Reiner Garreis

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Aalen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Projection system with compensation of intensity variations and com...
- Patent number 8,605,257
- Issue date Dec 10, 2013
- Carl Zeiss SMT GmbH
- Patrick Scheible
- G02 - OPTICS
Information Patent Grant
Projection objective, especially for microlithography, and method f...
- Patent number 7,310,187
- Issue date Dec 18, 2007
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective, especially for microlithography, and method f...
- Patent number 7,209,292
- Issue date Apr 24, 2007
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for holding a beam splitter element
- Patent number 7,079,331
- Issue date Jul 18, 2006
- Carl Zeiss SMT AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Grant
Projection exposure system
- Patent number 6,806,942
- Issue date Oct 19, 2004
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Projection System with Compensation of Intensity Variations and Com...
- Publication number 20080094599
- Publication date Apr 24, 2008
- Carl Zeiss SMT AG
- Patrick Scheible
- G02 - OPTICS
Information Patent Application
Projection objective, especially for microlithography, and method f...
- Publication number 20070188881
- Publication date Aug 16, 2007
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device for holding a beam splitter element
- Publication number 20050248858
- Publication date Nov 10, 2005
- Carl Zeiss SMT AG
- Ulrich Weber
- G02 - OPTICS
Information Patent Application
Projection objective, especially for microlithography, and method f...
- Publication number 20040109237
- Publication date Jun 10, 2004
- Carl Zeiss SMT AG
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection exposure system
- Publication number 20040017554
- Publication date Jan 29, 2004
- Carl Zeiss SMT AG
- Karl-Heinz Schuster
- G02 - OPTICS