Rei Tanaka

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming ultra-thin SiN film by plasma CVD
- Patent number 7,638,443
- Issue date Dec 29, 2009
- ASM Japan K.K.
- Rei Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING ULTRA-THIN BORON-CONTAINING NITRIDE FILMS AND RE...
- Publication number 20090098741
- Publication date Apr 16, 2009
- ASM JAPAN K.K.
- Rei Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING ULTRA-THIN SiN FILM BY PLASMA CVD
- Publication number 20080113521
- Publication date May 15, 2008
- ASM JAPAN K.K.
- Rei Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for depositing thin film by controlling effective distance b...
- Publication number 20070032048
- Publication date Feb 8, 2007
- ASM JAPAN K.K.
- Naoto Tsuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma CVD apparatus comprising susceptor with ring
- Publication number 20030192478
- Publication date Oct 16, 2003
- ASM JAPAN K.K.
- Naoto Tsuji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...