Qian ZHAO

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for improving a process for a patterning process
- Patent number 11,977,336
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Jen-Shiang Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch bias characterization and method of using the same
- Patent number 11,675,274
- Issue date Jun 13, 2023
- ASML Netherlands B.V.
- Yongfa Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement method and apparatus
- Patent number 11,243,473
- Issue date Feb 8, 2022
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR CONVERTING METROLOGY DATA
- Publication number 20240377343
- Publication date Nov 14, 2024
- ASML NETHERLANDS B.V.
- Yunbo GUO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MIXED REALITY SYSTEM WITH ACOUSTIC EVENT DETECTION, ADAPTIVE ANCHOR...
- Publication number 20240371364
- Publication date Nov 7, 2024
- Meta Platforms Technologies, LLC
- Mohammad Keshavarzi
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Application
ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME
- Publication number 20230314958
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Yongfa FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR SELECTING HIGH QUALITY IMAGES FROM RAW IMA...
- Publication number 20230298158
- Publication date Sep 21, 2023
- ASML NETHERLANDS B.V.
- Jiao HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING METRICS FOR A PORTION OF A PATTERN ON A SUBSTRATE
- Publication number 20230161269
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Jiao HUANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PREDICTION DATA SELECTION FOR MODEL CALIBRATION TO REDUCE MODEL PRE...
- Publication number 20220276563
- Publication date Sep 1, 2022
- ASML NETHERLANDS B.V.
- Lei WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAUGE SELECTION FOR MODEL CALIBRATION
- Publication number 20220113632
- Publication date Apr 14, 2022
- ASML NETHERLANDS B.V.
- Lei WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODELING POST-EXPOSURE PROCESSES
- Publication number 20210294218
- Publication date Sep 23, 2021
- ASML NETHERLANDS B.V.
- Yongfa FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR IMPROVING A PROCESS FOR A PATTERNING PROCESS
- Publication number 20210208507
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Jen-Shiang WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT METHOD AND APPARATUS
- Publication number 20200159124
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Te-Sheng WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME
- Publication number 20190354020
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Yongfa FAN
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method for improving a process for a patterning process

Etch bias characterization and method of using the same

Measurement method and apparatus

Patents Applicationslast 30 patents

METHOD FOR CONVERTING METROLOGY DATA

MIXED REALITY SYSTEM WITH ACOUSTIC EVENT DETECTION, ADAPTIVE ANCHOR...

ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME

APPARATUS AND METHOD FOR SELECTING HIGH QUALITY IMAGES FROM RAW IMA...

DETERMINING METRICS FOR A PORTION OF A PATTERN ON A SUBSTRATE

PREDICTION DATA SELECTION FOR MODEL CALIBRATION TO REDUCE MODEL PRE...

GAUGE SELECTION FOR MODEL CALIBRATION

MODELING POST-EXPOSURE PROCESSES

METHOD FOR IMPROVING A PROCESS FOR A PATTERNING PROCESS

MEASUREMENT METHOD AND APPARATUS

ETCH BIAS CHARACTERIZATION AND METHOD OF USING THE SAME