Qian Fu

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective carbon deposition on top and bottom surfaces of semicondu...
- Patent number 12,125,699
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Abhijeet S. Bagal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective silicon deposition
- Patent number 12,106,972
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Yifeng Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pulsed etch process
- Patent number 12,009,218
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Yifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron nitride for mask patterning
- Patent number 11,935,751
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Siyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems for reverse pulsing
- Patent number 11,798,785
- Issue date Oct 24, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide silicon nitride stack stair step etch
- Patent number 11,646,207
- Issue date May 9, 2023
- Lam Research Corporation
- Ce Qin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 11,049,726
- Issue date Jun 29, 2021
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 10,943,789
- Issue date Mar 9, 2021
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for determining field non-uniformities of a wafer...
- Patent number 10,763,142
- Issue date Sep 1, 2020
- Lam Research Corporation
- Marcus Musselman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon-based deposition for semiconductor processing
- Patent number 10,658,194
- Issue date May 19, 2020
- Lam Research Corporation
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spacer profile control using atomic layer deposition in a multiple...
- Patent number 10,446,394
- Issue date Oct 15, 2019
- Lam Research Corporation
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for anisotropic tungsten etching
- Patent number 10,354,888
- Issue date Jul 16, 2019
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Near-substrate supplemental plasma density generation with low bias...
- Patent number 10,242,845
- Issue date Mar 26, 2019
- Lam Research Corporation
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for plasma etching using bi-modal process gas c...
- Patent number 10,177,003
- Issue date Jan 8, 2019
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge roughness reduction
- Patent number 10,020,183
- Issue date Jul 10, 2018
- Lam Research Corporation
- Yansha Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide silicon nitride stack ion-assisted etch
- Patent number 9,997,366
- Issue date Jun 12, 2018
- Lam Research Corporation
- Zhongkui Tan
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Atomic layer etching in continuous plasma
- Patent number 9,991,128
- Issue date Jun 5, 2018
- Lam Research Corporation
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post etch treatment to prevent pattern collapse
- Patent number 9,941,123
- Issue date Apr 10, 2018
- Lam Research Corporation
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line edge roughness improvement with photon-assisted plasma process
- Patent number 9,859,127
- Issue date Jan 2, 2018
- Lam Research Corporation
- Zhongkui Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line edge roughness improvement with sidewall sputtering
- Patent number 9,852,924
- Issue date Dec 26, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 9,824,896
- Issue date Nov 21, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for independent control of radical density, ion...
- Patent number 9,767,991
- Issue date Sep 19, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for reverse pulsing
- Patent number 9,761,459
- Issue date Sep 12, 2017
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid stair-step etch
- Patent number 9,741,563
- Issue date Aug 22, 2017
- Lam Research Corporation
- Hua Xiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming stair-step structures
- Patent number RE46464
- Issue date Jul 4, 2017
- Lam Research Corporation
- Qian Fu
Information Patent Grant
Methods and systems for plasma etching using bi-modal process gas c...
- Patent number 9,691,625
- Issue date Jun 27, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming stair-step structures
- Patent number 9,673,057
- Issue date Jun 6, 2017
- Lam Research Corporation
- In Deog Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming stair-step structures
- Patent number 9,646,844
- Issue date May 9, 2017
- Lam Research Corporation
- Qian Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for anisotropic tungsten etching
- Patent number 9,633,867
- Issue date Apr 25, 2017
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch process with pre-etch transient conditioning
- Patent number 9,607,848
- Issue date Mar 28, 2017
- Lam Research Corporation
- Wonchul Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ETCHING HIGH ASPECT RATIO STRUCTURES
- Publication number 20240332031
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Feng QIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED ETCH SELECTIVITY USING HALIDES
- Publication number 20240266180
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- David Knapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCH OF BORON-CONTAINING MATERIAL
- Publication number 20240249953
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Yeonju Kwak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOLITHOGRAPHY ENHANCEMENT TECHNIQUES
- Publication number 20240242970
- Publication date Jul 18, 2024
- Applied Materials, Inc.
- Yifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING WITH ETCH BYPRODUCT SELF-CLEANING
- Publication number 20240128091
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Zhonghua Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON MOLD FOR DRAM CAPACITOR
- Publication number 20240038833
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- Fredrick Fishburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR REVERSE PULSING
- Publication number 20240030000
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON HARDMASK OPENING USING BORON NITRIDE MASK
- Publication number 20240014039
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Jeong Hwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED ETCH PROCESS
- Publication number 20230360920
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Yifeng Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIDEWALL PASSIVATION FOR PLASMA ETCHING
- Publication number 20230245895
- Publication date Aug 3, 2023
- Applied Materials, Inc.
- Zhonghua Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON GAP FILL PROCESSES
- Publication number 20230129550
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Abhijeet S. Bagal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SILICON DEPOSITION
- Publication number 20230110474
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Yifeng Zhou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE CARBON DEPOSITION ON TOP AND BOTTOM SURFACES OF SEMICONDU...
- Publication number 20220415648
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Abhijeet S. Bagal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON NITRIDE FOR MASK PATTERNING
- Publication number 20220384189
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Siyu Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTION GATE SEPARATION FOR 3D NAND
- Publication number 20220319601
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Chang Seok Kang
- G11 - INFORMATION STORAGE
Information Patent Application
SILICON OXIDE SILICON NITRIDE STACK STAIR STEP ETCH
- Publication number 20210407811
- Publication date Dec 30, 2021
- LAM RESEARCH CORPORATION
- Ce QIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Advanced Ion Control for Etching Processes
- Publication number 20210193474
- Publication date Jun 24, 2021
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
METHOD FOR TRANSFERRING A PATTERN FROM AN ORGANIC MASK
- Publication number 20190378725
- Publication date Dec 12, 2019
- LAM RESEARCH CORPORATION
- Mirzafer ABATCHEV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING FOCUSED DEPOSITION DURING A CLEANING PROCESS OF A PROCESS...
- Publication number 20190341275
- Publication date Nov 7, 2019
- LAM RESEARCH CORPORATION
- Yansha JIN
- B08 - CLEANING
Information Patent Application
SPACER PROFILE CONTROL USING ATOMIC LAYER DEPOSITION IN A MULTIPLE...
- Publication number 20190237330
- Publication date Aug 1, 2019
- LAM RESEARCH CORPORATION
- Mirzafer Abatchev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Near-Substrate Supplemental Plasma Density Generation with Low Bias...
- Publication number 20180204708
- Publication date Jul 19, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON OXIDE SILICON NITRIDE STACK ION-ASSISTED ETCH
- Publication number 20180108532
- Publication date Apr 19, 2018
- LAM RESEARCH CORPORATION
- Zhongkui TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Advanced Ion Control for Etching Processes
- Publication number 20180090334
- Publication date Mar 29, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Advanced Ion Control for Etching Processes
- Publication number 20180076045
- Publication date Mar 15, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-BASED DEPOSITION FOR SEMICONDUCTOR PROCESSING
- Publication number 20180061659
- Publication date Mar 1, 2018
- LAM RESEARCH CORPORATION
- Zhongkui TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Independent Control of Radical Density, Ion...
- Publication number 20180005803
- Publication date Jan 4, 2018
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Reverse Pulsing
- Publication number 20170372912
- Publication date Dec 28, 2017
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE EDGE ROUGHNESS IMPROVEMENT WITH PHOTON-ASSISTED PLASMA PROCESS
- Publication number 20170358456
- Publication date Dec 14, 2017
- LAM RESEARCH CORPORATION
- Zhongkui TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Plasma Etching Using Bi-Modal Process Gas C...
- Publication number 20170271166
- Publication date Sep 21, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCHING IN CONTINUOUS PLASMA
- Publication number 20170229311
- Publication date Aug 10, 2017
- LAM RESEARCH CORPORATION
- Zhongkui Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Selective carbon deposition on top and bottom surfaces of semicondu...

Selective silicon deposition

Pulsed etch process

Boron nitride for mask patterning

Systems for reverse pulsing

Silicon oxide silicon nitride stack stair step etch

Methods and systems for advanced ion control for etching processes

Methods and systems for advanced ion control for etching processes

System and method for determining field non-uniformities of a wafer...

Silicon-based deposition for semiconductor processing

Spacer profile control using atomic layer deposition in a multiple...

Method and apparatus for anisotropic tungsten etching

Near-substrate supplemental plasma density generation with low bias...

Methods and systems for plasma etching using bi-modal process gas c...

Edge roughness reduction

Silicon oxide silicon nitride stack ion-assisted etch

Atomic layer etching in continuous plasma

Post etch treatment to prevent pattern collapse

Line edge roughness improvement with photon-assisted plasma process

Line edge roughness improvement with sidewall sputtering

Methods and systems for advanced ion control for etching processes

Methods and systems for independent control of radical density, ion...

Systems and methods for reverse pulsing

Hybrid stair-step etch

Method for forming stair-step structures

Methods and systems for plasma etching using bi-modal process gas c...

Method for forming stair-step structures

Method for forming stair-step structures

Method and apparatus for anisotropic tungsten etching

Etch process with pre-etch transient conditioning

Patents Applicationslast 30 patents

METHOD FOR ETCHING HIGH ASPECT RATIO STRUCTURES

ENHANCED ETCH SELECTIVITY USING HALIDES

DRY ETCH OF BORON-CONTAINING MATERIAL

PHOTOLITHOGRAPHY ENHANCEMENT TECHNIQUES

DRY ETCHING WITH ETCH BYPRODUCT SELF-CLEANING

CARBON MOLD FOR DRAM CAPACITOR

SYSTEMS AND METHODS FOR REVERSE PULSING

CARBON HARDMASK OPENING USING BORON NITRIDE MASK

PULSED ETCH PROCESS

SIDEWALL PASSIVATION FOR PLASMA ETCHING

CARBON GAP FILL PROCESSES

SELECTIVE SILICON DEPOSITION

SELECTIVE CARBON DEPOSITION ON TOP AND BOTTOM SURFACES OF SEMICONDU...

BORON NITRIDE FOR MASK PATTERNING

SELECTION GATE SEPARATION FOR 3D NAND

SILICON OXIDE SILICON NITRIDE STACK STAIR STEP ETCH

Methods and Systems for Advanced Ion Control for Etching Processes

METHOD FOR TRANSFERRING A PATTERN FROM AN ORGANIC MASK

EDGE RING FOCUSED DEPOSITION DURING A CLEANING PROCESS OF A PROCESS...

SPACER PROFILE CONTROL USING ATOMIC LAYER DEPOSITION IN A MULTIPLE...

Near-Substrate Supplemental Plasma Density Generation with Low Bias...

SILICON OXIDE SILICON NITRIDE STACK ION-ASSISTED ETCH

Methods and Systems for Advanced Ion Control for Etching Processes

Methods and Systems for Advanced Ion Control for Etching Processes

SILICON-BASED DEPOSITION FOR SEMICONDUCTOR PROCESSING

Methods and Systems for Independent Control of Radical Density, Ion...

Systems and Methods for Reverse Pulsing

LINE EDGE ROUGHNESS IMPROVEMENT WITH PHOTON-ASSISTED PLASMA PROCESS

Methods and Systems for Plasma Etching Using Bi-Modal Process Gas C...

ATOMIC LAYER ETCHING IN CONTINUOUS PLASMA