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Ravi Sundarensan
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San Jose, CA, US
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last 30 patents
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Patent Grant
Method to form elevated source/drain using poly spacer
Patent number
6,566,208
Issue date
May 20, 2003
Chartered Semiconductor Manufacturing Ltd.
Yang Pan
H01 - BASIC ELECTRIC ELEMENTS
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last 30 patents
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Patent Application
Method to form elevated source/drain using poly spacer
Publication number
20030022450
Publication date
Jan 30, 2003
Chartered Semiconductor Manufacturing Ltd.
Yang Pan
H01 - BASIC ELECTRIC ELEMENTS