Reita IGARASHI

Person

  • Iwate, JP

Patents Grantslast 30 patents

  • Information Patent Grant

    Processing apparatus and processing method

    • Patent number 12,084,765
    • Issue date Sep 10, 2024
    • Tokyo Electron Limited
    • Reita Igarashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Processing apparatus and processing method

    • Patent number 12,018,371
    • Issue date Jun 25, 2024
    • Tokyo Electron Limited
    • Reita Igarashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Processing apparatus

    • Patent number 11,970,778
    • Issue date Apr 30, 2024
    • Tokyo Electron Limited
    • Reita Igarashi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Gas introduction structure and processing apparatus

    • Patent number 11,885,024
    • Issue date Jan 30, 2024
    • Tokyo Electron Limited
    • Hiroki Iriuda
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

  • Information Patent Application

    INJECTOR AND PROCESSING APPARATUS

    • Publication number 20240392440
    • Publication date Nov 28, 2024
    • TOKYO ELECTRON LIMITED
    • Reita IGARASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PROCESSING APPARATUS

    • Publication number 20220259736
    • Publication date Aug 18, 2022
    • TOKYO ELECTRON LIMITED
    • Reita IGARASHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PROCESSING APPARATUS AND PROCESSING METHOD

    • Publication number 20220243327
    • Publication date Aug 4, 2022
    • TOKYO ELECTRON LIMITED
    • Reita IGARASHI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    PROCESSING APPARATUS AND PROCESSING METHOD

    • Publication number 20220243329
    • Publication date Aug 4, 2022
    • TOKYO ELECTRON LIMITED
    • Reita IGARASHI
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    GAS INTRODUCTION STRUCTURE AND PROCESSING APPARATUS

    • Publication number 20220081775
    • Publication date Mar 17, 2022
    • TOKYO ELECTRON LIMITED
    • Hiroki IRIUDA
    • H01 - BASIC ELECTRIC ELEMENTS