Ralf Martinus Marinus Daverveld

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Sint-Oedenrode, NL

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Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC METHOD, APPARATUS AND CONTROLLER
- Publication number 20100104959
- Publication date Apr 29, 2010
- ASML NETHERLANDS B.V.
- Rik Teodoor Vangheluwe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of inspecting a substrate and method of preparing a substrat...
- Publication number 20080292780
- Publication date Nov 27, 2008
- ASML NETHERLANDS B.V.
- Rik Teodoor Vangheluwe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY