Reiko KIMURA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 9,170,488
- Issue date Oct 27, 2015
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, and radiation-sensitive resin composition
- Patent number 9,164,387
- Issue date Oct 20, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method, and radiation-sensitive resin composition
- Patent number 9,122,163
- Issue date Sep 1, 2015
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method, resist pattern-forming radiation-sen...
- Patent number 9,046,765
- Issue date Jun 2, 2015
- JSR Corporation
- Hiromitsu Nakashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern-forming method, and radiation-sensitive resin compos...
- Patent number 8,795,954
- Issue date Aug 5, 2014
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer and compound
- Patent number 8,609,321
- Issue date Dec 17, 2013
- JSP Corporation
- Hiromitsu Nakashima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 8,609,318
- Issue date Dec 17, 2013
- JSR Corporation
- Kazuo Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and resist film formed using...
- Patent number 8,609,319
- Issue date Dec 17, 2013
- JSR Corporation
- Toru Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20140295350
- Publication date Oct 2, 2014
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...
- Publication number 20140023968
- Publication date Jan 23, 2014
- JSR Corporation
- Hiromitsu NAKASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20130224661
- Publication date Aug 29, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20130224666
- Publication date Aug 29, 2013
- JSR Corporation
- Hirokazu SAKAKIBARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
- Publication number 20130189621
- Publication date Jul 25, 2013
- JSR Corporation
- Hiromitsu NAKASHIMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING...
- Publication number 20120082935
- Publication date Apr 5, 2012
- JSR Corporation
- Toru Kimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20120034560
- Publication date Feb 9, 2012
- JSR Corporation
- Kazuo NAKAHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Reiko KIMURA

Person

Patents Grantslast 30 patents

Resist pattern-forming method, and radiation-sensitive resin compos...

Pattern-forming method, and radiation-sensitive resin composition

Pattern-forming method, and radiation-sensitive resin composition

Resist pattern-forming method, resist pattern-forming radiation-sen...

Resist pattern-forming method, and radiation-sensitive resin compos...

Radiation-sensitive resin composition, polymer and compound

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition and resist film formed using...

Patents Applicationslast 30 patents

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...

PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION

RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOS...

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...