R. Marshall Stowell

Person

Wilsonville, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Front referenced anode
- Patent number 10,351,968
- Issue date Jul 16, 2019
- Novellus Systems, Inc.
- Jingbin Feng
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electrofill vacuum plating cell
- Patent number 9,677,188
- Issue date Jun 13, 2017
- Novellus Systems, Inc.
- R. Marshall Stowell
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Front referenced anode
- Patent number 9,340,893
- Issue date May 17, 2016
- Novellus Systems, Inc.
- Jingbin Feng
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Front referenced anode
- Patent number 9,028,657
- Issue date May 12, 2015
- Novellus Systems, Inc.
- Jingbin Feng
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Topography reduction and control by selective accelerator removal
- Patent number 8,470,191
- Issue date Jun 25, 2013
- Novellus Systems, Inc.
- Steven T. Mayer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capping before barrier-removal IC fabrication method
- Patent number 8,415,261
- Issue date Apr 9, 2013
- Novellus Systems, Inc.
- Jonathan D. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electroless plating-liquid system
- Patent number 8,257,781
- Issue date Sep 4, 2012
- Novellus Systems, Inc.
- Eric G. Webb
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Topography reduction and control by selective accelerator removal
- Patent number 8,158,532
- Issue date Apr 17, 2012
- Novellus Systems, Inc.
- Steven T. Mayer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capping before barrier-removal IC fabrication method
- Patent number 8,043,958
- Issue date Oct 25, 2011
- Novellus Systems, Inc.
- Jonathan D. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capping before barrier-removal IC fabrication method
- Patent number 7,811,925
- Issue date Oct 12, 2010
- Novellus Systems, Inc.
- Jonathan D. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Small-volume electroless plating cell
- Patent number 7,690,324
- Issue date Apr 6, 2010
- Novellus Systems, Inc.
- Jingbin Feng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capping before barrier-removal IC fabrication method
- Patent number 7,605,082
- Issue date Oct 20, 2009
- Novellus Systems, Inc.
- Jonathan D. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling electrolyte flow for uniform...
- Patent number 6,964,792
- Issue date Nov 15, 2005
- Novellus Systems, Inc.
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Electroless copper deposition apparatus
- Patent number 6,815,349
- Issue date Nov 9, 2004
- Novellus Systems, Inc.
- Edmund B. Minshall
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Clamshell apparatus for electrochemically treating wafers
- Patent number 6,800,187
- Issue date Oct 5, 2004
- Novellus Systems, Inc.
- Jonathan D. Reid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for aligning substrate to chuck in processing chamber
- Patent number 6,126,382
- Issue date Oct 3, 2000
- Novellus Systems, Inc.
- Martin N. Scales
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FRONT REFERENCED ANODE
- Publication number 20160222541
- Publication date Aug 4, 2016
- Novellus Systems, Inc.
- Jingbin Feng
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
FRONT REFERENCED ANODE
- Publication number 20150211144
- Publication date Jul 30, 2015
- Novellus Systems, Inc.
- Jingbin Feng
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ELECTROFILL VACUUM PLATING CELL
- Publication number 20140097088
- Publication date Apr 10, 2014
- Novellus Systems, Inc.
- R. Marshall Stowell
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
FRONT REFERENCED ANODE
- Publication number 20120061246
- Publication date Mar 15, 2012
- Jingbin Feng
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Topography reduction and control by selective accelerator removal
- Publication number 20090277867
- Publication date Nov 12, 2009
- Novellus Systems, Inc.
- Steven T. Mayer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Topography reduction and control by selective accelerator removal
- Publication number 20090280649
- Publication date Nov 12, 2009
- Novellus Systems, Inc.
- Steven T. Mayer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Methods and apparatus for cleaning and drying a work piece
- Publication number 20050178402
- Publication date Aug 18, 2005
- R. Marshall Stowell
- B08 - CLEANING
Information Patent Application
Liquid treatment using thin liquid layer
- Publication number 20040065540
- Publication date Apr 8, 2004
- Novellus Systems, Inc.
- Steven T. Mayer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

R. Marshall Stowell

Person

Patents Grantslast 30 patents

Front referenced anode

Electrofill vacuum plating cell

Front referenced anode

Front referenced anode

Topography reduction and control by selective accelerator removal

Capping before barrier-removal IC fabrication method

Electroless plating-liquid system

Topography reduction and control by selective accelerator removal

Capping before barrier-removal IC fabrication method

Capping before barrier-removal IC fabrication method

Small-volume electroless plating cell

Capping before barrier-removal IC fabrication method

Methods and apparatus for controlling electrolyte flow for uniform...

Electroless copper deposition apparatus

Clamshell apparatus for electrochemically treating wafers

Apparatus for aligning substrate to chuck in processing chamber

Patents Applicationslast 30 patents

FRONT REFERENCED ANODE

FRONT REFERENCED ANODE

ELECTROFILL VACUUM PLATING CELL

FRONT REFERENCED ANODE

Topography reduction and control by selective accelerator removal

Topography reduction and control by selective accelerator removal

Methods and apparatus for cleaning and drying a work piece

Liquid treatment using thin liquid layer