Qiaolin Zhang

Person

Union city, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for modeling a photoresist profile
- Patent number 10,386,718
- Issue date Aug 20, 2019
- Synopsys, Inc.
- Cheng En Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling an arbitrarily polarized illumination source in an optical...
- Patent number 8,527,253
- Issue date Sep 3, 2013
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling thin-film stack topography effect on a photolithography pr...
- Patent number 8,423,917
- Issue date Apr 16, 2013
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling critical-dimension (CD) scanning-electron-microscopy (CD-S...
- Patent number 8,196,068
- Issue date Jun 5, 2012
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bulk image modeling for optical proximity correction
- Patent number 8,006,203
- Issue date Aug 23, 2011
- Synopsys, Inc.
- Yongfa Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for modeling an apodization effect in an optic...
- Patent number 7,681,172
- Issue date Mar 16, 2010
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method for Modeling a Photoresist Profile
- Publication number 20160012175
- Publication date Jan 14, 2016
- Synopsys, Inc.
- Cheng En Wu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR MODELING THIN-FILM TOPOGRAPHY EFFECT ON A...
- Publication number 20110029940
- Publication date Feb 3, 2011
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Modeling critical-dimension (CD) scanning-electron-microscopy (CD-S...
- Publication number 20100280812
- Publication date Nov 4, 2010
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BULK IMAGE MODELING FOR OPTICAL PROXIMITY CORRECTION
- Publication number 20100058280
- Publication date Mar 4, 2010
- Synopsys, Inc.
- Yongfa Fan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODELING A SECTOR-POLARIZED-ILLUMINATION SOURCE IN AN OPTICAL LITHO...
- Publication number 20090265148
- Publication date Oct 22, 2009
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MODELING A VECTORIAL POLARIZATION EFFECT I...
- Publication number 20090070730
- Publication date Mar 12, 2009
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODELING AN ARBITRARILY POLARIZED ILLUMINATION SOURCE IN AN OPTICAL...
- Publication number 20090070083
- Publication date Mar 12, 2009
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for modeling an apodization effect in an optic...
- Publication number 20080184192
- Publication date Jul 31, 2008
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Qiaolin Zhang

Person

Patents Grantslast 30 patents

Method for modeling a photoresist profile

Modeling an arbitrarily polarized illumination source in an optical...

Modeling thin-film stack topography effect on a photolithography pr...

Modeling critical-dimension (CD) scanning-electron-microscopy (CD-S...

Bulk image modeling for optical proximity correction

Method and apparatus for modeling an apodization effect in an optic...

Patents Applicationslast 30 patents

Method for Modeling a Photoresist Profile

METHOD AND APPARATUS FOR MODELING THIN-FILM TOPOGRAPHY EFFECT ON A...

Modeling critical-dimension (CD) scanning-electron-microscopy (CD-S...

BULK IMAGE MODELING FOR OPTICAL PROXIMITY CORRECTION

MODELING A SECTOR-POLARIZED-ILLUMINATION SOURCE IN AN OPTICAL LITHO...

METHOD AND APPARATUS FOR MODELING A VECTORIAL POLARIZATION EFFECT I...

MODELING AN ARBITRARILY POLARIZED ILLUMINATION SOURCE IN AN OPTICAL...

Method and apparatus for modeling an apodization effect in an optic...