Ravichandra V. Palaparthi

Person

Newark, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing pad and methods of making and using same
- Patent number 8,535,119
- Issue date Sep 17, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Ravichandra V Palaparthi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing method
- Patent number 8,257,142
- Issue date Sep 4, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and methods of making and using same
- Patent number 8,221,196
- Issue date Jul 17, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Richard D. Hreha
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with controlled wetting
- Patent number 7,530,887
- Issue date May 12, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bo Jiang
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad and methods of making and using same
- Patent number 7,458,885
- Issue date Dec 2, 2008
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Ravichandra V. Palaparthi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with oscillating path groove network
- Patent number 7,270,595
- Issue date Sep 18, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Carolina L. Elmufdi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with flow modifying groove network
- Patent number 7,156,721
- Issue date Jan 2, 2007
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Ravichandra V. Palaparthi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with flow modifying groove network
- Patent number 6,958,002
- Issue date Oct 25, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Ravichandra V. Palaparthi
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Chemical Mechanical Polishing Pad and Methods of Making and Using Same
- Publication number 20120252324
- Publication date Oct 4, 2012
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Richard D. Hreha
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Chemical Mechanical Polishing Method
- Publication number 20090258573
- Publication date Oct 15, 2009
- Gregory P. Muldowney
- B24 - GRINDING POLISHING
Information Patent Application
Chemical Mechanical Polishing Pad and Methods of Making and Using Same
- Publication number 20090258575
- Publication date Oct 15, 2009
- Richard D Hreha
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Chemical mechanical polishing pad with controlled wetting
- Publication number 20090047876
- Publication date Feb 19, 2009
- Bo Jiang
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with flow modifying groove network
- Publication number 20060014477
- Publication date Jan 19, 2006
- Ravichandra V. Palaparthi
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad with oscillating path groove network
- Publication number 20050266776
- Publication date Dec 1, 2005
- Carolina L. Elmufdi
- B24 - GRINDING POLISHING

Ravichandra V. Palaparthi

Person

Patents Grantslast 30 patents

Chemical mechanical polishing pad and methods of making and using same

Chemical mechanical polishing method

Chemical mechanical polishing pad and methods of making and using same

Chemical mechanical polishing pad with controlled wetting

Chemical mechanical polishing pad and methods of making and using same

Polishing pad with oscillating path groove network

Polishing pad with flow modifying groove network

Polishing pad with flow modifying groove network

Patents Applicationslast 30 patents

Chemical Mechanical Polishing Pad and Methods of Making and Using Same

Chemical Mechanical Polishing Method

Chemical Mechanical Polishing Pad and Methods of Making and Using Same

Chemical mechanical polishing pad with controlled wetting

Polishing pad with flow modifying groove network

Polishing pad with oscillating path groove network