Ranee Kwong

Person

Wappingers Falls, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure photolithography methods
- Patent number 9,235,119
- Issue date Jan 12, 2016
- GLOBALFOUNDRIES Inc.
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Developable bottom antireflective coating composition and pattern f...
- Patent number 9,040,225
- Issue date May 26, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Removal of alkaline crystal defects in lithographic patterning
- Patent number 9,012,133
- Issue date Apr 21, 2015
- International Business Machines Corporation
- Javier J. Perez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developable bottom antireflective coating composition and pattern f...
- Patent number 8,999,624
- Issue date Apr 7, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions
- Patent number 8,846,296
- Issue date Sep 30, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method and structure for reworking antireflective coating over semi...
- Patent number 8,835,307
- Issue date Sep 16, 2014
- International Business Machines Corporation
- Hakeem Akinmade-Yusuff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure photolithography methods
- Patent number 8,568,960
- Issue date Oct 29, 2013
- International Business Machines Corporation
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Interconnect structure with an oxygen-doped SiC antireflective coat...
- Patent number 8,373,271
- Issue date Feb 12, 2013
- International Business Machines Corporation
- Dario L. Goldfarb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-activation energy silicon-containing resist system
- Patent number 6,939,664
- Issue date Sep 6, 2005
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer compositions for multilayer lithographic processes
- Patent number 6,927,015
- Issue date Aug 9, 2005
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE
Information Patent Grant
Radiation sensitive silicon-containing negative resists and use the...
- Patent number 6,821,718
- Issue date Nov 23, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Underlayer compositions for multilayer lithographic processes
- Patent number 6,818,381
- Issue date Nov 16, 2004
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE
Information Patent Grant
Low silicon-outgassing resist for bilayer lithography
- Patent number 6,770,419
- Issue date Aug 3, 2004
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist compositions containing non-polymeric silicon
- Patent number 6,770,418
- Issue date Aug 3, 2004
- International Business Machines Corporation
- Wenjie Li
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers and use thereof
- Patent number 6,689,540
- Issue date Feb 10, 2004
- International Business Machines Corporation
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive silicon-containing negative resists and use the...
- Patent number 6,653,045
- Issue date Nov 25, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Etch improved resist systems containing acrylate (or methacrylate)...
- Patent number 6,586,156
- Issue date Jul 1, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Packaged radiation sensitive coated workpiece process for making an...
- Patent number 6,543,617
- Issue date Apr 8, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective silicon-containing compositions as hardmask layer
- Patent number 6,503,692
- Issue date Jan 7, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organometallic polymers and use thereof
- Patent number 6,458,907
- Issue date Oct 1, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Plasma resistant composition and use thereof
- Patent number 6,436,605
- Issue date Aug 20, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective silicon-containing compositions as hardmask layer
- Patent number 6,420,088
- Issue date Jul 16, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Mask-making using resist having SIO bond-containing polymer
- Patent number 6,420,084
- Issue date Jul 16, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers and use thereof
- Patent number 6,346,362
- Issue date Feb 12, 2002
- International Business Machines Corporation
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions with pendant polar-functionalized aromatic...
- Patent number 6,265,134
- Issue date Jul 24, 2001
- International Business Machines Corporation
- Pushkara R. Varanasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist system and process for aerial image enhancement
- Patent number 6,245,492
- Issue date Jun 12, 2001
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic polymers and use thereof
- Patent number 6,171,757
- Issue date Jan 9, 2001
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming carbonates of hydroxyaromatic compounds
- Patent number 6,153,696
- Issue date Nov 28, 2000
- International Business Machines Corporation
- Gregory Breyta
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions with pendant polar-functionalized aromatic...
- Patent number 6,140,015
- Issue date Oct 31, 2000
- International Business Machines Corporation
- Pushkara R. Varanasi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dry developable photoresist compositions and method for use thereof
- Patent number 5,322,765
- Issue date Jun 21, 1994
- International Business Machines Corporation
- Nicholas J. Clecak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN F...
- Publication number 20150050601
- Publication date Feb 19, 2015
- International Business Machines Corporation
- Kuang-Jung Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE PHOTOLITHOGRAPHY METHODS
- Publication number 20140349237
- Publication date Nov 27, 2014
- Kuang-Jung Chen
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN F...
- Publication number 20140004712
- Publication date Jan 2, 2014
- International Business Machines Corporation
- Kuang-Jung Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
REMOVAL OF ALKALINE CRYSTAL DEFECTS IN LITHOGRAPHIC PATTERNING
- Publication number 20130052593
- Publication date Feb 28, 2013
- International Business Machines Corporation
- Javier J. Perez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTERCONNECT STRUCTURE WITH AN OXYGEN-DOPED SiC ANTIREFLECTIVE COAT...
- Publication number 20110291284
- Publication date Dec 1, 2011
- International Business Machines Corporation
- Dario L. Goldfarb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wet developable bottom antireflective coating composition and metho...
- Publication number 20070243484
- Publication date Oct 18, 2007
- Kuang-Jung J. Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Bottom antireflective coating composition and method for use thereof
- Publication number 20070231736
- Publication date Oct 4, 2007
- Kuang-Jung J. Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material and process for etched structure filling and planarizing
- Publication number 20060089000
- Publication date Apr 27, 2006
- International Business Machines Corporation
- Ronald A. Della Guardia
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Silicon-containing resist systems with cyclic ketal protecting groups
- Publication number 20050106494
- Publication date May 19, 2005
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW-ACTIVATION ENERGY SILICON-CONTAINING RESIST SYSTEM
- Publication number 20050089792
- Publication date Apr 28, 2005
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Underlayer compositions for multilayer lithographic processes
- Publication number 20050019704
- Publication date Jan 27, 2005
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE
Information Patent Application
Packaged radiation sensitive coated workpiece process for making an...
- Publication number 20040045866
- Publication date Mar 11, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation sensitive silicon-containing negative resists and use the...
- Publication number 20040048204
- Publication date Mar 11, 2004
- International Business Machines
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low silicon-outgassing resist for bilayer lithography
- Publication number 20040048187
- Publication date Mar 11, 2004
- Mahmoud M. Khojasteh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist compositions containing non-polymeric silicon aditives
- Publication number 20030124453
- Publication date Jul 3, 2003
- International Business Machines Corporation
- Wenjie Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Etch improved resist systems containing acrylate (or methacrylate)...
- Publication number 20030049561
- Publication date Mar 13, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Packaged radiation sensitive coated workpiece process for making an...
- Publication number 20030019782
- Publication date Jan 30, 2003
- IBM Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective silicon-containing compositions as hardmask layer
- Publication number 20020187422
- Publication date Dec 12, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation sensitive silicon-containing negative resists and use the...
- Publication number 20020115017
- Publication date Aug 22, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Polymers and use thereof
- Publication number 20020090574
- Publication date Jul 11, 2002
- Ari Aviram
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Underlayer compositions for multilayer lithographic processes
- Publication number 20020058204
- Publication date May 16, 2002
- International Business Machines Corporation
- Mahmoud M. Khojasteh
- G11 - INFORMATION STORAGE

Ranee Kwong

Person

Patents Grantslast 30 patents

Exposure photolithography methods

Developable bottom antireflective coating composition and pattern f...

Removal of alkaline crystal defects in lithographic patterning

Developable bottom antireflective coating composition and pattern f...

Photoresist compositions

Method and structure for reworking antireflective coating over semi...

Multiple exposure photolithography methods

Interconnect structure with an oxygen-doped SiC antireflective coat...

Low-activation energy silicon-containing resist system

Underlayer compositions for multilayer lithographic processes

Radiation sensitive silicon-containing negative resists and use the...

Underlayer compositions for multilayer lithographic processes

Low silicon-outgassing resist for bilayer lithography

Positive resist compositions containing non-polymeric silicon

Polymers and use thereof

Radiation sensitive silicon-containing negative resists and use the...

Etch improved resist systems containing acrylate (or methacrylate)...

Packaged radiation sensitive coated workpiece process for making an...

Antireflective silicon-containing compositions as hardmask layer

Organometallic polymers and use thereof

Plasma resistant composition and use thereof

Antireflective silicon-containing compositions as hardmask layer

Mask-making using resist having SIO bond-containing polymer

Polymers and use thereof

Photoresist compositions with pendant polar-functionalized aromatic...

Photoresist system and process for aerial image enhancement

Organometallic polymers and use thereof

Process for forming carbonates of hydroxyaromatic compounds

Photoresist compositions with pendant polar-functionalized aromatic...

Dry developable photoresist compositions and method for use thereof

Patents Applicationslast 30 patents

DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN F...

EXPOSURE PHOTOLITHOGRAPHY METHODS

DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN F...

REMOVAL OF ALKALINE CRYSTAL DEFECTS IN LITHOGRAPHIC PATTERNING

INTERCONNECT STRUCTURE WITH AN OXYGEN-DOPED SiC ANTIREFLECTIVE COAT...

Wet developable bottom antireflective coating composition and metho...

Bottom antireflective coating composition and method for use thereof

Material and process for etched structure filling and planarizing

Silicon-containing resist systems with cyclic ketal protecting groups

LOW-ACTIVATION ENERGY SILICON-CONTAINING RESIST SYSTEM

Underlayer compositions for multilayer lithographic processes

Packaged radiation sensitive coated workpiece process for making an...

Radiation sensitive silicon-containing negative resists and use the...

Low silicon-outgassing resist for bilayer lithography

Positive resist compositions containing non-polymeric silicon aditives

Etch improved resist systems containing acrylate (or methacrylate)...

Packaged radiation sensitive coated workpiece process for making an...

Antireflective silicon-containing compositions as hardmask layer

Radiation sensitive silicon-containing negative resists and use the...

Polymers and use thereof

Underlayer compositions for multilayer lithographic processes