Ran NAMGUNG

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,158,699
- Issue date Dec 3, 2024
- Samsung SDI Co., Ltd.
- Changsoo Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor resist composition, and method of forming patterns us...
- Patent number 11,789,361
- Issue date Oct 17, 2023
- Samsung SDI Co., Ltd.
- Kyung Soo Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor resist composition, and method of forming patterns us...
- Patent number 11,789,362
- Issue date Oct 17, 2023
- Samsung SDI Co., Ltd.
- Kyung Soo Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 11,609,494
- Issue date Mar 21, 2023
- Samsung SDI Co., Ltd.
- Jaehyun Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor photoresist composition, and method of forming patter...
- Patent number 11,415,885
- Issue date Aug 16, 2022
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Semiconductor resist composition, and method of forming patterns us...
- Patent number 11,092,889
- Issue date Aug 17, 2021
- Samsung SDI Co., Ltd.
- Kyung Soo Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor resist composition, and method of forming patterns us...
- Patent number 11,092,890
- Issue date Aug 17, 2021
- Samsung SDI Co., Ltd.
- Kyung Soo Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor resist composition, and method of forming patterns us...
- Patent number 11,073,761
- Issue date Jul 27, 2021
- Samsung SDI Co., Ltd.
- Kyung Soo Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monomer, organic layer composition, organic layer, and method of fo...
- Patent number 10,364,221
- Issue date Jul 30, 2019
- Samsung SDI Co., Ltd.
- Hyo Young Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, organic layer composition, and method of forming patterns
- Patent number 10,340,148
- Issue date Jul 2, 2019
- Samsung SDI Co., Ltd.
- Hyo Young Kwon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymer, organic layer composition, organic layer, and method of fo...
- Patent number 10,323,124
- Issue date Jun 18, 2019
- Samsung SDI Co., Ltd.
- Youn-Hee Nam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic layer composition, organic layer, and method of forming pat...
- Patent number 10,066,057
- Issue date Sep 4, 2018
- Samsung SDI Co., Ltd.
- Yu-Shin Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, organic layer composition, and method of forming patterns
- Patent number 9,873,815
- Issue date Jan 23, 2018
- Samsung SDI Co., Ltd.
- Soohyoun Mun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, organic layer composition, organic layer, and met...
- Patent number 9,862,668
- Issue date Jan 9, 2018
- Samsung SDI Co., Ltd.
- Youn-Hee Nam
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, organic layer composition, organic layer, and method of fo...
- Patent number 9,758,612
- Issue date Sep 12, 2017
- Samsung SDI Co., Ltd.
- Ran Namgung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, organic layer composition, organic layer, and method of fo...
- Patent number 9,593,205
- Issue date Mar 14, 2017
- Samsung SDI Co., Ltd.
- Soo-Hyoun Mun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, photosensitive resin fil...
- Patent number 9,329,475
- Issue date May 3, 2016
- Cheil Industries Inc.
- Ran Namgung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE...
- Publication number 20240427248
- Publication date Dec 26, 2024
- Samsung SDI Co., Ltd.
- Kyoungjin HA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20240393692
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Hyeon PARK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20230103089
- Publication date Mar 30, 2023
- Samsung SDI Co., Ltd.
- Yoojeong CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PHOTORESIST PATTERNS
- Publication number 20230032354
- Publication date Feb 2, 2023
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20230024422
- Publication date Jan 26, 2023
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20230026721
- Publication date Jan 26, 2023
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20230028244
- Publication date Jan 26, 2023
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20230021469
- Publication date Jan 26, 2023
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PHOTORESIST PATTERNS
- Publication number 20230026579
- Publication date Jan 26, 2023
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20210356861
- Publication date Nov 18, 2021
- Samsung SDI Co., Ltd.
- Seung HAN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...
- Publication number 20210333708
- Publication date Oct 28, 2021
- Samsung SDI Co., Ltd.
- Kyung Soo MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...
- Publication number 20210325781
- Publication date Oct 21, 2021
- Samsung SDI Co., Ltd.
- Kyung Soo MOON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20210311387
- Publication date Oct 7, 2021
- Samsung SDI Co., Ltd.
- Changsoo WOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION, AND METHOD OF FORMING PATTER...
- Publication number 20210109442
- Publication date Apr 15, 2021
- Samsung SDI Co., Ltd.
- Kyungsoo MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20200348591
- Publication date Nov 5, 2020
- Samsung SDI Co., Ltd.
- Jaehyun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...
- Publication number 20200117085
- Publication date Apr 16, 2020
- Samsung SDI Co., Ltd.
- Kyung Soo MOON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...
- Publication number 20200041901
- Publication date Feb 6, 2020
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...
- Publication number 20200041896
- Publication date Feb 6, 2020
- Samsung SDI Co., Ltd.
- Kyung Soo MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...
- Publication number 20200041897
- Publication date Feb 6, 2020
- Samsung SDI Co., Ltd.
- Kyung Soo MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS
- Publication number 20170110328
- Publication date Apr 20, 2017
- SAMSUNG SDI CO., LTD.
- Hyo Young KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...
- Publication number 20170008843
- Publication date Jan 12, 2017
- Samsung SDI Co., Ltd.
- Hyo Young KWON
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS
- Publication number 20160322216
- Publication date Nov 3, 2016
- Samsung SDI Co., Ltd.
- Soohyoun MUN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PAT...
- Publication number 20160297932
- Publication date Oct 13, 2016
- Samsung SDI Co., Ltd.
- Yu-Shin PARK
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...
- Publication number 20160237195
- Publication date Aug 18, 2016
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...
- Publication number 20160152771
- Publication date Jun 2, 2016
- Samsung SDI Co., Ltd.
- Soo-Hyoun MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER, POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND ME...
- Publication number 20160145379
- Publication date May 26, 2016
- Samsung SDI Co., Ltd.
- Youn-Hee NAM
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...
- Publication number 20160090449
- Publication date Mar 31, 2016
- Samsung SDI Co., Ltd.
- Youn-Hee NAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Positive Photosensitive Resin Composition, Photosensitive Resin Fil...
- Publication number 20150160553
- Publication date Jun 11, 2015
- CHEIL INDUSTRIES INC.
- Hyo-Young KWON
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Positive Photosensitive Resin Composition, Photosensitive Resin Fil...
- Publication number 20150111153
- Publication date Apr 23, 2015
- CHEIL INDUSTRIES INC.
- Ran NAMGUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ran NAMGUNG

Person

Patents Grantslast 30 patents

Semiconductor photoresist composition and method of forming pattern...

Semiconductor resist composition, and method of forming patterns us...

Semiconductor resist composition, and method of forming patterns us...

Semiconductor photoresist composition and method of forming pattern...

Semiconductor photoresist composition, and method of forming patter...

Semiconductor resist composition, and method of forming patterns us...

Semiconductor resist composition, and method of forming patterns us...

Semiconductor resist composition, and method of forming patterns us...

Monomer, organic layer composition, organic layer, and method of fo...

Polymer, organic layer composition, and method of forming patterns

Polymer, organic layer composition, organic layer, and method of fo...

Organic layer composition, organic layer, and method of forming pat...

Polymer, organic layer composition, and method of forming patterns

Monomer, polymer, organic layer composition, organic layer, and met...

Polymer, organic layer composition, organic layer, and method of fo...

Polymer, organic layer composition, organic layer, and method of fo...

Positive photosensitive resin composition, photosensitive resin fil...

Patents Applicationslast 30 patents

RESIST TOPCOAT COMPOSITION AND METHOD OF FORMING PATTERNS USING THE...

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...

METHOD FOR FORMING PHOTORESIST PATTERNS

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

METHOD FOR FORMING PHOTORESIST PATTERNS

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...

SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SEMICONDUCTOR PHOTORESIST COMPOSITION, AND METHOD OF FORMING PATTER...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...

SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...

SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...

SEMICONDUCTOR RESIST COMPOSITION, AND METHOD OF FORMING PATTERNS US...

POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS

MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...

POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS

ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PAT...

POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...

POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...

MONOMER, POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND ME...

POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...

Positive Photosensitive Resin Composition, Photosensitive Resin Fil...

Positive Photosensitive Resin Composition, Photosensitive Resin Fil...