Qiang Wang

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Austin, TX, US

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Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR PLASMA PROCESS
- Publication number 20250226192
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR PLASMA PROCESS
- Publication number 20250226179
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Non-Intrusive Method for 2D/3D Mapping Plasma Parameters
- Publication number 20240377331
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Balanced RF Resonant Antenna System
- Publication number 20240363310
- Publication date Oct 31, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Plasma Processing
- Publication number 20240347317
- Publication date Oct 17, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEMS WITH MATCHING NETWORK AND METHODS
- Publication number 20240339297
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS