Ratsamee Limdulpaiboon

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods, systems, and apparatus for processing substrates using one...
- Patent number 12,131,913
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Krishna Nittala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, systems, and apparatus for processing substrates using one...
- Patent number 11,694,902
- Issue date Jul 4, 2023
- Applied Materials, Inc.
- Krishna Nittala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of in situ ceramic coating deposition
- Patent number 11,674,222
- Issue date Jun 13, 2023
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of reducing chamber residues
- Patent number 11,560,623
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Liangfa Hu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment of low-K surface to improve barrier deposition
- Patent number 9,245,793
- Issue date Jan 26, 2016
- Intermolecular, Inc.
- Ratsamee Limdulpaiboon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating integrated circuits including fluorine inco...
- Patent number 9,196,475
- Issue date Nov 24, 2015
- GLOBALFOUNDRIES, INC.
- Bongki Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hydrogen plasma cleaning of germanium oxide surfaces
- Patent number 8,987,143
- Issue date Mar 24, 2015
- Intermolecular, Inc.
- Ratsamee Limdulpaiboon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nucleation interface for high-k layer on germanium
- Patent number 8,901,677
- Issue date Dec 2, 2014
- Intermolecular, Inc.
- Frank Greer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resolving of fluorine loading effect in the vacuum chamber
- Patent number 7,435,684
- Issue date Oct 14, 2008
- Novellus Systems, Inc.
- Chi-I Lang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Strain engineering—HDP thin film with tensile stress for FEOL and o...
- Patent number 7,381,451
- Issue date Jun 3, 2008
- Novellus Systems, Inc.
- Chi-i Lang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Helium-based etch process in deposition-etch-deposition gap fill
- Patent number 7,344,996
- Issue date Mar 18, 2008
- Novellus Systems, Inc.
- Chi-I Lang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR PROCESSING SUBSTRATES USING ONE...
- Publication number 20230317463
- Publication date Oct 5, 2023
- Applied Materials, Inc.
- Krishna NITTALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IN SITU CERAMIC COATING DEPOSITION
- Publication number 20230272525
- Publication date Aug 31, 2023
- Applied Materials, Inc.
- Sarah Michelle BOBEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF REDUCING CHAMBER RESIDUES
- Publication number 20230151487
- Publication date May 18, 2023
- Applied Materials, Inc.
- Liangfa HU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS, SYSTEMS, AND APPARATUS FOR PROCESSING SUBSTRATES USING ONE...
- Publication number 20220262643
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Krishna NITTALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF IN SITU CERAMIC COATING DEPOSITION
- Publication number 20220098728
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Sarah Michelle BOBEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC COATING FOR DEPOSITION CHAMBER
- Publication number 20220020589
- Publication date Jan 20, 2022
- Applied Materials, Inc.
- Lu Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF REDUCING CHAMBER RESIDUES
- Publication number 20200362457
- Publication date Nov 19, 2020
- Applied Materials, Inc.
- Liangfa HU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA DENSIFICATION WITHIN A PROCESSING CHAMBER
- Publication number 20200328066
- Publication date Oct 15, 2020
- Applied Materials, Inc.
- Byung Seok KWON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FABRICATING INTEGRATED CIRCUITS INCLUDING FLUORINE INCO...
- Publication number 20150303057
- Publication date Oct 22, 2015
- GLOBALFOUNDRIES, Inc.
- Bongki Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treatment of Low-K Surface to Improve Barrier Deposition
- Publication number 20150179509
- Publication date Jun 25, 2015
- Intermolecular, Inc.
- Ratsamee Limdulpaiboon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Channel-Last Methods for Making FETS
- Publication number 20140264281
- Publication date Sep 18, 2014
- Intermolecular, Inc.
- Sandip Niyogi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hydrogen Plasma Cleaning of Germanium Oxide Surfaces
- Publication number 20140273493
- Publication date Sep 18, 2014
- Intermolecular, Inc.
- Ratsamee Limdulpaiboon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Controlling Radical Lifetimes in a Remote Plasma Chamber
- Publication number 20140273309
- Publication date Sep 18, 2014
- Intermolecular, Inc.
- Sandip Niyogi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Nucleation Interface for High-K Layer on Germanium
- Publication number 20140252565
- Publication date Sep 11, 2014
- Intermolecular, Inc.
- Frank Greer
- H01 - BASIC ELECTRIC ELEMENTS

Ratsamee Limdulpaiboon

Person

Patents Grantslast 30 patents

Methods, systems, and apparatus for processing substrates using one...

Methods, systems, and apparatus for processing substrates using one...

Method of in situ ceramic coating deposition

Methods of reducing chamber residues

Plasma treatment of low-K surface to improve barrier deposition

Methods for fabricating integrated circuits including fluorine inco...

Hydrogen plasma cleaning of germanium oxide surfaces

Nucleation interface for high-k layer on germanium

Resolving of fluorine loading effect in the vacuum chamber

Strain engineering—HDP thin film with tensile stress for FEOL and o...

Helium-based etch process in deposition-etch-deposition gap fill

Patents Applicationslast 30 patents

METHODS, SYSTEMS, AND APPARATUS FOR PROCESSING SUBSTRATES USING ONE...

METHOD OF IN SITU CERAMIC COATING DEPOSITION

METHODS OF REDUCING CHAMBER RESIDUES

METHODS, SYSTEMS, AND APPARATUS FOR PROCESSING SUBSTRATES USING ONE...

METHOD OF IN SITU CERAMIC COATING DEPOSITION

DIELECTRIC COATING FOR DEPOSITION CHAMBER

METHODS OF REDUCING CHAMBER RESIDUES

PLASMA DENSIFICATION WITHIN A PROCESSING CHAMBER

METHODS FOR FABRICATING INTEGRATED CIRCUITS INCLUDING FLUORINE INCO...

Plasma Treatment of Low-K Surface to Improve Barrier Deposition

Channel-Last Methods for Making FETS

Hydrogen Plasma Cleaning of Germanium Oxide Surfaces

Controlling Radical Lifetimes in a Remote Plasma Chamber

Nucleation Interface for High-K Layer on Germanium