Reiner Maria JUNGBLUT

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Computational metrology
- Patent number 11,347,150
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Focus and overlay improvement by modifying a patterning device
- Patent number 11,126,093
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 10,990,018
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods for controlling lithographic apparatus, lithographic appara...
- Patent number 10,558,130
- Issue date Feb 11, 2020
- ASNL Netherlands B.V.
- Rene Marinus Gerardus Johan Queens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and associated...
- Patent number 10,545,410
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Hakki Ergun Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,324,379
- Issue date Jun 18, 2019
- ASML Netherlands B.V.
- Cedric Marc Affentauschegg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for measuring a property of a substrate
- Patent number 10,317,191
- Issue date Jun 11, 2019
- ASML Netherlands B.V.
- Wouter Lodewijk Elings
- G05 - CONTROLLING REGULATING
Information Patent Grant
Methods for controlling lithographic apparatus, lithographic appara...
- Patent number 10,274,849
- Issue date Apr 30, 2019
- ASML Netherlands B.V.
- Rene Marinus Gerardus Johan Queens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a process window for a lithographic process,...
- Patent number 10,133,191
- Issue date Nov 20, 2018
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, device manufacturing method and computer pr...
- Patent number 7,903,234
- Issue date Mar 8, 2011
- ASML Netherlands B.V.
- Judocus Marie Dominicus Stoeldraijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical switching device
- Patent number 6,101,298
- Issue date Aug 8, 2000
- U.S. Philips Corporation
- Friedrich J. A. Den Broeder
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20220260925
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20210191278
- Publication date Jun 24, 2021
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE
- Publication number 20200310242
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTATIONAL METROLOGY
- Publication number 20190361358
- Publication date Nov 28, 2019
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARA...
- Publication number 20190212664
- Publication date Jul 11, 2019
- ASML NETHERLANDS B.V.
- Rene Marinus Gerardus Johan QUEENS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...
- Publication number 20190079411
- Publication date Mar 14, 2019
- ASML NETHERLANDS B.V.
- Hakki Ergun CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARA...
- Publication number 20180210351
- Publication date Jul 26, 2018
- ASML NETHERLANDS B.V.
- Rene Marinus Gerardus Johan QUEENS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Method
- Publication number 20180173099
- Publication date Jun 21, 2018
- ASML NETHERLANDS B.V.
- Cedric Marc AFFENTAUSCHEGG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A PROCESS WINDOW FOR A LITHOGRAPHIC PROCESS,...
- Publication number 20170160648
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Apparatus for Measuring a Property of a Substrate
- Publication number 20170160073
- Publication date Jun 8, 2017
- ASML NETHERLANDS B.V.
- Wouter Lodewijk ELINGS
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus, device manufacturing method and computer pr...
- Publication number 20080158528
- Publication date Jul 3, 2008
- ASML NETHERLANDS B.V.
- Judocus Marie Dominicus Stoeldraijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Reiner Maria JUNGBLUT

Person

Patents Grantslast 30 patents

Computational metrology

Focus and overlay improvement by modifying a patterning device

Computational metrology

Methods for controlling lithographic apparatus, lithographic appara...

Lithographic apparatus, device manufacturing method and associated...

Lithographic apparatus and method

Methods and apparatus for measuring a property of a substrate

Methods for controlling lithographic apparatus, lithographic appara...

Method for determining a process window for a lithographic process,...

Lithographic apparatus, device manufacturing method and computer pr...

Optical switching device

Patents Applicationslast 30 patents

COMPUTATIONAL METROLOGY

COMPUTATIONAL METROLOGY

FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE

COMPUTATIONAL METROLOGY

METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARA...

LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED...

METHODS FOR CONTROLLING LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARA...

Lithographic Apparatus and Method

METHOD FOR DETERMINING A PROCESS WINDOW FOR A LITHOGRAPHIC PROCESS,...

Methods and Apparatus for Measuring a Property of a Substrate

Lithographic apparatus, device manufacturing method and computer pr...