Ramya Ramalingam

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Singapore, SG

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Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask absorber materials
- Patent number 11,640,109
- Issue date May 2, 2023
- Applied Materials, Inc.
- Shuwei Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask blank absorber defect reduction
- Patent number 11,454,876
- Issue date Sep 27, 2022
- Applied Materials, Inc.
- Binni Varghese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EUV Mask Blank Absorber Defect Reduction
- Publication number 20220187696
- Publication date Jun 16, 2022
- Applied Materials, Inc.
- Binni Varghese
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Absorber Materials
- Publication number 20210232042
- Publication date Jul 29, 2021
- Applied Materials, Inc.
- Shuwei Liu
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...