Reiko Tsutsui

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Kanagawa, JP

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Patents Grantslast 30 patents

Information Patent Grant
Mask pattern correction program and system
- Patent number 7,844,939
- Issue date Nov 30, 2010
- Sony Corporation
- Reiko Tsutsui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MASK PATTERN CORRECTION PROGRAM AND SYSTEM
- Publication number 20080120589
- Publication date May 22, 2008
- SONY CORPORATION
- Reiko Tsutsui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY