Ralph R. Dammel

Person

Somerville, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon-containing composition for fine pattern formation and metho...
- Patent number 8,663,906
- Issue date Mar 4, 2014
- AZ Electronic Materials USA Corp.
- Ralph R Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-based antireflective coating compositions
- Patent number 8,524,441
- Issue date Sep 3, 2013
- AZ Electronic Materials USA Corp.
- Ruzhi Zhang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Antireflective coating compositions
- Patent number 8,329,387
- Issue date Dec 11, 2012
- AZ Electronic Materials USA Corp.
- Huirong Yao
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hardmask process for forming a reverse tone image using polysilazane
- Patent number 8,084,186
- Issue date Dec 27, 2011
- AZ Electronic Materials USA Corp.
- David Abdallah
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for coating over a photoresist pattern comprising a lactam
- Patent number 7,923,200
- Issue date Apr 12, 2011
- AZ Electronic Materials USA Corp.
- Muthiah Thiyagarajan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoactive compounds
- Patent number 7,833,693
- Issue date Nov 16, 2010
- AZ Electronic Materials USA Corp.
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process of imaging a photoresist with multiple antireflective coatings
- Patent number 7,816,071
- Issue date Oct 19, 2010
- AZ Electronic Materials USA Corp.
- David J. Abdallah
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition for coating over a photoresist pattern
- Patent number 7,745,077
- Issue date Jun 29, 2010
- AZ Electronic Materials USA Corp.
- Muthiah Thiyagarajan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for coating over a photoresist pattern
- Patent number 7,595,141
- Issue date Sep 29, 2009
- AZ Electronic Materials USA Corp.
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoactive compounds
- Patent number 7,547,501
- Issue date Jun 16, 2009
- AZ Electronic Materials USA Corp.
- Ralph R. Dammel
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition for deep UV and process thereof
- Patent number 7,537,879
- Issue date May 26, 2009
- AZ Electronic Materials USA Corp.
- Francis M. Houlihan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoactive compounds
- Patent number 7,521,170
- Issue date Apr 21, 2009
- AZ Electronic Materials USA Corp.
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process of imaging a deep ultraviolet photoresist with a top coatin...
- Patent number 7,473,512
- Issue date Jan 6, 2009
- AZ Electronic Materials USA Corp.
- Francis M. Houlihan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions
- Patent number 7,416,834
- Issue date Aug 26, 2008
- AZ Electronic Materials USA Corp.
- David J. Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition for deep ultraviolet lithography
- Patent number 7,351,521
- Issue date Apr 1, 2008
- AZ Electronic Materials USA Corp.
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition for deep ultraviolet lithography
- Patent number 7,211,366
- Issue date May 1, 2007
- AZ Electronic Materials USA Corp.
- Ralph R. Dammel
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist suitable for use in 157 nm photolithography and includi...
- Patent number 7,169,531
- Issue date Jan 30, 2007
- Infineon Technologies, AG
- Christoph Hohle
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition
- Patent number 7,033,728
- Issue date Apr 25, 2006
- AZ Electronic Materials USA Corp.
- Ralph R. Dammel
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for deep ultraviolet lithography comprising...
- Patent number 6,991,888
- Issue date Jan 31, 2006
- AZ Electronic Materials USA Corp.
- Munirathna Padmanaban
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for imaging thick films
- Patent number 6,852,465
- Issue date Feb 8, 2005
- Clariant International Ltd.
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoimageable bottom antireflective coating
- Patent number 6,844,131
- Issue date Jan 18, 2005
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-acting aqueous photoresist composition
- Patent number 6,800,415
- Issue date Oct 5, 2004
- Clariant Finance (BVI) Ltd
- Ping-Hung Lu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative deep ultraviolet photoresist
- Patent number 6,800,416
- Issue date Oct 5, 2004
- Clariant Finance (BVI) Ltd
- Takanori Kudo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for deep ultraviolet lithography
- Patent number 6,737,215
- Issue date May 18, 2004
- Clariant Finance (BVI) Ltd
- Ralph R. Dammel
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist composition for deep UV radiation containing an additive
- Patent number 6,723,488
- Issue date Apr 20, 2004
- Clariant Finance (BVI) Ltd
- Takanori Kudo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer suitable for photoresist compositions
- Patent number 6,686,429
- Issue date Feb 3, 2004
- Clariant Finance (BVI) Limited
- Ralph R. Dammel
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Negative-acting chemically amplified photoresist composition
- Patent number 6,576,394
- Issue date Jun 10, 2003
- Clariant Finance (BVI) Limited
- Pingyong Xu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer suitable for photoresist compositions
- Patent number 6,486,282
- Issue date Nov 26, 2002
- Clariant Finance (BVI) Limited
- Ralph R. Dammel
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition for deep UV and process thereof
- Patent number 6,447,980
- Issue date Sep 10, 2002
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lift-off process for patterning fine metal lines
- Patent number 6,372,414
- Issue date Apr 16, 2002
- Clariant Finance (BVI) Limited
- Randy D. Redd
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...
- Publication number 20230119980
- Publication date Apr 20, 2023
- Merck Patent GmbH
- Daniel HUDSON
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Composition for Coating over a Photoresist Pattern Comprising a Lactam
- Publication number 20120219919
- Publication date Aug 30, 2012
- Muthiah Thiyagarajan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-Working Photoimageable Bottom Antireflective Coating
- Publication number 20110086312
- Publication date Apr 14, 2011
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING COMPOSITION FOR FINE PATTERN FORMATION AND METHO...
- Publication number 20100255430
- Publication date Oct 7, 2010
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hardmask Process for Forming a Reverse Tone Image Using Polysilazane
- Publication number 20100203299
- Publication date Aug 12, 2010
- David Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-BASED ANTIREFLECTIVE COATING COMPOSITIONS
- Publication number 20100092895
- Publication date Apr 15, 2010
- Ruzhi Zhang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Hardmask Process for Forming a Reverse Tone Image
- Publication number 20100040838
- Publication date Feb 18, 2010
- David J. Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective Coating Compositions
- Publication number 20100009297
- Publication date Jan 14, 2010
- Huirong Yao
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for Coating over a Photoresist Pattern
- Publication number 20090317739
- Publication date Dec 24, 2009
- Muthiah Thiyagarajan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING
- Publication number 20090274974
- Publication date Nov 5, 2009
- David Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist Image-Forming Process Using Double Patterning
- Publication number 20090253080
- Publication date Oct 8, 2009
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for Shrinking Dimensions Between Photoresist Pattern Compri...
- Publication number 20090253081
- Publication date Oct 8, 2009
- David Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACTIVE COMPOUNDS
- Publication number 20090087782
- Publication date Apr 2, 2009
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Composition for Coating over a Photoresist Pattern Comprising a Lactam
- Publication number 20080248427
- Publication date Oct 9, 2008
- Muthiah Thiyagarajan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Polymers Useful in Photoresist Compositions and Compositions Thereof
- Publication number 20080171270
- Publication date Jul 17, 2008
- Munirathna Padmanaban
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACTIVE COMPOUNDS
- Publication number 20080085463
- Publication date Apr 10, 2008
- Ralph R. Dammel
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Antireflective coating compositions
- Publication number 20080076059
- Publication date Mar 27, 2008
- David J. Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition for deep ultraviolet lithography
- Publication number 20070172762
- Publication date Jul 26, 2007
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition for deep ultraviolet lithography
- Publication number 20070154841
- Publication date Jul 5, 2007
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoactive compounds
- Publication number 20070015084
- Publication date Jan 18, 2007
- M. Dalil Rahman
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Process of imaging a photoresist with multiple antireflective coatings
- Publication number 20060177772
- Publication date Aug 10, 2006
- David J. Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process of imaging a photoresist with multiple antireflective coatings
- Publication number 20060177774
- Publication date Aug 10, 2006
- David J. Abdallah
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition for deep UV and process thereof
- Publication number 20060110677
- Publication date May 25, 2006
- Francis M. Houlihan
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition for coating over a photoresist pattern
- Publication number 20060088788
- Publication date Apr 27, 2006
- Takanori Kudo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working photoimageable bottom antireflective coating
- Publication number 20060063105
- Publication date Mar 23, 2006
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Aqueous edge bead remover
- Publication number 20050282093
- Publication date Dec 22, 2005
- Ralph R. Dammel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process of imaging a deep ultraviolet photoresist with a top coatin...
- Publication number 20050202347
- Publication date Sep 15, 2005
- Francis M. Houlihan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process of imaging a deep ultraviolet photoresist with a top coatin...
- Publication number 20050202340
- Publication date Sep 15, 2005
- Francis M. Houlihan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process of imaging a deep ultraviolet photoresist with a top coatin...
- Publication number 20050202351
- Publication date Sep 15, 2005
- Francis M. Houlihan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist suitable for use in 157 nm photolithography and includi...
- Publication number 20050170279
- Publication date Aug 4, 2005
- Christoph Hohle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ralph R. Dammel

Person

Patents Grantslast 30 patents

Silicon-containing composition for fine pattern formation and metho...

Silicon-based antireflective coating compositions

Antireflective coating compositions

Hardmask process for forming a reverse tone image using polysilazane

Composition for coating over a photoresist pattern comprising a lactam

Photoactive compounds

Process of imaging a photoresist with multiple antireflective coatings

Composition for coating over a photoresist pattern

Composition for coating over a photoresist pattern

Photoactive compounds

Photoresist composition for deep UV and process thereof

Photoactive compounds

Process of imaging a deep ultraviolet photoresist with a top coatin...

Antireflective coating compositions

Photoresist composition for deep ultraviolet lithography

Photoresist composition for deep ultraviolet lithography

Photoresist suitable for use in 157 nm photolithography and includi...

Photoresist composition

Photoresist composition for deep ultraviolet lithography comprising...

Photoresist composition for imaging thick films

Positive-working photoimageable bottom antireflective coating

Negative-acting aqueous photoresist composition

Negative deep ultraviolet photoresist

Photoresist composition for deep ultraviolet lithography

Photoresist composition for deep UV radiation containing an additive

Polymer suitable for photoresist compositions

Negative-acting chemically amplified photoresist composition

Polymer suitable for photoresist compositions

Photoresist composition for deep UV and process thereof

Lift-off process for patterning fine metal lines

Patents Applicationslast 30 patents

A METHOD OF MANUFACTURING SEGREGATED LAYERS ABOVE A SUBSTRATE, AND...

Composition for Coating over a Photoresist Pattern Comprising a Lactam

Positive-Working Photoimageable Bottom Antireflective Coating

SILICON-CONTAINING COMPOSITION FOR FINE PATTERN FORMATION AND METHO...

Hardmask Process for Forming a Reverse Tone Image Using Polysilazane

SILICON-BASED ANTIREFLECTIVE COATING COMPOSITIONS

Hardmask Process for Forming a Reverse Tone Image

Antireflective Coating Compositions

Composition for Coating over a Photoresist Pattern

SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING

Photoresist Image-Forming Process Using Double Patterning

Process for Shrinking Dimensions Between Photoresist Pattern Compri...

PHOTOACTIVE COMPOUNDS

Composition for Coating over a Photoresist Pattern Comprising a Lactam

Polymers Useful in Photoresist Compositions and Compositions Thereof

PHOTOACTIVE COMPOUNDS

Antireflective coating compositions

Photoresist composition for deep ultraviolet lithography

Photoresist composition for deep ultraviolet lithography

Photoactive compounds

Process of imaging a photoresist with multiple antireflective coatings

Process of imaging a photoresist with multiple antireflective coatings

Photoresist composition for deep UV and process thereof

Composition for coating over a photoresist pattern

Negative-working photoimageable bottom antireflective coating

Aqueous edge bead remover

Process of imaging a deep ultraviolet photoresist with a top coatin...

Process of imaging a deep ultraviolet photoresist with a top coatin...

Process of imaging a deep ultraviolet photoresist with a top coatin...

Photoresist suitable for use in 157 nm photolithography and includi...