Rajiv Krishan Agarwal

Person

Malvern, PA, US

People

Patents Grantslast 30 patents

Information Patent Grant
TiN hard mask and etch residue removal
- Patent number 10,711,227
- Issue date Jul 14, 2020
- VERSUM MATERIALS US, LLC
- Wen Dar Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semi-aqueous photoresist or semiconductor manufacturing residue str...
- Patent number 10,073,351
- Issue date Sep 11, 2018
- VERSUM MATERIALS US, LLC
- Rajiv Krishan Agarwal
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
TiN hard mask and etch residual removal
- Patent number 9,976,111
- Issue date May 22, 2018
- VERSUM MATERIALS US, LLC
- Wen Dar Liu
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Process for making trisilylamine
- Patent number 9,463,978
- Issue date Oct 11, 2016
- Air Products and Chemicals, Inc.
- Rajiv Krishan Agarwal
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Process for making trisilylamine
- Patent number 9,284,198
- Issue date Mar 15, 2016
- Air Products and Chemicals, Inc.
- Rajiv Krishan Agarwal
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for making a chlorosilane
- Patent number 8,206,676
- Issue date Jun 26, 2012
- Air Products and Chemicals, Inc.
- Rajiv K. Agarwal
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Removal of sulfur-containing impurities from volatile metal hydrides
- Patent number 7,250,072
- Issue date Jul 31, 2007
- Air Products and Chemicals, Inc.
- Rajiv K. Agarwal
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Process for the production and purification of bis(tertiary-butylam...
- Patent number 6,963,006
- Issue date Nov 8, 2005
- Air Products and Chemicals, Inc.
- Yin Pang Tsui
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
TiN Hard Mask and Etch Residue Removal
- Publication number 20180251711
- Publication date Sep 6, 2018
- VERSUM MATERIALS US, LLC
- Wen Dar Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TiN Hard Mask And Etch Residual Removal
- Publication number 20170107460
- Publication date Apr 20, 2017
- Air Products and Chemicals, Inc.
- Wen Dar Liu
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Str...
- Publication number 20160179011
- Publication date Jun 23, 2016
- Air Products and Chemicals, Inc.
- Rajiv Krishan Agarwal
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
PROCESS FOR MAKING TRISILYLAMINE
- Publication number 20160145102
- Publication date May 26, 2016
- Air Products and Chemicals, Inc.
- Rajiv Krishan Agarwal
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
PROCESS FOR MAKING TRISILYLAMINE
- Publication number 20150004089
- Publication date Jan 1, 2015
- Air Products and Chemicals, Inc.
- Rajiv Krishan Agarwal
- C01 - INORGANIC CHEMISTRY
Information Patent Application
SYSTEM AND METHOD FOR TUNGSTEN HEXAFLUORIDE RECOVERY AND REUSE
- Publication number 20140196664
- Publication date Jul 17, 2014
- Air Products and Chemicals, Inc.
- Andrew David Johnson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Making a Chlorosilane
- Publication number 20110113628
- Publication date May 19, 2011
- Air Products and Chemicals, Inc.
- Rajiv K. Agarwal
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Removal of sulfur-containing impurities from volatile metal hydrides
- Publication number 20050106090
- Publication date May 19, 2005
- Rajiv K. Agarwal
- C01 - INORGANIC CHEMISTRY
Information Patent Application
Process for the production and purification of bis(tertiary-butylam...
- Publication number 20040138491
- Publication date Jul 15, 2004
- Yin Pang Tsui
- C07 - ORGANIC CHEMISTRY

Rajiv Krishan Agarwal

Person

Patents Grantslast 30 patents

TiN hard mask and etch residue removal

Semi-aqueous photoresist or semiconductor manufacturing residue str...

TiN hard mask and etch residual removal

Process for making trisilylamine

Process for making trisilylamine

Method for making a chlorosilane

Removal of sulfur-containing impurities from volatile metal hydrides

Process for the production and purification of bis(tertiary-butylam...

Patents Applicationslast 30 patents

TiN Hard Mask and Etch Residue Removal

TiN Hard Mask And Etch Residual Removal

Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Str...

PROCESS FOR MAKING TRISILYLAMINE

PROCESS FOR MAKING TRISILYLAMINE

SYSTEM AND METHOD FOR TUNGSTEN HEXAFLUORIDE RECOVERY AND REUSE

Method for Making a Chlorosilane

Removal of sulfur-containing impurities from volatile metal hydrides

Process for the production and purification of bis(tertiary-butylam...