Rao V. Annapragada

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method to minimize MTJ sidewall damage and bottom electrode redepos...
- Patent number 9,660,177
- Issue date May 23, 2017
- Headway Technologies, Inc.
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming microlenses
- Patent number 8,801,947
- Issue date Aug 12, 2014
- Mattson Technology, Inc.
- Tinghao Frank Wang
- G02 - OPTICS
Information Patent Grant
Method for providing uniform removal of organic material
- Patent number 7,534,363
- Issue date May 19, 2009
- Lam Research Corporation
- Rao V. Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for monitoring a process in a plasma processi...
- Patent number 7,323,116
- Issue date Jan 29, 2008
- Lam Research Corporation
- Timothy J. Guiney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitrous oxide stripping process for organosilicate glass
- Patent number 7,202,177
- Issue date Apr 10, 2007
- Lam Research Corporation
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective oxygen-free etching process for barrier materials
- Patent number 7,129,171
- Issue date Oct 31, 2006
- Lam Research Corporation
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing damage to porous low-k materials during resist...
- Patent number 7,081,407
- Issue date Jul 25, 2006
- Lam Research Corporation
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch back process using nitrous oxide
- Patent number 6,916,697
- Issue date Jul 12, 2005
- Lam Research Corporation
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching vias in organosilicate glass materials without...
- Patent number 6,828,250
- Issue date Dec 7, 2004
- Lam Research Corporation
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-etch photoresist strip with O2 and NH3 for organosilicate glas...
- Patent number 6,777,344
- Issue date Aug 17, 2004
- Lam Research Corporation
- Rao V. Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching of organic antireflective coating
- Patent number 6,630,407
- Issue date Oct 7, 2003
- Lam Research Corporation
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined resist strip and barrier etch process for dual damascene s...
- Patent number 6,518,174
- Issue date Feb 11, 2003
- Lam Research Corporation
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of preventing damage to organo-silicate-glass materials duri...
- Patent number 6,413,877
- Issue date Jul 2, 2002
- Lam Research Corporation
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method to Minimize MTJ Sidewall Damage and Bottom Electrode Redepos...
- Publication number 20170069834
- Publication date Mar 9, 2017
- HEADWAY TECHNOLOGIES, INC.
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Microlenses
- Publication number 20130323933
- Publication date Dec 5, 2013
- Tinghao Frank Wang
- G02 - OPTICS
Information Patent Application
Method of preventing damage to porous low-K materials during resist...
- Publication number 20060240661
- Publication date Oct 26, 2006
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for monitoring a process in a plasma processi...
- Publication number 20060065632
- Publication date Mar 30, 2006
- Chia-Cheng Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for monitoring a process in a plasma processi...
- Publication number 20060065623
- Publication date Mar 30, 2006
- Timothy J. Guiney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for monitoring a process in a plasma processi...
- Publication number 20060065631
- Publication date Mar 30, 2006
- Chia-Cheng Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of preventing damage to porous low-k materials during resist...
- Publication number 20050130435
- Publication date Jun 16, 2005
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Minimizing the loss of barrier materials during photoresist stripping
- Publication number 20050101135
- Publication date May 12, 2005
- LAM RESEARCH CORPORATION
- Rao Annapragada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCH BACK PROCESS USING NITROUS OXIDE
- Publication number 20050079704
- Publication date Apr 14, 2005
- LAM RESEARCH CORPORATION
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective oxygen-free etching process for barrier materials
- Publication number 20050079725
- Publication date Apr 14, 2005
- LAM RESEARCH CORPORATION
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nitrous oxide stripping process for organosilicate glass
- Publication number 20050079710
- Publication date Apr 14, 2005
- LAM RESEARCH CORPORATION
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for providing uniform removal of organic material
- Publication number 20050006346
- Publication date Jan 13, 2005
- Rao V. Annapragada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of etching with NH3 and fluorine chemistries
- Publication number 20040211517
- Publication date Oct 28, 2004
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etching of organic antireflective coating
- Publication number 20020173160
- Publication date Nov 21, 2002
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching with NH3 and fluorine chemistries
- Publication number 20020121500
- Publication date Sep 5, 2002
- Rao Annapragada
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Combined resist strip and barrier etch process for dual damascene s...
- Publication number 20020119664
- Publication date Aug 29, 2002
- Lam Research Corporation
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post-etch photoresist strip with O2 and NH3 for organosilicate glas...
- Publication number 20020111041
- Publication date Aug 15, 2002
- Lam Research Corporation
- Rao V. Annapragada
- H01 - BASIC ELECTRIC ELEMENTS

Rao V. Annapragada

Person

Patents Grantslast 30 patents

Method to minimize MTJ sidewall damage and bottom electrode redepos...

Methods for forming microlenses

Method for providing uniform removal of organic material

Methods and apparatus for monitoring a process in a plasma processi...

Nitrous oxide stripping process for organosilicate glass

Selective oxygen-free etching process for barrier materials

Method of preventing damage to porous low-k materials during resist...

Etch back process using nitrous oxide

Process for etching vias in organosilicate glass materials without...

Post-etch photoresist strip with O2 and NH3 for organosilicate glas...

Plasma etching of organic antireflective coating

Combined resist strip and barrier etch process for dual damascene s...

Method of preventing damage to organo-silicate-glass materials duri...

Patents Applicationslast 30 patents

Method to Minimize MTJ Sidewall Damage and Bottom Electrode Redepos...

Methods for Forming Microlenses

Method of preventing damage to porous low-K materials during resist...

Methods and apparatus for monitoring a process in a plasma processi...

Methods and apparatus for monitoring a process in a plasma processi...

Methods and apparatus for monitoring a process in a plasma processi...

Method of preventing damage to porous low-k materials during resist...

Minimizing the loss of barrier materials during photoresist stripping

ETCH BACK PROCESS USING NITROUS OXIDE

Selective oxygen-free etching process for barrier materials

Nitrous oxide stripping process for organosilicate glass

Method for providing uniform removal of organic material

Method of etching with NH3 and fluorine chemistries

Plasma etching of organic antireflective coating

Method of etching with NH3 and fluorine chemistries

Combined resist strip and barrier etch process for dual damascene s...

Post-etch photoresist strip with O2 and NH3 for organosilicate glas...