Radha Sundararajan

Person

Dripping Springs, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low electron temperature, edge-density enhanced, surface-wave plasm...
- Patent number 10,375,812
- Issue date Aug 6, 2019
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generation and control using a DC ring
- Patent number 10,354,841
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scalable and uniformity controllable diffusion plasma source
- Patent number 9,431,218
- Issue date Aug 30, 2016
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency (RF) power coupling system utilizing multiple RF po...
- Patent number 9,396,900
- Issue date Jul 19, 2016
- Tokyo Electron Limited
- Barton Lane
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Low electron temperature, edge-density enhanced, surface wave plasm...
- Patent number 9,301,383
- Issue date Mar 29, 2016
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of electrical signaling in an ion energy analyzer
- Patent number 9,087,677
- Issue date Jul 21, 2015
- Tokyo Electron Limited
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Low electron temperature microwave surface-wave plasma (SWP) proces...
- Patent number 8,968,588
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion energy analyzer
- Patent number 8,847,159
- Issue date Sep 30, 2014
- Tokyo Electron Limited
- Lee Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Ion energy analyzer and methods of manufacturing the same
- Patent number 8,816,281
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Variable capacitance chamber component incorporating ferroelectric...
- Patent number 8,721,833
- Issue date May 13, 2014
- TOKYO ELECTRON LIMITED
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adaptive recipe selector
- Patent number 8,501,499
- Issue date Aug 6, 2013
- Tokyo Electron Limited
- Radha Sundararajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Variable capacitance chamber component incorporating a semiconducto...
- Patent number 8,486,798
- Issue date Jul 16, 2013
- Tokyo Electron Limited
- Zhiying Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for improving photoresist properties using a q...
- Patent number 8,343,371
- Issue date Jan 1, 2013
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Creating metal gate structures using Lithography-Etch-Lithography-E...
- Patent number 8,183,062
- Issue date May 22, 2012
- Tokyo Electron Limited
- Merritt Funk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Creating multi-layer/multi-input/multi-output (MLMIMO) models for m...
- Patent number 8,019,458
- Issue date Sep 13, 2011
- Tokyo Electron Limited
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Grant
Dynamic control of process chemistry for improved within-substrate...
- Patent number 7,988,813
- Issue date Aug 2, 2011
- Tokyo Electron Limited
- Lee Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multi-layer/multi-input/multi-output (MLMIMO) models and method for...
- Patent number 7,967,995
- Issue date Jun 28, 2011
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for spacer-optimization (S-O)
- Patent number 7,939,450
- Issue date May 10, 2011
- Tokyo Electron Limited
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for creating a gate optimization evaluation li...
- Patent number 7,899,637
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Asao Yamashita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models for meta...
- Patent number 7,894,927
- Issue date Feb 22, 2011
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for optimizing a gate channel
- Patent number 7,713,758
- Issue date May 11, 2010
- Tokyo Electon Limited
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic temperature backside gas control for improved within-substr...
- Patent number 7,674,636
- Issue date Mar 9, 2010
- Tokyo Electron Limited
- Radha Sundararajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damage assessment of a wafer using optical metrology
- Patent number 7,623,978
- Issue date Nov 24, 2009
- Tokyo Electron Limited
- Kevin Lally
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring a damaged structure formed on a wafer using optical metro...
- Patent number 7,619,731
- Issue date Nov 17, 2009
- Tokyo Electron Limited
- Kevin Lally
- G01 - MEASURING TESTING
Information Patent Grant
Creating a library for measuring a damaged structure formed on a wa...
- Patent number 7,576,851
- Issue date Aug 18, 2009
- Tokyo Electron Limited
- Kevin Lally
- G01 - MEASURING TESTING
Information Patent Grant
Dynamic metrology sampling with wafer uniformity control
- Patent number 7,567,700
- Issue date Jul 28, 2009
- Tokyo Electron Limited
- Merritt Funk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic metrology sampling for a dual damascene process
- Patent number 7,502,709
- Issue date Mar 10, 2009
- Tokyo Electron, Ltd.
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fault detection and classification (FDC) using a run-to-run controller
- Patent number 7,477,960
- Issue date Jan 13, 2009
- Tokyo Electron Limited
- James E. Willis
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Measuring a damaged structure formed on a wafer using optical metro...
- Patent number 7,324,193
- Issue date Jan 29, 2008
- Tokyo Electron Limited
- Kevin Lally
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Plasma Generation and Control Using a DC Ring
- Publication number 20160300738
- Publication date Oct 13, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ELECTRON TEMPERATURE, EDGE-DENSITY ENHANCED, SURFACE-WAVE PLASM...
- Publication number 20160212833
- Publication date Jul 21, 2016
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DC PULSE ETCHER
- Publication number 20140263182
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCALABLE AND UNIFORMITY CONTROLLABLE DIFFUSION PLASMA SOURCE
- Publication number 20140265846
- Publication date Sep 18, 2014
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM USING PLASMA TUNING RODS FOR PLASMA PROCESSING
- Publication number 20140262040
- Publication date Sep 18, 2014
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW ELECTRON TEMPERATURE, EDGE-DENSITY ENHANCED, SURFACE WAVE PLASM...
- Publication number 20130270997
- Publication date Oct 17, 2013
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW ELECTRON TEMPERATURE MICROWAVE SURFACE-WAVE PLASMA (SWP) PROCES...
- Publication number 20130256272
- Publication date Oct 3, 2013
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VARIABLE CAPACITANCE CHAMBER COMPONENT INCORPORATING A SEMICONDUCTO...
- Publication number 20130200494
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Zhiying CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VARIABLE CAPACITANCE CHAMBER COMPONENT INCORPORATING FERROELECTRIC...
- Publication number 20130203258
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Zhiying CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY (RF) POWER COUPLING SYSTEM UTILIZING MULTIPLE RF PO...
- Publication number 20130119854
- Publication date May 16, 2013
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION ENERGY ANALYZER
- Publication number 20120248310
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Lee Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS OF ELECTRICAL SIGNALING IN AN ION ENERGY ANALYZER
- Publication number 20120248322
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Adaptive Recipe Selector
- Publication number 20120252141
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Radha Sundararajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION ENERGY ANALYZER AND METHODS OF MANUFACTURING THE SAME
- Publication number 20120248311
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Apparatus and Method for Improving Photoresist Properties Using a Q...
- Publication number 20110174606
- Publication date Jul 21, 2011
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Creating Metal Gate Structures Using Lithography-Etch-Lithography-E...
- Publication number 20100214545
- Publication date Aug 26, 2010
- TOKYO ELECTRON LIMITED
- Merritt Funk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and Method for Improving Photoresist Properties
- Publication number 20100081285
- Publication date Apr 1, 2010
- TOKYO ELECTRON LIMITED
- Lee Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Creating Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models for M...
- Publication number 20100036514
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Merritt Funk
- G05 - CONTROLLING REGULATING
Information Patent Application
Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models for Meta...
- Publication number 20100036518
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models and Method for...
- Publication number 20090242513
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Spacer-Optimization (S-O)
- Publication number 20090081815
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Creating a Spacer-Optimization (S-O) Library
- Publication number 20090082983
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Optimizing a Gate Channel
- Publication number 20080311687
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Creating a Gate Optimization Evaluation Li...
- Publication number 20080311688
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Asao Yamashita
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DYNAMIC CONTROL OF PROCESS CHEMISTRY FOR IMPROVED WITHIN-SUBSTRATE...
- Publication number 20080223873
- Publication date Sep 18, 2008
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DYNAMIC TEMPERATURE BACKSIDE GAS CONTROL FOR IMPROVED WITHIN-SUBSTR...
- Publication number 20080227227
- Publication date Sep 18, 2008
- TOKYO ELECTRON LIMITED
- Radha Sundararajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING A DAMAGED STRUCTURE FORMED ON A WAFER USING OPTICAL METRO...
- Publication number 20080137078
- Publication date Jun 12, 2008
- TOKYO ELECTRON LIMITED
- Kevin LALLY
- G01 - MEASURING TESTING
Information Patent Application
Dynamic metrology sampling with wafer uniformity control
- Publication number 20070238201
- Publication date Oct 11, 2007
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dynamic metrology sampling with wafer uniformity control
- Publication number 20070237383
- Publication date Oct 11, 2007
- Merritt Funk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Damage assessment of a wafer using optical metrology
- Publication number 20070232045
- Publication date Oct 4, 2007
- Tokyo Electron, Ltd.
- Kevin Lally
- H01 - BASIC ELECTRIC ELEMENTS

Radha Sundararajan

Person

Patents Grantslast 30 patents

Low electron temperature, edge-density enhanced, surface-wave plasm...

Plasma generation and control using a DC ring

Scalable and uniformity controllable diffusion plasma source

Radio frequency (RF) power coupling system utilizing multiple RF po...

Low electron temperature, edge-density enhanced, surface wave plasm...

Methods of electrical signaling in an ion energy analyzer

Low electron temperature microwave surface-wave plasma (SWP) proces...

Ion energy analyzer

Ion energy analyzer and methods of manufacturing the same

Variable capacitance chamber component incorporating ferroelectric...

Adaptive recipe selector

Variable capacitance chamber component incorporating a semiconducto...

Apparatus and method for improving photoresist properties using a q...

Creating metal gate structures using Lithography-Etch-Lithography-E...

Creating multi-layer/multi-input/multi-output (MLMIMO) models for m...

Dynamic control of process chemistry for improved within-substrate...

Multi-layer/multi-input/multi-output (MLMIMO) models and method for...

Method and apparatus for spacer-optimization (S-O)

Method and apparatus for creating a gate optimization evaluation li...

Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models for meta...

Method and apparatus for optimizing a gate channel

Dynamic temperature backside gas control for improved within-substr...

Damage assessment of a wafer using optical metrology

Measuring a damaged structure formed on a wafer using optical metro...

Creating a library for measuring a damaged structure formed on a wa...

Dynamic metrology sampling with wafer uniformity control

Dynamic metrology sampling for a dual damascene process

Fault detection and classification (FDC) using a run-to-run controller

Measuring a damaged structure formed on a wafer using optical metro...

Patents Applicationslast 30 patents

Plasma Generation and Control Using a DC Ring

LOW ELECTRON TEMPERATURE, EDGE-DENSITY ENHANCED, SURFACE-WAVE PLASM...

DC PULSE ETCHER

SCALABLE AND UNIFORMITY CONTROLLABLE DIFFUSION PLASMA SOURCE

METHOD AND SYSTEM USING PLASMA TUNING RODS FOR PLASMA PROCESSING

LOW ELECTRON TEMPERATURE, EDGE-DENSITY ENHANCED, SURFACE WAVE PLASM...

LOW ELECTRON TEMPERATURE MICROWAVE SURFACE-WAVE PLASMA (SWP) PROCES...

VARIABLE CAPACITANCE CHAMBER COMPONENT INCORPORATING A SEMICONDUCTO...

VARIABLE CAPACITANCE CHAMBER COMPONENT INCORPORATING FERROELECTRIC...

RADIO FREQUENCY (RF) POWER COUPLING SYSTEM UTILIZING MULTIPLE RF PO...

ION ENERGY ANALYZER

METHODS OF ELECTRICAL SIGNALING IN AN ION ENERGY ANALYZER

Adaptive Recipe Selector

ION ENERGY ANALYZER AND METHODS OF MANUFACTURING THE SAME

Apparatus and Method for Improving Photoresist Properties Using a Q...

Creating Metal Gate Structures Using Lithography-Etch-Lithography-E...

Apparatus and Method for Improving Photoresist Properties

Creating Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models for M...

Using Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models for Meta...

Multi-Layer/Multi-Input/Multi-Output (MLMIMO) Models and Method for...

Method and Apparatus for Spacer-Optimization (S-O)

Method and Apparatus for Creating a Spacer-Optimization (S-O) Library

Method and Apparatus for Optimizing a Gate Channel

Method and Apparatus for Creating a Gate Optimization Evaluation Li...

DYNAMIC CONTROL OF PROCESS CHEMISTRY FOR IMPROVED WITHIN-SUBSTRATE...

DYNAMIC TEMPERATURE BACKSIDE GAS CONTROL FOR IMPROVED WITHIN-SUBSTR...

MEASURING A DAMAGED STRUCTURE FORMED ON A WAFER USING OPTICAL METRO...

Dynamic metrology sampling with wafer uniformity control

Dynamic metrology sampling with wafer uniformity control

Damage assessment of a wafer using optical metrology