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Rahul Jairath
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Austin, TX, US
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last 30 patents
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Patent Grant
Method and apparatus for polishing a semiconductor substrate wafer
Patent number
5,688,360
Issue date
Nov 18, 1997
National Semiconductor Corporation
Rahul Jairath
B08 - CLEANING
Information
Patent Grant
Method and apparatus for polishing a semiconductor substrate wafer
Patent number
5,665,656
Issue date
Sep 9, 1997
National Semiconductor Corporation
Rahul Jairath
B08 - CLEANING
Information
Patent Grant
Method of using additives with silica-based slurries to enhance sel...
Patent number
5,614,444
Issue date
Mar 25, 1997
Sematech, Inc.
Janos Farkas
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Point of use slurry dispensing system
Patent number
5,478,435
Issue date
Dec 26, 1995
National Semiconductor Corp.
James J. Murphy
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL