Quoc Truong

Person

San Leandro, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reactor for coating particles in stationary chamber with rotating p...
- Patent number 12,134,091
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactor for coating particles in stationary chamber with rotating p...
- Patent number 12,077,856
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection for de-agglomeration in particle coating reactor
- Patent number 12,071,685
- Issue date Aug 27, 2024
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactor for coating particles in stationary chamber with rotating p...
- Patent number 11,717,800
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection for de-agglomeration in particle coating reactor
- Patent number 11,692,265
- Issue date Jul 4, 2023
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reactor for coating particles in stationary chamber with rotating p...
- Patent number 11,674,223
- Issue date Jun 13, 2023
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas injection for de-agglomeration in particle coating reactor
- Patent number 11,299,806
- Issue date Apr 12, 2022
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotary reactor for uniform particle coating with thin films
- Patent number 11,180,851
- Issue date Nov 23, 2021
- Applied Materials, Inc.
- Colin C. Neikirk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotary reactor for uniform particle coating with thin films
- Patent number 11,174,552
- Issue date Nov 16, 2021
- Applied Materials, Inc.
- Colin C. Neikirk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon wafers by epitaxial deposition
- Patent number 11,041,253
- Issue date Jun 22, 2021
- Svagos Technik, Inc.
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
CVD reactor chamber with resistive heating and substrate holder
- Patent number 10,961,621
- Issue date Mar 30, 2021
- Svagos Technik, Inc.
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon wafers by epitaxial deposition
- Patent number 9,982,363
- Issue date May 29, 2018
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 9,920,451
- Issue date Mar 20, 2018
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 9,556,522
- Issue date Jan 31, 2017
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon wafers by epitaxial deposition
- Patent number 9,255,346
- Issue date Feb 9, 2016
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 8,673,081
- Issue date Mar 18, 2014
- Crystal Solar, Inc.
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Grant
High throughput multi-wafer epitaxial reactor
- Patent number 8,298,629
- Issue date Oct 30, 2012
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing system with dual wafer robots capable of asynchron...
- Patent number 8,137,048
- Issue date Mar 20, 2012
- VSERV Technologies
- Mahendran Chidambaram
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Ozone enhancement unit
- Patent number 6,162,285
- Issue date Dec 19, 2000
- Applied Materials, Inc.
- Gary Fong
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Apparatus and methods for controlling process chamber pressure
- Patent number 6,123,097
- Issue date Sep 26, 2000
- Applied Materials, Inc.
- Quoc Truong
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Pressure flow and concentration control of oxygen/ozone gas mixtures
- Patent number 5,904,170
- Issue date May 18, 1999
- Applied Materials, Inc.
- Keith Harvey
- G05 - CONTROLLING REGULATING
Information Patent Grant
Resonant chamber applicator for remote plasma source
- Patent number 5,902,404
- Issue date May 11, 1999
- Applied Materials, Inc.
- Gary Fong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for self-cleaning a blocker plate
- Patent number 5,882,414
- Issue date Mar 16, 1999
- Applied Materials, Inc.
- Gary L. Fong
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
REACTOR FOR COATING PARTICLES IN STATIONARY CHAMBER WITH ROTATING P...
- Publication number 20240376596
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEMBRANE FAILURE DETECTION SYSTEM
- Publication number 20240109164
- Publication date Apr 4, 2024
- Applied Materials, Inc.
- Chang ZHANG
- B24 - GRINDING POLISHING
Information Patent Application
REACTOR FOR COATING PARTICLES IN STATIONARY CHAMBER WITH ROTATING P...
- Publication number 20230347310
- Publication date Nov 2, 2023
- Applied Materials, Inc.
- Jonathan Frankel
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
GAS INJECTION FOR DE-AGGLOMERATION IN PARTICLE COATING REACTOR
- Publication number 20230313368
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTOR FOR COATING PARTICLES IN STATIONARY CHAMBER WITH ROTATING P...
- Publication number 20230279543
- Publication date Sep 7, 2023
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS INJECTION FOR DE-AGGLOMERATION IN PARTICLE COATING REACTOR
- Publication number 20220205091
- Publication date Jun 30, 2022
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE WITH FLOATING ELECTRODES
- Publication number 20220084796
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Quoc Truong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTARY REACTOR FOR UNIFORM PARTICLE COATING WITH THIN FILMS
- Publication number 20220064794
- Publication date Mar 3, 2022
- Applied Materials, Inc.
- Colin C. Neikirk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PADDLE CONFIGURATION FOR A PARTICLE COATING REACTOR
- Publication number 20220032258
- Publication date Feb 3, 2022
- Applied Materials, Inc.
- Govindraj Desai
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
REACTOR FOR COATING PARTICLES IN STATIONARY CHAMBER WITH ROTATING P...
- Publication number 20200338521
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Jonathan Frankel
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
GAS INJECTION FOR DE-AGGLOMERATION IN PARTICLE COATING REACTOR
- Publication number 20200340108
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reactor for Coating Particles in Stationary Chamber with Rotating P...
- Publication number 20200338517
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Jonathan Frankel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTARY REACTOR FOR UNIFORM PARTICLE COATING WITH THIN FILMS
- Publication number 20190376182
- Publication date Dec 12, 2019
- Colin C. Neikirk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rotary Reactor for Uniform Particle Coating with Thin Films
- Publication number 20190376181
- Publication date Dec 12, 2019
- Colin C. Neikirk
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microwave Plasma Source With Split Window
- Publication number 20190311886
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Siva Chandrasekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON WAFERS BY EPITAXIAL DEPOSITION
- Publication number 20190003076
- Publication date Jan 3, 2019
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD REACTOR CHAMBER WITH RESISTIVE HEATING AND SUBSTRATE HOLDER
- Publication number 20170037514
- Publication date Feb 9, 2017
- Crystal Solar Incorporated
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON WAFERS BY EPITAXIAL DEPOSITION
- Publication number 20160222544
- Publication date Aug 4, 2016
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
CVD EPITAXIAL REACTOR CHAMBER WITH RESISTIVE HEATING, THREE CHANNEL...
- Publication number 20150361555
- Publication date Dec 17, 2015
- Crystal Solar Inc.
- Visweswaren Sivaramakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR
- Publication number 20140311403
- Publication date Oct 23, 2014
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
High Throughput Multi-Wafer Epitaxial Reactor
- Publication number 20130059430
- Publication date Mar 7, 2013
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
SILICON WAFERS BY EPITAXIAL DEPOSITION
- Publication number 20130032084
- Publication date Feb 7, 2013
- Crytal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR
- Publication number 20100263587
- Publication date Oct 21, 2010
- Crystal Solar, Incorporated
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
High Throughput Multi-Wafer Epitaxial Reactor
- Publication number 20100215872
- Publication date Aug 26, 2010
- Crystal Solar, Inc.
- Visweswaren Sivaramakrishnan
- C30 - CRYSTAL GROWTH
Information Patent Application
WAFER PROCESSING SYSTEM WITH DUAL WAFER ROBOTS CAPABLE OF ASYNCHRON...
- Publication number 20080152463
- Publication date Jun 26, 2008
- Mahendran Chidambaram
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
Automated analysis of cations in acidic solutions
- Publication number 20070141720
- Publication date Jun 21, 2007
- Larry N. Stewart
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Quoc Truong

Person

Patents Grantslast 30 patents

Reactor for coating particles in stationary chamber with rotating p...

Reactor for coating particles in stationary chamber with rotating p...

Gas injection for de-agglomeration in particle coating reactor

Reactor for coating particles in stationary chamber with rotating p...

Gas injection for de-agglomeration in particle coating reactor

Reactor for coating particles in stationary chamber with rotating p...

Gas injection for de-agglomeration in particle coating reactor

Rotary reactor for uniform particle coating with thin films

Rotary reactor for uniform particle coating with thin films

Silicon wafers by epitaxial deposition

CVD reactor chamber with resistive heating and substrate holder

Silicon wafers by epitaxial deposition

High throughput multi-wafer epitaxial reactor

High throughput multi-wafer epitaxial reactor

Silicon wafers by epitaxial deposition

High throughput multi-wafer epitaxial reactor

High throughput multi-wafer epitaxial reactor

Wafer processing system with dual wafer robots capable of asynchron...

Ozone enhancement unit

Apparatus and methods for controlling process chamber pressure

Pressure flow and concentration control of oxygen/ozone gas mixtures

Resonant chamber applicator for remote plasma source

Method and apparatus for self-cleaning a blocker plate

Patents Applicationslast 30 patents

REACTOR FOR COATING PARTICLES IN STATIONARY CHAMBER WITH ROTATING P...

MEMBRANE FAILURE DETECTION SYSTEM

REACTOR FOR COATING PARTICLES IN STATIONARY CHAMBER WITH ROTATING P...

GAS INJECTION FOR DE-AGGLOMERATION IN PARTICLE COATING REACTOR

REACTOR FOR COATING PARTICLES IN STATIONARY CHAMBER WITH ROTATING P...

GAS INJECTION FOR DE-AGGLOMERATION IN PARTICLE COATING REACTOR

PLASMA SOURCE WITH FLOATING ELECTRODES

ROTARY REACTOR FOR UNIFORM PARTICLE COATING WITH THIN FILMS

PADDLE CONFIGURATION FOR A PARTICLE COATING REACTOR

REACTOR FOR COATING PARTICLES IN STATIONARY CHAMBER WITH ROTATING P...

GAS INJECTION FOR DE-AGGLOMERATION IN PARTICLE COATING REACTOR

Reactor for Coating Particles in Stationary Chamber with Rotating P...

ROTARY REACTOR FOR UNIFORM PARTICLE COATING WITH THIN FILMS

Rotary Reactor for Uniform Particle Coating with Thin Films

Microwave Plasma Source With Split Window

SILICON WAFERS BY EPITAXIAL DEPOSITION

CVD REACTOR CHAMBER WITH RESISTIVE HEATING AND SUBSTRATE HOLDER

SILICON WAFERS BY EPITAXIAL DEPOSITION

CVD EPITAXIAL REACTOR CHAMBER WITH RESISTIVE HEATING, THREE CHANNEL...

HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR

High Throughput Multi-Wafer Epitaxial Reactor

SILICON WAFERS BY EPITAXIAL DEPOSITION

HIGH THROUGHPUT MULTI-WAFER EPITAXIAL REACTOR

High Throughput Multi-Wafer Epitaxial Reactor

WAFER PROCESSING SYSTEM WITH DUAL WAFER ROBOTS CAPABLE OF ASYNCHRON...

Automated analysis of cations in acidic solutions