Reinder T. Plug

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Guided patterning device inspection
- Patent number 11,287,748
- Issue date Mar 29, 2022
- ASML Netherlands B.V.
- Anton Bernhard Van Oosten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for predicting performance of a metrology system
- Patent number 10,884,342
- Issue date Jan 5, 2021
- ASML Netherlands B.V.
- Martinus Gerardus Maria Johannes Maassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integrated post-exposure bake track
- Patent number 8,636,458
- Issue date Jan 28, 2014
- ASML Netherlands B.V.
- Suzan L. Auer-Jongepier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and apparatus, lithographic apparatus, device manu...
- Patent number 8,411,287
- Issue date Apr 2, 2013
- ASML Netherlands B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology tool, system comprising a lithographic apparatus and a me...
- Patent number 7,961,309
- Issue date Jun 14, 2011
- ASML Netherlands B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, combination of lithographic apparatus and p...
- Patent number 7,679,714
- Issue date Mar 16, 2010
- ASML Netherlands B.V.
- Johannes Onvlee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for angular-resolved spectroscopic lithography characteri...
- Patent number 7,659,988
- Issue date Feb 9, 2010
- ASML Netherlands B.V.
- Martinus Joseph Kok
- G01 - MEASURING TESTING
Information Patent Grant
Metrology tool, system comprising a lithographic apparatus and a me...
- Patent number 7,586,598
- Issue date Sep 8, 2009
- ASML Netherlands B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system, control system and device manufacturing method
- Patent number 7,511,797
- Issue date Mar 31, 2009
- ASML Netherlands B.V.
- Franciscus Van De Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology tool, system comprising a lithographic apparatus and a me...
- Patent number 7,502,103
- Issue date Mar 10, 2009
- ASML Netherlands B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic system, sensor, and method of measuring properties of...
- Patent number 7,480,050
- Issue date Jan 20, 2009
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Grant
Lithography system, control system and device manufacturing method
- Patent number 7,352,439
- Issue date Apr 1, 2008
- ASML Netherlands B.V.
- Franciscus Van De Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, apparatus and computer product for substrate processing
- Patent number 7,113,253
- Issue date Sep 26, 2006
- ASML Netherlands B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Servo control method and its application in a lithographic apparatus
- Patent number 6,420,716
- Issue date Jul 16, 2002
- ASML Netherlands B.V.
- Harry H. H. M. Cox
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUS FOR ESTIMATING SUBSTRATE SHAPE
- Publication number 20220050391
- Publication date Feb 17, 2022
- ASML NETHERLANDS B.V.
- Hermanus Adrianus DILLEN
- G01 - MEASURING TESTING
Information Patent Application
GUIDED PATTERNING DEVICE INSPECTION
- Publication number 20210041788
- Publication date Feb 11, 2021
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PATTERNING AT LEAST A LAYER OF A SEMICONDUCTOR DEVICE
- Publication number 20190235394
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Reinder Teun PLUG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PREDICTING PERFORMANCE OF A METROLOGY SYSTEM
- Publication number 20180314160
- Publication date Nov 1, 2018
- ASML NETHERLANDS B.V.
- Martinus Gerardus Maria Johannes MAASSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Metrology Method and Apparatus, Lithographic Apparatus, Device Manu...
- Publication number 20110043791
- Publication date Feb 24, 2011
- ASML NETHERLANDS B.V.
- Hendrik Jan Hidde Smilde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Tool, System Comprising a Lithographic Apparatus and a Me...
- Publication number 20090296081
- Publication date Dec 3, 2009
- ASML NETHERLANDS B.V.
- Reinder Teun PLUG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated post-exposure bake track
- Publication number 20080304940
- Publication date Dec 11, 2008
- Suzan L. Auer-Jongepier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection method and apparatus, lithographic apparatus, lithograph...
- Publication number 20080148875
- Publication date Jun 26, 2008
- ASML NETHERLANDS B.V.
- Thomas Leo Maria Hoogenboom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography system, control system and device manufacturing method
- Publication number 20080143985
- Publication date Jun 19, 2008
- ASML NETHERLANDS B.V.
- Franciscus Van De Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography system, control system and device manufacturing method
- Publication number 20080036983
- Publication date Feb 14, 2008
- ASML NETHERLANDS B.V.
- Franciscus Van De Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for angular-resolved spectroscopic lithography characteri...
- Publication number 20080002207
- Publication date Jan 3, 2008
- ASML NETHERLANDS B.V.
- Martinus Joseph Kok
- G01 - MEASURING TESTING
Information Patent Application
Metrology tool, system comprising a lithographic apparatus and a me...
- Publication number 20070279742
- Publication date Dec 6, 2007
- ASML NETHERLANDS B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic system, sensor, and method of measuring properties of...
- Publication number 20070182964
- Publication date Aug 9, 2007
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G01 - MEASURING TESTING
Information Patent Application
Method, apparatus and computer product for substrate processing
- Publication number 20050058446
- Publication date Mar 17, 2005
- ASML NETHERLANDS B.V.
- Reinder Teun Plug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Reinder T. Plug

Person

Patents Grantslast 30 patents

Guided patterning device inspection

Method and apparatus for predicting performance of a metrology system

Integrated post-exposure bake track

Metrology method and apparatus, lithographic apparatus, device manu...

Metrology tool, system comprising a lithographic apparatus and a me...

Lithographic apparatus, combination of lithographic apparatus and p...

Apparatus for angular-resolved spectroscopic lithography characteri...

Metrology tool, system comprising a lithographic apparatus and a me...

Lithography system, control system and device manufacturing method

Metrology tool, system comprising a lithographic apparatus and a me...

Lithographic system, sensor, and method of measuring properties of...

Lithography system, control system and device manufacturing method

Method, apparatus and computer product for substrate processing

Servo control method and its application in a lithographic apparatus

Patents Applicationslast 30 patents

METHODS AND APPARATUS FOR ESTIMATING SUBSTRATE SHAPE

GUIDED PATTERNING DEVICE INSPECTION

METHOD OF PATTERNING AT LEAST A LAYER OF A SEMICONDUCTOR DEVICE

METHOD AND APPARATUS FOR PREDICTING PERFORMANCE OF A METROLOGY SYSTEM

Metrology Method and Apparatus, Lithographic Apparatus, Device Manu...

Metrology Tool, System Comprising a Lithographic Apparatus and a Me...

Integrated post-exposure bake track

Inspection method and apparatus, lithographic apparatus, lithograph...

Lithography system, control system and device manufacturing method

Lithography system, control system and device manufacturing method

Apparatus for angular-resolved spectroscopic lithography characteri...

Metrology tool, system comprising a lithographic apparatus and a me...

Lithographic system, sensor, and method of measuring properties of...

Method, apparatus and computer product for substrate processing