Ralph Dammel

Person

Klein-Winternheim, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene
- Patent number 5,807,947
- Issue date Sep 15, 1998
- Clariant Finance (BVI) Limited
- Richard Vicari
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-curable mixture, and radiation-sensitive recording materi...
- Patent number 5,614,351
- Issue date Mar 25, 1997
- Hoechst Aktiengesellschaft
- Ralph Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working radiation-sensitive mixture containing diazomethan...
- Patent number 5,424,166
- Issue date Jun 13, 1995
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive radiation-sensitive mixture and recording material produce...
- Patent number 5,403,697
- Issue date Apr 4, 1995
- Hoechst Aktiengesellschaft
- Karl-Friedrich Doessel
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyre...
- Patent number 5,342,727
- Issue date Aug 30, 1994
- Hoechst Celanese Corp.
- Richard Vicari
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-working radiation-sensitive mixture and copying material p...
- Patent number 5,340,682
- Issue date Aug 23, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture and copying material p...
- Patent number 5,338,641
- Issue date Aug 16, 1994
- Hoechst Aktiengesellschaft
- Georg Pawlowski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation-sensitive mixture and recording material...
- Patent number 5,256,517
- Issue date Oct 26, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-curable composition and radiation-sensitive recording mat...
- Patent number 5,234,791
- Issue date Aug 10, 1993
- Hoechst Aktiengesellschaft
- Ralph Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive radiation-sensitive mixture, and radiation-sensitive recor...
- Patent number 5,217,843
- Issue date Jun 8, 1993
- Hoechst Aktiengesellschaft
- Ralph Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positively operating radiation-sensitive mixture containing a polyf...
- Patent number 5,198,322
- Issue date Mar 30, 1993
- Hoechst Aktiengesellschaft
- Peter Wilharm
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester...
- Patent number 5,191,069
- Issue date Mar 2, 1993
- Hoechst Aktiengesellschaft
- Horst Roeschert
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the production of 3,5-disubstituted-4-acetoxystyrene
- Patent number 5,072,025
- Issue date Dec 10, 1991
- Hoechst Celanese Corporation
- Richard Vicari
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Preparation of 3,5-disubstituted-4-acetoxystyrene
- Patent number 4,965,400
- Issue date Oct 23, 1990
- Richard Vicari
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive radiation-sensitive mixture and radiation-sensitive record...
- Patent number 4,946,759
- Issue date Aug 7, 1990
- Hoechst Aktiengesellschaft
- Karl-Friedrich Doessel
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the production of 3-mono or 3,5 dihalogenated 4-acetoxy...
- Patent number 4,933,495
- Issue date Jun 12, 1990
- Hoechst Celanese Corporation
- Mohammad Aslam
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
3,5-disubstituted-4-acetoxystyrene and process for its production
- Patent number 4,927,956
- Issue date May 22, 1990
- Hoechst Celanese Corporation
- Richard Vicari
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the production of 3-mono or 3,5-disubstituted-4-acetoxy...
- Patent number 4,868,256
- Issue date Sep 19, 1989
- Hoechst Celanese
- Mohammad Aslam
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the production of 3-mono or 3,5 disubstituted-4-acetoxy...
- Patent number 4,868,257
- Issue date Sep 19, 1989
- Hoechst Celanese Corporation
- Mohammad Aslam
- C07 - ORGANIC CHEMISTRY

Ralph Dammel

Person

Patents Grantslast 30 patents

Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene

Radiation-curable mixture, and radiation-sensitive recording materi...

Negative-working radiation-sensitive mixture containing diazomethan...

Positive radiation-sensitive mixture and recording material produce...

Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyre...

Positive-working radiation-sensitive mixture and copying material p...

Positive-working radiation-sensitive mixture and copying material p...

Positive-working radiation-sensitive mixture and recording material...

Radiation-curable composition and radiation-sensitive recording mat...

Positive radiation-sensitive mixture, and radiation-sensitive recor...

Positively operating radiation-sensitive mixture containing a polyf...

Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester...

Process for the production of 3,5-disubstituted-4-acetoxystyrene

Preparation of 3,5-disubstituted-4-acetoxystyrene

Positive radiation-sensitive mixture and radiation-sensitive record...

Process for the production of 3-mono or 3,5 dihalogenated 4-acetoxy...

3,5-disubstituted-4-acetoxystyrene and process for its production

Process for the production of 3-mono or 3,5-disubstituted-4-acetoxy...

Process for the production of 3-mono or 3,5 disubstituted-4-acetoxy...