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Ralph Albano
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Columbia, MD, US
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last 30 patents
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Patent Grant
Fluorine-free plasma curing process for porous low-k materials
Patent number
7,011,868
Issue date
Mar 14, 2006
Axcelis Technologies, Inc.
Carlo Waldfried
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma curing process for porous low-k materials
Patent number
6,913,796
Issue date
Jul 5, 2005
Axcelis Technologies, Inc.
Ralph Albano
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma curing of MSQ-based porous low-k film materials
Patent number
6,759,098
Issue date
Jul 6, 2004
Axcelis Technologies, Inc.
Qingyuan Han
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
Fluorine-free plasma curing process for porous low-k materials
Publication number
20040028916
Publication date
Feb 12, 2004
Carlo Waldfried
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Fluorine-free plasma curing process for porous low-k materials
Publication number
20030157267
Publication date
Aug 21, 2003
Carlo Waldfried
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Ultraviolet curing process for porous low-K materials
Publication number
20030054115
Publication date
Mar 20, 2003
Ralph Albano
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Application
Plasma curing process for porous low-k materials
Publication number
20020106500
Publication date
Aug 8, 2002
Ralph Albano
C01 - INORGANIC CHEMISTRY
Information
Patent Application
Plasma curing of MSQ-based porous low-k film materials
Publication number
20020102413
Publication date
Aug 1, 2002
Qingyuan Han
C01 - INORGANIC CHEMISTRY