Raman Viswanathan

Person

Briarcliff Manor, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for lithography for optimizing process conditions
- Patent number 7,767,385
- Issue date Aug 3, 2010
- International Business Machines Corporation
- Carl E. Larson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution silicon-containing resist
- Patent number 7,659,050
- Issue date Feb 9, 2010
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for using negative tone silicon-containing resist for e-beam...
- Patent number 7,399,573
- Issue date Jul 15, 2008
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-aspect ratio resist development using safe-solvent mixtures of...
- Patent number 6,440,639
- Issue date Aug 27, 2002
- International Business Machines Corporation
- Robert E. Fontana
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for providing selective exposure in X-ray lithography
- Patent number 6,009,143
- Issue date Dec 28, 1999
- International Business Machines Corporation
- Raul Edmundo Acosta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane mask structure, fabrication and use
- Patent number 5,781,607
- Issue date Jul 14, 1998
- IBM Corporation
- Raul Edmundo Acosta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE TONE SILICON-CONTAINING RESIST FOR E-BEAM LITHOGRAPHY
- Publication number 20080102400
- Publication date May 1, 2008
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM
- Publication number 20070269736
- Publication date Nov 22, 2007
- International Business Machines Corporation
- James P. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for lithography for optimizing process conditions
- Publication number 20070212654
- Publication date Sep 13, 2007
- International Business Machines Corporation
- Carl E. Larson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High resolution silicon-containing resist
- Publication number 20060275694
- Publication date Dec 7, 2006
- International Business Machines Corporation
- James J. Bucchignano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Raman Viswanathan

Person

Patents Grantslast 30 patents

Method for lithography for optimizing process conditions

High resolution silicon-containing resist

Method for using negative tone silicon-containing resist for e-beam...

High-aspect ratio resist development using safe-solvent mixtures of...

Mirror for providing selective exposure in X-ray lithography

Membrane mask structure, fabrication and use

Patents Applicationslast 30 patents

NEGATIVE TONE SILICON-CONTAINING RESIST FOR E-BEAM LITHOGRAPHY

NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM

Method for lithography for optimizing process conditions

High resolution silicon-containing resist