Rainer Pforr

Person

Dresden, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for determining a critical dimension variation...
- Patent number 10,157,804
- Issue date Dec 18, 2018
- Carl Zeiss SMS Ltd.
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic targets for uniformity control
- Patent number 8,871,409
- Issue date Oct 28, 2014
- Carl Zeiss SMS Ltd
- Rainer Pforr
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for minimizing overlay errors in lithography
- Patent number 8,539,394
- Issue date Sep 17, 2013
- Carl Zeiss SMS Ltd
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic mask and method of forming a lithographic mask
- Patent number 8,293,431
- Issue date Oct 23, 2012
- Advanced Mask Technology Center GmbH & Co. KG
- Haiko Rolff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of compensating lens heating, lithographic projection syste...
- Patent number 7,855,776
- Issue date Dec 21, 2010
- Qimonda AG
- Bernd Kuechler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a mask for the lithographic projection of a pa...
- Patent number 7,644,389
- Issue date Jan 5, 2010
- Qimonda AG
- Mario Hennig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection mask, use of the reflection mask and method for fabricat...
- Patent number 7,588,867
- Issue date Sep 15, 2009
- Infineon Technologies AG
- Frank-Michael Kamm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
System and method for projecting a pattern from a mask onto a subst...
- Patent number 7,489,386
- Issue date Feb 10, 2009
- Qimonda AG
- Frank-Michael Kamm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for reducing an overlay error and measurement mark for carry...
- Patent number 7,425,396
- Issue date Sep 16, 2008
- Infineon Technologies AG
- Stefan Gruss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Set of at least two masks for the projection of structure patterns
- Patent number 7,393,613
- Issue date Jul 1, 2008
- Infineon Technologies AG
- Wolfgang Dettmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Set of masks including a first mask and a second trimming mask with...
- Patent number 7,393,614
- Issue date Jul 1, 2008
- Infineon Technologies AG
- Roderick Köhle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography mask for imaging of convex structures
- Patent number 7,354,683
- Issue date Apr 8, 2008
- Infineon Technologies AG
- Molela Moukara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for projecting a pattern into an image plane
- Patent number 7,339,652
- Issue date Mar 4, 2008
- Infineon Technologies AG
- Molela Moukara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic mask and methods for producing a structure and of...
- Patent number 6,838,216
- Issue date Jan 4, 2005
- Infineon Technologies AG
- Uwe Griesinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for optical projection systems, and a process for its production
- Patent number 6,692,875
- Issue date Feb 17, 2004
- Infineon Technologies AG
- Werner Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating phase mask
- Patent number 6,660,437
- Issue date Dec 9, 2003
- Infineon Technologies AG
- Christoph Friedrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contact hole fabrication with the aid of mutually crossing sudden p...
- Patent number 6,635,388
- Issue date Oct 21, 2003
- Infineon Technologies AG
- Christoph Friedrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of transferring a pattern of high structure density by multi...
- Patent number 6,627,392
- Issue date Sep 30, 2003
- Infineon Technologies AG
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Trimming mask with semitransparent phase-shifting regions
- Patent number 6,466,373
- Issue date Oct 15, 2002
- Siemens Aktiengesellschaft
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR DETERMINING A CRITICAL DIMENSION VARIATION...
- Publication number 20140236516
- Publication date Aug 21, 2014
- CARL ZEISS SMS LTD.
- Rainer Pforr
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC TARGETS FOR UNIFORMITY CONTROL
- Publication number 20130295698
- Publication date Nov 7, 2013
- Rainer Pforr
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR MINIMIZING OVERLAY ERRORS IN LITHOGRAPHY
- Publication number 20120227014
- Publication date Sep 6, 2012
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Mask and Method of Forming a Lithographic Mask
- Publication number 20100266939
- Publication date Oct 21, 2010
- Haiko Rolff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Compensating Lens Heating, Lithographic Projection Syste...
- Publication number 20090244502
- Publication date Oct 1, 2009
- Bernd Kuechler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Patterning a Substrate, Photosensitive Layer Stack and Sy...
- Publication number 20090170024
- Publication date Jul 2, 2009
- Mario Hennig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE LAYER STACK
- Publication number 20080318153
- Publication date Dec 25, 2008
- QIMONDA AG
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Adjusting an Optical Model
- Publication number 20080304029
- Publication date Dec 11, 2008
- QIMONDA AG
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask Structure for Manufacturing an Integrated Circuit by Photolith...
- Publication number 20080204686
- Publication date Aug 28, 2008
- Wolfgang Henke
- G02 - OPTICS
Information Patent Application
Transistor arrangement, sense-amplifier arrangement and methods of...
- Publication number 20080042171
- Publication date Feb 21, 2008
- Sebastian Mosler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask arrangement, optical projection system and method for obtainin...
- Publication number 20070287075
- Publication date Dec 13, 2007
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Projecting a Pattern from a Mask onto a Subst...
- Publication number 20070263198
- Publication date Nov 15, 2007
- Qimonda AG
- Frank-Michael Kamm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Arrangement for the transfer of structural elements of a photomask...
- Publication number 20070229790
- Publication date Oct 4, 2007
- Bernd Kuechler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A MASK FOR THE LITHOGRAPHIC PROJECTION OF A PA...
- Publication number 20070196744
- Publication date Aug 23, 2007
- Qimonda AG
- Mario Hennig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for photolithography
- Publication number 20070009816
- Publication date Jan 11, 2007
- Rainer Pforr
- G02 - OPTICS
Information Patent Application
Apparatus for projecting a pattern into an image plane
- Publication number 20060181691
- Publication date Aug 17, 2006
- Molela Moukara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflection mask, use of the reflection mask and method for fabricat...
- Publication number 20050287447
- Publication date Dec 29, 2005
- Frank-Michael Kamm
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for transferring a layout of an integrated circuit level to...
- Publication number 20050196689
- Publication date Sep 8, 2005
- Christoph Nolscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography mask for imaging of convex structures
- Publication number 20050095512
- Publication date May 5, 2005
- Molela Moukara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for reducing an overlay error and measurement mark for carry...
- Publication number 20050069790
- Publication date Mar 31, 2005
- Stefan Gruss
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Set of at least two masks for the projection of structure patterns...
- Publication number 20040202943
- Publication date Oct 14, 2004
- Wolfgang Dettmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Set of masks for the projection of structure patterns onto a semico...
- Publication number 20040197677
- Publication date Oct 7, 2004
- Roderick Kohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photolithographic mask and methods for producing a structure and of...
- Publication number 20040038135
- Publication date Feb 26, 2004
- Uwe Griesinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alternating phase mask
- Publication number 20030008218
- Publication date Jan 9, 2003
- Christoph Friedrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of transferring a pattern of high structure density by multi...
- Publication number 20020110753
- Publication date Aug 15, 2002
- Rainer Pforr
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask for optical projection systems, and a process for its production
- Publication number 20020006554
- Publication date Jan 17, 2002
- Werner Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase mask
- Publication number 20010021476
- Publication date Sep 13, 2001
- Fritz Gans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Rainer Pforr

Person

Patents Grantslast 30 patents

Method and apparatus for determining a critical dimension variation...

Lithographic targets for uniformity control

Method and apparatus for minimizing overlay errors in lithography

Lithographic mask and method of forming a lithographic mask

Methods of compensating lens heating, lithographic projection syste...

Method for producing a mask for the lithographic projection of a pa...

Reflection mask, use of the reflection mask and method for fabricat...

System and method for projecting a pattern from a mask onto a subst...

Method for reducing an overlay error and measurement mark for carry...

Set of at least two masks for the projection of structure patterns

Set of masks including a first mask and a second trimming mask with...

Lithography mask for imaging of convex structures

Apparatus for projecting a pattern into an image plane

Photolithographic mask and methods for producing a structure and of...

Mask for optical projection systems, and a process for its production

Alternating phase mask

Contact hole fabrication with the aid of mutually crossing sudden p...

Method of transferring a pattern of high structure density by multi...

Trimming mask with semitransparent phase-shifting regions

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR DETERMINING A CRITICAL DIMENSION VARIATION...

LITHOGRAPHIC TARGETS FOR UNIFORMITY CONTROL

METHOD AND APPARATUS FOR MINIMIZING OVERLAY ERRORS IN LITHOGRAPHY

Lithographic Mask and Method of Forming a Lithographic Mask

Methods of Compensating Lens Heating, Lithographic Projection Syste...

Method of Patterning a Substrate, Photosensitive Layer Stack and Sy...

PHOTOSENSITIVE LAYER STACK

Method and System for Adjusting an Optical Model

Mask Structure for Manufacturing an Integrated Circuit by Photolith...

Transistor arrangement, sense-amplifier arrangement and methods of...

Mask arrangement, optical projection system and method for obtainin...

System and Method for Projecting a Pattern from a Mask onto a Subst...

Arrangement for the transfer of structural elements of a photomask...

METHOD FOR PRODUCING A MASK FOR THE LITHOGRAPHIC PROJECTION OF A PA...

Method and system for photolithography

Apparatus for projecting a pattern into an image plane

Reflection mask, use of the reflection mask and method for fabricat...

Method for transferring a layout of an integrated circuit level to...

Lithography mask for imaging of convex structures

Method for reducing an overlay error and measurement mark for carry...

Set of at least two masks for the projection of structure patterns...

Set of masks for the projection of structure patterns onto a semico...

Photolithographic mask and methods for producing a structure and of...

Alternating phase mask

Method of transferring a pattern of high structure density by multi...

Mask for optical projection systems, and a process for its production

Phase mask