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Raphael A. Dandl
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San Marcos, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Slow-wave induction plasma transport
Patent number
6,897,616
Issue date
May 24, 2005
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Stand alone plasma vacuum pump
Patent number
6,873,113
Issue date
Mar 29, 2005
Tokyo Electron Limited
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Applied plasma duct system
Patent number
6,729,850
Issue date
May 4, 2004
Tokyo Electron Limited
Raphael A. Dandl
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Plasma vacuum pump
Patent number
6,559,601
Issue date
May 6, 2003
Tokyo Electron Limited
Wayne L. Johnson
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Plasma vacuum pumping cell
Patent number
6,422,825
Issue date
Jul 23, 2002
Tokyo Electron Limited
Raphael A. Dandl
F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...
Information
Patent Grant
Coaxial resonant multi-port microwave applicator for an ECR plasma...
Patent number
5,975,014
Issue date
Nov 2, 1999
ASM Japan K.K.
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Coaxial microwave applicator for an electron cyclotron resonance pl...
Patent number
5,707,452
Issue date
Jan 13, 1998
Applied Microwave Plasma Concepts, Inc.
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Electron cyclotron resonance plasma source and method of operation
Patent number
5,370,765
Issue date
Dec 6, 1994
Applied Microwave Plasma Concepts, Inc.
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of operation of electron cyclotron resonance plasma source
Patent number
5,203,960
Issue date
Apr 20, 1993
Applied Microwave Plasma Concepts, Inc.
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Electron cyclotron resonance plasma source
Patent number
5,133,826
Issue date
Jul 28, 1992
Applied Microwave Plasma Concepts, Inc.
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for producing intense microwave pulses
Patent number
5,003,225
Issue date
Mar 26, 1991
Applied Microwave Plasma Concepts, Inc.
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for producing microwave radiation
Patent number
4,733,133
Issue date
Mar 22, 1988
Applied Microwave Plasma Concepts, Inc.
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus using electron cyclotron heated plasma for vac...
Patent number
4,641,060
Issue date
Feb 3, 1987
Applied Microwave Plasma Concepts, Inc.
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Slow-wave induction plasma transport
Publication number
20030234616
Publication date
Dec 25, 2003
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Stand alone plasma vacuum pump
Publication number
20030122492
Publication date
Jul 3, 2003
Raphael A. Dandl
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Applied plasma duct system
Publication number
20030117080
Publication date
Jun 26, 2003
Raphael A. Dandl
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
Plasma vacuum pumping cell
Publication number
20010016166
Publication date
Aug 23, 2001
TOKYO ELECTRON LIMITED
Raphael A. Dandl
F04 - POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS FOR LIQUIDS OR ELASTIC...