMS INCLUDING...

INCREASING DEPOSITION RATES OF OXIDE FILMS

TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRAT...

APPARATUS FOR CLEANING PLASMA CHAMBERS

IN-SITU CORE PROTECTION IN MULTI-PATTERNING

PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS

MODULATED ATOMIC LAYER DEPOSITION

METHOD AND APPARATUS FOR MODULATING FILM UNIFORMITY

SEAM MITIGATION AND INTEGRATED LINER FOR GAP FILL

AUTOMATED FEEDFORWARD AND FEEDBACK SEQUENCE FOR PATTERNING CD CONTROL

USE OF VACUUM DURING TRANSFER OF SUBSTRATES

DYNAMIC PROCESS CONTROL IN SEMICONDUCTOR MANUFACTURING

TEMPERATURE CONTROL OF A MULTI-ZONE PEDESTAL

USE OF ROTATION TO CORRECT FOR AZIMUTHAL NON-UNIFORMITIES IN SEMICO...

RAPID TUNING OF CRITICAL DIMENSION NON-UNIFORMITY BY MODULATING TEM...

MODULATED ATOMIC LAYER DEPOSITION

TRIM AND DEPOSITION PROFILE CONTROL WITH MULTI-ZONE HEATED SUBSTRAT...

APPARATUS FOR CLEANING PLASMA CHAMBERS

METHOD OF IMPROVING DEPOSITION INDUCED CD IMBALANCE USING SPATIALLY...

METHOD AND APPARATUS FOR PROVIDING STATION TO STATION UNIFORMITY

Controller for Controlling Core Critical Dimension Variation Using...

METHOD AND APPARATUS FOR PROVIDING STATION TO STATION UNIFORMITY

METHOD AND APPARATUS FOR MODULATING FILM UNIFORMITY

COMPENSATING CHAMBER AND PROCESS EFFECTS TO IMPROVE CRITICAL DIMENS...

Method for Controlling Core Critical Dimension Variation Using Flas...

AZIMUTHAL CRITICAL DIMENSION NON-UNIFORMITY FOR DOUBLE PATTERNING P...

METHOD OF PROVIDING A PLASMA ATOMIC LAYER DEPOSITION