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Raj Sakamuri

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  • Sharon, MA, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Dielectric film-forming composition
    • Patent number 11,945,894
    • Issue date Apr 2, 2024
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Binod B. De
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Grant

    Polyimides
    • Patent number 11,939,428
    • Issue date Mar 26, 2024
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Binod B. De
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Photosensitive polyimide compositions
    • Patent number 11,899,364
    • Issue date Feb 13, 2024
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Binod B. De
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Photosensitive polyimide compositions
    • Patent number 11,782,344
    • Issue date Oct 10, 2023
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Sanjay Malik
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Stripping compositions for removing photoresists from semiconductor...
    • Patent number 11,208,616
    • Issue date Dec 28, 2021
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Atsushi Mizutani
    • C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
  • Information Patent Grant

    Photosensitive stacked structure
    • Patent number 11,175,582
    • Issue date Nov 16, 2021
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Sanjay Malik
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Polyimides
    • Patent number 11,061,327
    • Issue date Jul 13, 2021
    • Fujifilm Electronic Materials U.S.A., Inc.
    • William A. Reinerth
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Grant

    Dielectric film forming composition
    • Patent number 10,875,965
    • Issue date Dec 29, 2020
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Sanjay Malik
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Grant

    Polyimides
    • Patent number 10,793,676
    • Issue date Oct 6, 2020
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Sanjay Malik
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Grant

    Cleaning composition
    • Patent number 10,696,932
    • Issue date Jun 30, 2020
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Raj Sakamuri
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Stripping process
    • Patent number 10,345,707
    • Issue date Jul 9, 2019
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Raj Sakamuri
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Photosensitive polyimide compositions
    • Patent number 10,036,952
    • Issue date Jul 31, 2018
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Sanjay Malik
    • B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
  • Information Patent Grant

    High etch resistant underlayer compositions for multilayer lithogra...
    • Patent number 7,727,705
    • Issue date Jun 1, 2010
    • Fujifilm Electronic Materials, U.S.A., Inc.
    • Binod B. De
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Process of imaging a deep ultraviolet photoresist with a top coatin...
    • Patent number 7,473,512
    • Issue date Jan 6, 2009
    • AZ Electronic Materials USA Corp.
    • Francis M. Houlihan
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Photoresist composition for deep ultraviolet lithography
    • Patent number 7,351,521
    • Issue date Apr 1, 2008
    • AZ Electronic Materials USA Corp.
    • Ralph R. Dammel
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Photoresist composition for deep ultraviolet lithography
    • Patent number 7,211,366
    • Issue date May 1, 2007
    • AZ Electronic Materials USA Corp.
    • Ralph R. Dammel
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Process for producing an image using a first minimum bottom antiref...
    • Patent number 7,070,914
    • Issue date Jul 4, 2006
    • AZ Electronic Materials USA Corp.
    • Mark O. Neisser
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Photoresist composition for deep ultraviolet lithography
    • Patent number 6,737,215
    • Issue date May 18, 2004
    • Clariant Finance (BVI) Ltd
    • Ralph R. Dammel
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Polymer suitable for photoresist compositions
    • Patent number 6,686,429
    • Issue date Feb 3, 2004
    • Clariant Finance (BVI) Limited
    • Ralph R. Dammel
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Polymer suitable for photoresist compositions
    • Patent number 6,486,282
    • Issue date Nov 26, 2002
    • Clariant Finance (BVI) Limited
    • Ralph R. Dammel
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

  • Information Patent Application

    Dielectric Film-Forming Composition
    • Publication number 20220127459
    • Publication date Apr 28, 2022
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Binod B. De
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Dielectric Film-Forming Composition
    • Publication number 20220002463
    • Publication date Jan 6, 2022
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Binod B. De
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Polyimides
    • Publication number 20210355279
    • Publication date Nov 18, 2021
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Binod B. De
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Planarizing Process and Composition
    • Publication number 20210104398
    • Publication date Apr 8, 2021
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Micheala Connell
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    STRIPPING COMPOSITIONS FOR REMOVING PHOTORESISTS FROM SEMICONDUCTOR...
    • Publication number 20200339919
    • Publication date Oct 29, 2020
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Atsushi Mizutani
    • C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
  • Information Patent Application

    Polyimides
    • Publication number 20200262978
    • Publication date Aug 20, 2020
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Binod B. De
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    PHOTOSENSITIVE POLYIMIDE COMPOSITIONS
    • Publication number 20200218152
    • Publication date Jul 9, 2020
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Binod B. De
    • B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
  • Information Patent Application

    POLYIMIDES
    • Publication number 20190263969
    • Publication date Aug 29, 2019
    • FUJIFILM ELECTRONIC MATERIALS U.S.A. INC.
    • Sanjay Malik
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    PHOTOSENSITIVE POLYIMIDE COMPOSITIONS
    • Publication number 20190171105
    • Publication date Jun 6, 2019
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Sanjay Malik
    • B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
  • Information Patent Application

    POLYIMIDES
    • Publication number 20190129303
    • Publication date May 2, 2019
    • FUJIFLIM ELECTRONIC MATERIALS U.S.A. INC.
    • William A. Reinerth
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Dielectric Film Forming Composition
    • Publication number 20190081001
    • Publication date Mar 14, 2019
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Sanjay Malik
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    CLEANING COMPOSITION
    • Publication number 20190016999
    • Publication date Jan 17, 2019
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Raj Sakamuri
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    PHOTOSENSITIVE STACKED STRUCTURE
    • Publication number 20190018321
    • Publication date Jan 17, 2019
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Sanjay Malik
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Stripping Process
    • Publication number 20180136563
    • Publication date May 17, 2018
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Raj Sakamuri
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PHOTOSENSITIVE POLYIMIDE COMPOSITIONS
    • Publication number 20160313642
    • Publication date Oct 27, 2016
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Sanjay Malik
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PHOTOSENSITIVE POLYIMIDE COMPOSITIONS
    • Publication number 20160313641
    • Publication date Oct 27, 2016
    • Fujifilm Electronic Materials U.S.A., Inc.
    • Binod B. De
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRA...
    • Publication number 20080206667
    • Publication date Aug 28, 2008
    • FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC.
    • Binod B. De
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photoresist composition for deep ultraviolet lithography
    • Publication number 20070172762
    • Publication date Jul 26, 2007
    • Ralph R. Dammel
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photoresist composition for deep ultraviolet lithography
    • Publication number 20070154841
    • Publication date Jul 5, 2007
    • Ralph R. Dammel
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Process for producing an image using a first minimum bottom antiref...
    • Publication number 20060199103
    • Publication date Sep 7, 2006
    • Mark O. Neisser
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Process of imaging a deep ultraviolet photoresist with a top coatin...
    • Publication number 20050202347
    • Publication date Sep 15, 2005
    • Francis M. Houlihan
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Process of imaging a deep ultraviolet photoresist with a top coatin...
    • Publication number 20050202340
    • Publication date Sep 15, 2005
    • Francis M. Houlihan
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Process of imaging a deep ultraviolet photoresist with a top coatin...
    • Publication number 20050202351
    • Publication date Sep 15, 2005
    • Francis M. Houlihan
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photoresist composition for deep ultraviolet lithography
    • Publication number 20040166433
    • Publication date Aug 26, 2004
    • Ralph R. Dammel
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photoresist composition for deep ultraviolet lithography
    • Publication number 20040166434
    • Publication date Aug 26, 2004
    • Ralph R. Dammel
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Process for producing an image using a first minimum bottom antiref...
    • Publication number 20030129547
    • Publication date Jul 10, 2003
    • Mark O. Neisser
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS
    • Publication number 20030013831
    • Publication date Jan 16, 2003
    • Ralph R. Dammel
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Photoresist composition for deep ultraviolet lithography
    • Publication number 20020187419
    • Publication date Dec 12, 2002
    • Ralph R. Dammel
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC